EEE6403 - MOS Device
EEE6403 - MOS Device
EEE6403 - MOS Device
MOSFETs
Conclusion
References
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Introduction to MOSFET
A metal oxide semiconductor field effect
transistor or MOSFET is a type of FET where
the voltage determines the
conductivity of the device.
The simplest way to describe a MOSFET is,
two back-to-back diodes that exist in series
between drain and source with a Gate on top
of it separated by a dielectric. The back-to-
back Diode configuration prevents the current
flow with no applied voltage at the gate.
Applied voltage on the gate side can control
the conductivity of the device.
Fig.1: A basic MOSFET structure[1]
Ref: U. A Arefín, Md. Saidul Islam, and Md. Saddam Hossen, “Simulation & Analysis of Characteristics of Quantum-Well FET,” Researchgate, May
2015, doi: 10.13140/RG.2.1.4439.4409. 3
Types Depending on Channel Length
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Why Short-Channel MOSFETs?
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Problems with Long- Channel Theory for
Short-Channel MOSFET
Long-channel theory predicts drain currents increase with higher drain
voltages when gate voltage exceeds threshold voltage as Mobile electrons in
the channel move faster with the increasing field along the channel.
High drain voltages lead to a "pinch-off" condition where the channel
mobile-carrier density is zero near the drain.
The channel current must, however, be constant and therefore the pinch-off
condition requires an infinite carrier velocity to maintain a constant current
with a vanishing carrier density.
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Short-Channel Effect
A MOSFET is considered to be short when the channel length 'L' is the same
order of magnitude as the depletion-layer widths (Sum of both Source and Drain
side). Due to drain bias When the Gate channel length <<1µm, short channel
effect becomes important.
In case of Short-Channel Devices, we see a reduced Threshold Voltage(V T). Due
to 3 major Effects:
1. Source/Drain Charge Sharing
2. Drain-Induced Barrrier Lowering
3. Subsurface Punchthrough.
(a) (b)
Fig. 2: (a)Long-Channel MOSFET, (b) Short Channel MOSFET.[1]
Ref: U. A Arefín, Md. Saidul Islam, and Md. Saddam Hossen, “Simulation & Analysis of Characteristics of Quantum-Well FET,”
Researchgate, May 2015, doi: 10.13140/RG.2.1.4439.4409. 7
Short-Channel Effect(Cont.)
Source/Drain Charge Sharing: Fig. 3 represents a
short-channel MOSFET biased with VS = VB, VD
is small (close to VS), and VG biased at the
threshold voltage. At threshold voltage, a fixed
substrate-depletion charge is accumulated under
the gate region. The light blue part shows the
depletion region.
There are red rectangular-charge region that are
also parts of the depletion regions of the source-
and the drain-pn junctions. No Voltage required to
deplete the mobile charge of the triangular region. Fig. 3: The depletion charge at threshold with
Less VG needed to invert the silicon surface. charge sharing .[2]
Ref: V. K. Khanna, “Short-Channel Effects in MOSFETs,” in Nanoscience and technology, 2016, pp. 73–93. doi: 10.1007/978-81-322-
3625-2_5. 8
Short-Channel Effect(Cont.)
Drain-Induced Barrier Lowering: Refers to the
influence of the drain voltage on ΦS the barrier
to electron flow at the np junction near the (a)
oxide surface at the source.
In short channel MOSFET, sufficiently high
drain voltage can "pull down" the electron
barrier. (b)
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References
1) U. A Arefín, Md. Saidul Islam, and Md. Saddam Hossen, “Simulation & Analysis of
Characteristics of Quantum-Well FET,” Researchgate, May 2015, doi:
10.13140/RG.2.1.4439.4409.
2) V. K. Khanna, “Short-Channel Effects in MOSFETs,” in Nanoscience and technology, 2016, pp.
73–93. doi: 10.1007/978-81-322-3625-2_5.
3) R. S. Muller and T. I. Kamins, Device Electronics for Integrated Circuits. John Wiley & Sons,
2002.[Online].Available:http://books.google.ie/books?
id=s3iaEAAAQBAJ&printsec=frontcover&dq=Device+Electronics+for+Integrated+Circuits+by
+Ricchard+S.+Muller&hl=&cd=2&source=gbs_api
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Thank You
Any Questions?
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