SiliconPhotoics EMTheory PDF
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3rd International School and Conference “Saint Petersburg OPEN 2016” on Optoelectronics, Photonics,
Engineering and Nanostructures
Illuminating the future of silicon photonics: optical coupling of carbon nanotubes to microrings
Y K Kato
Wouter J Westerveld
IMEC, Belgium
H Paul Urbach
Delft University of Technology, The Netherlands
All rights reserved. No part of this publication may be reproduced, stored in a retrieval system
or transmitted in any form or by any means, electronic, mechanical, photocopying, recording
or otherwise, without the prior permission of the publisher, or as expressly permitted by law or
under terms agreed with the appropriate rights organization. Multiple copying is permitted in
accordance with the terms of licences issued by the Copyright Licensing Agency, the Copyright
Clearance Centre and other reproduction rights organisations.
Cover image: Silicon photonic waveguide with bends. Artist impression based on a microscope
photograph. The thin white line is the 220 nm high by 400 nm wide rectangular silicon waveguide
core. This waveguide core is surrounded by 2 µm wide trenches, depicted in cyan, where the silicon
layer has been etched away and the buried oxide layer is visible. This waveguide was used to
measure waveguide propagation loss. Adapted from figure 3.5b of the Ph.D. Thesis of Wouter J.
Westerveld, Silicon photonic micro-ring resonators to sense strain and ultrasound (2014), available
online at http://repository.tudelft.nl.
Permission to make use of IOP Publishing content other than as set out above may be sought
at [email protected].
Wouter J Westerveld and H Paul Urbach have asserted their right to be identified as the authors of
this work in accordance with sections 77 and 78 of the Copyright, Designs and Patents Act 1988.
DOI 10.1088/978-0-7503-1386-5
Version: 20171201
British Library Cataloguing-in-Publication Data: A catalogue record for this book is available
from the British Library.
US Office: IOP Publishing, Inc., 190 North Independence Mall West, Suite 601, Philadelphia,
PA 19106, USA
Contents
Preface viii
Further reading x
Author biographies xii
List of symbols xiii
1 Introduction 1-1
1.1 Photonics 1-1
1.2 Integrated photonics 1-1
1.3 Silicon photonics 1-2
1.4 Silicon-on-insulator technology in this book 1-3
References 1-3
2 Waveguides 2-1
2.1 Maxwell’s equations for linear, passive materials 2-1
2.2 Dielectric slab waveguides 2-2
2.2.1 TE modes 2-4
2.2.2 TM modes 2-5
2.3 General properties of modes in dielectric waveguides 2-7
2.3.1 Guided waves described by Ex, Ey, Hx and Hy 2-7
2.3.2 Guided waves described by Ez and Hz 2-9
2.3.3 Orthogonality 2-11
2.3.4 Power flow 2-13
2.3.5 Mode normalization 2-14
2.3.6 Mode expansion conjecture 2-14
2.3.7 Waveguides with losses and bends 2-16
2.4 Rectangular Si waveguides: extension of Marcatili’s approach 2-18
2.4.1 Ansatz for the shape of the field 2-18
2.4.2 Boundary conditions 2-20
2.4.3 Approximate methods 2-22
2.4.4 Avoided crossing of modes with similar propagation constants 2-26
2.4.5 Dispersion: effective group index 2-30
2.5 Rigorous numerical mode-solvers 2-32
2.6 Typical silicon-on-insulator waveguides 2-33
References 2-35
v
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3 Components 3-1
3.1 Directional couplers 3-1
3.1.1 Coupled mode theory 3-1
3.1.2 Eigenmode expansion (EME) 3-3
3.1.3 Rigorous FDTD simulations 3-5
3.2 Multimode interference (MMI) couplers 3-8
3.2.1 Approximate description of the guided modes 3-8
3.2.2 Multimode propagation and interference 3-11
3.2.3 Imaging and power splitting 3-13
3.2.4 A 2 × 2 MMI coupler 3-15
3.2.5 Comparison with rigorous numerical simulations 3-17
3.3 Fibre to chip coupling 3-19
3.3.1 Inverted optical taper (fibre to chip coupler) 3-22
3.3.2 Basic out-of-plane grating couplers 3-23
3.3.3 Advanced grating couplers 3-28
3.4 Ring and racetrack resonators 3-30
3.4.1 Silicon ring resonators with directional couplers 3-32
3.4.2 Ring resonator resonances 3-32
3.4.3 Ring resonators with a non-uniform waveguide 3-35
3.5 Mach–Zehnder interferometers 3-36
References 3-39
5 Devices 5-1
5.1 Ring resonator sensors 5-2
5.1.1 Ring resonators 5-2
5.1.2 Temperature sensors 5-3
vi
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Appendices
vii
Preface
viii
Silicon Photonics
ix
Further reading
Bibliography
[1] Westerveld W J 2014 Silicon photonic micro-ring resonators to sense strain and ultrasound
PhD Dissertation Technische Universiteit Delft, Delft http://repository.tudelft.nl
[2] de Vos K 2010 Label-free silicon photonics biosensor platform with microring resonators
PhD Dissertation Universiteit Gent, Belgium.
x
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[3] Marcuse D 1991 Theory of Dielectrical Optical Waveguides 2nd edn (San Diego, CA:
Academic)
[4] Sneyder A W and Love J D 1983 Optical Waveguide Theory (London: Chapman and Hall)
[5] Yariv A and Yeh P 2007 Photonics: Optical Electronics in Modern Communications
(Oxford Series in Electrical and Computer Engineering) (Oxford: Oxford University Press)
[6] Liu J-M 2005 Photonic Devices (Cambridge: Cambridge University Press)
[7] Reed G T and Knights A P 2004 Silicon Photonics: An Introduction (Chichester: Wiley)
[8] Reed G T (ed) 2008 Silicon Photonics: The state of the art (Chichester: Wiley)
[9] Pavesi L and Lockwood D J (ed) 2004 Silicon Photonics III (Berlin: Springer) doi:10.1007/
b11504
[10] Pavesi L and Lockwood D J (ed) 2011 Silicon Photonics III: Components and Integration
(Berlin: Springer) doi:10.1007/978-3-642-10506-7
[11] Pavesi L and Lockwood D J (ed) 2016 Silicon Photonics III: Systems and Applications
(Berlin: Springer)
[12] Vivien L and Pavesi L (ed) 2013 Handbook of Silicon Photonics (Boca Raton, FL: CRC
Press) doi:10.1201/b14668
[13] Bogaerts W, De Heyn P, Van Vaerenbergh T, De Vos K, Kumar Selvaraja S, Claes T,
Dumon P, Bienstman P, Van Thourhout D and Baets R 2012 Silicon microring resonators
Laser Photon. Rev. 6 47–73
[14] Feng S, Lei T, Chen H, Cai H, Luo X and Poon A 2012 Silicon photonics: from a
microresonator perspective Laser Photon. Rev. 6 145–77
[15] Vivien L, Cheben P, Lo Guo-Qiang P, Pavesi L and Zhou Z Introduction to the issue on
silicon photonics IEEE J. Sel. Top. Quantum Electron. 20 4
[16] GuoQiang P L, Chen Y, Poon A W O, Nakamura T and Chu T 2016 Introduction to the
issue on silicon photonics IEEE J. Sel. Top. Quantum Electron. 22 4
[17] Kindt J T and Bailey R C 2013 Biomolecular analysis with microring resonators:
applications in multiplexed diagnostics and interaction screening Curr. Opin. Chem. Biol.
17 818–26
[18] Baets R, Subramanian A Z, Dhakal A, Selvaraja S K, Komorowska K, Peyskens F,
Ryckeboer E, Yebo N, Roelkens G and Thomas N Le 2013 Spectroscopy-on-chip
applications of silicon photonics Proc. SPIE 8627 86270I
[19] Dhakal A, Wuytens P C, Peyskens F, Jans K, Thomas N L and Baets R 2016 Nanophotonic
waveguide enhanced raman spectroscopy of biological submonolayers ACS Photon. 3 2141–9
[20] Reed G T, Mashanovich G, Gardes F Y and Thomson D J 2010 Silicon optical modulators
Nat. Photon. 4 518–26
[21] Reed G T, Mashanovich G Z, Gardes F Y, Nedeljkovic M, Hu Y, Thomson D J, Li K,
Wilson P R, Chen S-W and Hsu S S 2013 Recent breakthroughs in carrier depletion based
silicon optical modulators Nanophotonics 3 229–45
xi
Authors biographies
Dr Wouter J Westerveld
Postdoctoral researcher at IMEC. Wouter J Westerveld received the
MSc degree in Applied Physics (cum laude, 2009) and the PhD
degree (cum laude, 2014) from Delft University of Technology, The
Netherlands. His multidiciplinary PhD research was on silicon
integrated optomechanical sensors to sense strain and ultrasound.
He worked as laser scientist at Mach8 Lasers, a startup (2014). He
was ultrasound engineer at Applus RTD, a global provider of non-
destructive testing services based in Rotterdam (2014–2016). He worked as post-
doctoral researcher at QuTech/Delft University of Technology on quantum control
and optical read-out of spins in diamond (2017). He currently works as postdoctoral
researcher at IMEC (Leuven, Belgium) on integrated optical ultrasound sensors.
He is interested in applied physics in general with special interest in silicon
photonics, integrated optomechanical sensors, and ultrasonic imaging.
Dr Ir Westerveld was secretary (2011) and chairman (2012) of the Student Board
of the IEEE Photonics Society Benelux chapter.
xii
List of symbols
xiii
Silicon Photonics
ΔλFSR free-spectral-range, see equation (3.71) for ring resonators and equation (3.91) for
Mach–Zehnder interferometers
μ permeability (sometimes also used as index)
μ0 vacuum permeability
ξ used in the description of modes of slab waveguides, equation (2.20), and
rectangular waveguides, figure 2.6.
τ straight-through transmission of a coupler, complex amplitude coefficient, see
equation (3.2) for directional couplers, figure 3.21b for use in a ring resonator,
and figure 3.21(a) for use in a Mach–Zehnder interferometer
χ (i ) linear and nonlinear susceptibilities
χ external physical parameter that influences the properties of a waveguide, used in
section 5.1.1, see equation (5.1)
Ψ two-dimentional description of the electric field in the waveguide, see equation (3.27)
Ω angular velocity
ω positive angular frequency
A0 amplitude
A1−10 amplitude coefficient used in the description of modes rectangular waveguides,
figure 2.6.
B physical magnetic field, B = μH
b waveguide dimension, waveguide label, mode label, or mode coefficient
b vector with modal amplitudes of backward propagating modes, used in section 4.2,
used in section 4.2
c velocity of light in vacuum
D electric displacement
d waveguide dimension
diag(e−iβνl ) diagonal matrices containing the propagation constants βν of each eigenmode ν of a
section l the length of this section
E electric field
Ec electric field in a directional coupler
E modal electric field, see equation (2.30)
Et Transverse components of modal electric field, Ex and Ey
ExSLAB(y ) profile of a waveguide mode along the y-direction, used in the description of MMI
couplers, see equation (3.25)
e Euler’s number e ≈ 2.7 or elementary charge e ≈ 1.6 · 10−19 coulombs
F functional to solve for propagation constant β of TE-modes in slab waveguides, see
equation (2.17)
f vector with modal amplitudes of forward propagating modes, used in section 4.2
G functional to solve for propagation constant β of TM-modes in slab waveguides, see
equation (2.29)
H magnetic field
H modal magnetic field, see equation (2.30)
Ht transverse components of modal magnetic field, Hx and Hy
I optical power
J volume current density
K K = n 2k 2 − β2 , see equation (2.45)
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Silicon Photonics
k wavenumber in vacuum, k = ω c
kx used in the description of modes of slab waveguides, equation (2.20), and
rectangular waveguides, figure 2.6
ky used in the description of modes of slab waveguides, equation (2.9), and rectangular
waveguides, figure 2.6
L length, e.g. length parallel waveguides in a directional coupler, or length of the wide
waveguide in an MMI coupler
∼ ∼
L effective length of directioal coupler L =L + ΔL with ΔL a term that takes coupling
in the bends of the coupler into account
Lπ beat length of the fundamental mode and the first mode of a waveguide,
πLπ = (β0 − β1)
ΔNe concentration of free electrons in a semiconductor material, used in section 5.2 and
appendix C
ΔNh concentration of free holes in a semiconductor material, used in section 5.2 and
appendix C
n material refractive index
ne effective refractive index of a waveguide mode, see equation (2.31)
ng effective group index of a waveguide mode, see equation (2.32)
nr effective refractive index of slab waveguide, see equation (3.18)
n̂ unit vector perpendicular to a defined plane
Δn change in refractive index used in section 5.2, see equation (5.15)
Ô operator describing Maxwell’s equations for waveguide modes as eigenvalue
problem with the propagation constant β as eigenvalue, see equation (2.37)
P time-averaged power, or, in section 5.1.6, pressure
pνμ projection of mode μ of waveguide b onto mode ν of waveguide a, see equation
(A.13)
Q charge density
R waveguide bend radius
R matrix of interface reflection coefficients, see section 4.2.3
r exticion ratio, see equation (3.73), or, in section 2.3.7, radial distance as shown in
figure 2.4
S Poynting vector, see equation (2.59)
∼
S S-matrix or scattering matrix, see equation (4.42)
Sρ local strain in the direction of a waveguide, see equation (5.12)
s coupling coefficient, see equation (3.5)
T (λ ) transmission spectrum
T matrix of interface transmission coefficients, see section 4.2.3
∼
T T-matrix, see equation (4.35)
t time
Umm measure of error in the extended Marcatili method associated with discontinuities of
the electromagnetic field at interfaces, see equation (2.91)
ΔU measure to compare two electromagnetic fields, relative energy of the difference of
the fields per unit of length in the propagation direction, see equation (2.92)
V potential
V0 built-in potential difference across a pn-punction, see appendix C
Vd applied potential difference across a pn-punction, see appendix C
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w waveguide width
wp, wn with of the carrier depletion aria in the p-type material and n-type material, of a pn-
junction respectively, see appendix C
x̂ unit vector in the x-direction
ŷ unit vector in the y-direction
ẑ unit vector in the z-direction
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IOP Publishing
Silicon Photonics
Electromagnetic theory
Wouter J Westerveld and H Paul Urbach
Chapter 1
Introduction
1.1 Photonics
In photonics, light is used as a carrier of information similar to electrons in
electronics. Photonics began with the invention of the laser in 1960. Other develop-
ments followed including: the laser diode, optical fibres for transmitting information
and the erbium-doped fibre amplifier. These inventions formed the basis for the
telecommunications revolution of the late 20th century and provided the infra-
structure for the internet [1]. Next to telecommunications, another major application
of photonics is sensing, for example in the medical, aviation, and construction
industries. For these applications, a number of optical components are required such
as laser sources, modulators to encode the light with an (electronic) signal, detectors,
multiplexers, and signal-splitters.
1-2
Silicon Photonics
References
[1] Wikipedia 2013 Photonics http://en.wikipedia.org/wiki/photonics
[2] Alferness R C 1997 Integrated optics: technology and system applications converge Opt.
Photon. News 8 16
[3] Corning Incorporated 2002 Corning® SMF-28™ optical fibre: Product information
[4] Soref R and Lorenzo J 1985 Single-crystal silicon: a new material for 1.3 and 1.6 μm
integrated-optical components Electron. Lett. 21 953–4
[5] Kurdi B N and Hall D G 1988 Optical waveguides in oxygen-implanted buried-oxide silicon-
on-insulator structures Opt. Lett. 13 175–7
[6] Cortesi E, Namavar F and Soref R A 1989 Novel silicon-on-insulator structures for silicon
waveguides SOS/SOI Technology Conf. 1989 IEEE p 109
[7] Abstreiter G 1992 Engineering the future of electronics Phys. World 5 36–9
[8] Soref R A 1993 Silicon-based optoelectronics Proc. IEEE 81 1687–706
1
The EU-funded ePIXfab consortium offers silicon photonic device fabrication at Imec (Leuven, Belgium),
CEA-LETI (Grenoble, France) or IHP (Frankfurt an der Oder, Germany) [39, 40]. A similar service is offered
by the OpSIS project based at the University of Washington in Seattle and the University of Delaware in
Newark, a consortium including the Institute of Microelectronics (IME, Singapore), Luxtera (headquarters in
Carlsbad, California), and STMicroelectronics (headquarters in Geneva, Switzerland) [41, 42].
1-3
Silicon Photonics
[9] Vlasov Y 2015 Silicon integrated nanophotonics: from fundamental science to manufactur-
able technology (Presented at SPIE Photonics West, San Francisco CA) http://dx.doi.org/
10.1117/2.3201503.15
[10] Christy P 2016 Intels silicon photonics products could change the world of IT www.intel.
com/content/www/us/en/architecture-and-technology/silicon-photonics/451-research-sil
icon-photonics-paper.html
[11] Liao L 2017 Intel silicon photonics: From research to product (presented at meeting of the
IEEE CPMT Chapter San Francisco Bay Area, Santa Clara CA) http://ewh.ieee.org/soc/
cpmt/presentations/cpmt1703a.pdf
[12] Painchaud Y et al 2014 Silicon-based products and solutions Proc. SPIE 8988
[13] Luxtera 2016 Luxtera ships one millionth silicon photonic transceiver product (presented at
the XLII European Conference on Opical Communication, ECOC 2016, Dusseldorf,
Germany) www.luxtera.com/press-releases
[14] Luxtera 2017 Luxtera ships Industry’s first 2x100G PSM4 silicon photonics embedded
optical modules (presented at the Optical Fiber Communication Conference, OFC 2017, Los
Angeles, USA) www.luxtera.com/press-releases
[15] Genalyte 2017 Silicon photonics biosensor technology www.genalyte.com/about-us/our-
technology/
[16] Chen C 2017 Silicon valley cash is still chasing blood despite theranos bust (Bloomberg)
www.bloomberg.com/news/articles/2017-01-06/silicon-valley-cash-is-still-chasing-blood-despite-
theranos-bust
[17] 2016 Belgian startup lands EUR 7M for optical glucose monitoring chip SPIE/Optics.org
http://optics.org/news/7/12/30
[18] Pavesi L and Lockwood D J (ed) 2016 Silicon Photonics III: Systems and Applications
(Berlin: Springer)
[19] Silverstone J W, Bonneau D, O’Brien J L and Thompson M G 2016 Silicon quantum
photonics IEEE J. Sel. Top Quantum Electron. 22 390–402
[20] Assefa S, Xia F, Green W M J, Schow C, Rylyakov A and Vlasov Y 2010 Cmos-
integrated optical receivers for on-chip interconnects IEEE J. Sel. Top. Quantum
Electron. 16 1376–85
[21] Assefa S, Xia F and Vlasov Y A 2010 Reinventing germanium avalanche photodetector for
nanophotonic on-chip optical interconnects Nature 464 80–5
[22] Michel J, Liu J and Kimerling L C 2010 High-performance Ge-on-Si photodetectors Nat.
Photon. 4 527–34
[23] Liang D and Bowers J E 2010 Recent progress in lasers on silicon Nat. Photon. 4 511–7
[24] Lockwood D and Tsybeskov L 2014 Fast light-emitting silicon-germanium nanostructures
IEEE J. Sel. Top. Quantum Electron. 20 225–31
[25] Roelkens G, Liu L, Liang D, Jones R, Fang A, Koch B and Bowers J 2010 III-V/silicon
photonics for on-chip and intra-chip optical interconnects Laser Photon. Rev. 4 751–79
[26] Heck M, Bauters J, Davenport M, Doylend J, Jain S, Kurczveil G, Srinivasan S, Tang Y and
Bowers J 2013 Hybrid silicon photonic integrated circuit technology IEEE J. Sel. Top.
Quantum Electron. 19 6100117
[27] Duan G-H et al 2014 Hybrid III–V on silicon lasers for photonic integrated circuits on silicon
IEEE J. Sel. Top. Quantum Electron. 20 158–70
[28] Roelkens G et al 2015 III-V-on-silicon photonic devices for optical communication and
sensing Photonics 2 969–1004
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1-5
IOP Publishing
Silicon Photonics
Electromagnetic theory
Wouter J Westerveld and H Paul Urbach
Chapter 2
Waveguides
Figure 2.1. Refractive index n of (a) silicon and (b) silicon dioxide, plotted as a function of wavelength.
∇ × H = ıωϵE , (2.2)
∇ · ϵE = 0, (2.3)
∇ · H = 0, (2.4)
with vacuum permeability μ0, permittivity ϵ, positive angular frequency ω, and time
evolution e ıωt . The last two equations (2.3) and (2.4) are not independent and follow
directly from the first two equations (2.1) and (2.2), as the divergence of the curl of a
vector field is zero. The refractive index is defined by n = ϵ /ϵ0 , with ϵ0 the vacuum
permittivity. The permeability ϵ(x , y, z ) profile describes how the devices (e.g.
waveguides, couplers, etc) look, and ultimately determine how the electromagnetic
fields behave.
Electromagnetic fields in a homogeneous isotropic medium obey the Helmholtz
wave equation
(∇2 + n 2k 2 )E = 0, (2.5)
(∇2 + n 2k 2 )H = 0, (2.6)
with k = ω /c the wavenumber in vacuum [2, chapter 9]. When using the wave
equation for homogeneous media, it is necessary to apply interface conditions to
ensure that the solutions also obey Maxwell’s equations across interfaces. If care is
taken that the electric and magnetic fields are free of divergence, equations (2.3) and
(2.4), then the four interface conditions are that the tangential components of the
electric E and magnetic H fields are continuous [2, chapter 7]. Otherwise, one also
has to impose boundary conditions for the normal components.
2-2
Silicon Photonics
slab waveguide. A slab waveguide is a layer sandwiched between two layers with a
lower refractive index. This basic structure demonstrates the concept of modes, and
our description of rectangular waveguides (section 2.4) is strongly related to the
equations derived for the slab waveguide. Light propagation through a slab
waveguide may be described by ray optics, even when the waveguide height is
only half a wavelength (see [3–5]). We, however, directly use wave optics.
Figure 2.2 depicts a slab waveguide. For now, we use the coordinate frame in
figure 2.2(a), in which the z-direction coincides with the direction of propagation of
the wave and the y-direction is normal to the slab. In section 2.2.2 (figure 2.2(b)), we
will use a different coordinate frame because that will be useful in the description of
rectangular waveguides (section 2.4). We simplify the analysis by assuming that
there is no variation of the electromagnetic fields in the transverse x-direction
(∂/∂x = 0), and indeed slab waveguides are infinitely wide. Maxwell’s equations
(2.1–2.4) actually include eight equations as Faraday’s law (2.1) and Ampère’s law
(2.2) are vectorial. Substituting ∂/∂x = 0 in these equations shows that they decouple
in equations either with Ex , Hy and Hz , or with Hx , Ey and Ez . Solutions to the first set
of equations are classified as transverse electric (TE) modes because the electric field
E = Exx̂ is transverse to the direction of propagation. Solutions of the second set of
equations are classified as transverse magnetic (TM) modes because H = Hx x̂ .
Figure 2.2. Silicon-on-insulator slab waveguide with height 600 nm. (a,b) Sketches of cross sections. The slab is
depicted horizontally by the grey area. Waves propagate in the z -direction, i.e., orthogonal to the (x, y )-plane
depicted here (i.e., into the paper or screen). (a) TE-modes. Coordinate frame. Electric fields of the three
supported guided modes. (b) TM-modes. Coordinate frame. Magnetic fields of the three supported guided
modes. (c) Graphical method to solve equation (2.17) for TE modes. Tangential term (dashed line) and fraction
term (solid line) both plotted versus the effective index ne , = β /k. Then ky = k 2n12 − β 2 = k 2n12 − k 2ne2 .
The three crossings correspond to the solutions plotted in (a). In section 2.2, n2 = n 4 and n3 = n5. We chose
different labels of the cladding refractive indices for the TE- and TM-modes (n 4 , n5 and n2 , n3) because that will
be useful in section 2.4.
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Silicon Photonics
2.2.1 TE modes
In figure 2.2(a), the TE-modes in a 600 nm high silicon-on-insulator slab waveguide
are sketched. Transverse electric modes have only three non-zero field components:
Ex , Hy and Hz . The magnetic components can be computed from the electric
component, so that Ex uniquely defines the electromagnetic fields. We look for
monochromatic propagating wave solutions, i.e., solutions in the form
E = Ex(y )e ı(ωt−βz )xˆ , (2.7)
with propagation constant β. Subsituting this in equation (2.5) gives
∂ 2Ex
= (β 2 − k 2n 2 )Ex. (2.8)
∂y 2
Depending on the sign of (β 2 − k 2n 2 ), the solutions of this equation are either
standing waves or exponential functions of y. Fields that exponentially increase in
the cladding with the distance to the core are not physical. The slab acts as a
waveguide when k 2n12 > β 2 > k 2n 42 , k 2n52 . In this case, the electric field inside the
core (n1) is a standing wave, while the field exponentially decays in the cladding. The
light is thus confined to the core. For β 2 > k 2n12 , the wave is above the cutoff of all
materials and does not propagate. For β 2 < k 2n 42 , k 2n52 , the wave propagates in the
upper/lower cladding and is not confined to the core. For guided waves, equation
(2.8) has the solutions
⎧C exp[ −γ5(y − b /2)] , upper cladding y > b /2,
⎪
Ex(y ) = ⎨ A cos⎡⎣ky(y + η)⎤⎦ , core b /2 ⩾ y ⩾ −b /2, (2.9)
⎪
⎩ B exp[γ4(y + b /2)] , lower cladding y < −b /2,
with
ky = k 2n12 − β 2 , (2.10)
γj = β 2 − k 2n j2 = k 2(n12 − n j2 ) − k y2 , j = 4, 5, (2.11)
and η a real constant. Expression (2.9) obeys Maxwell’s equations in all three layers
of the slab, but it also has to obey these equations at the interfaces. Electromagnetic
interface conditions demand continuity of the tangential electromagnetic field
components. Continuity of Hz in combination with Faraday’s law (2.1) and
∂/∂x = 0 are equivalent to the continuity of ∂Ex /∂y . We first calculate the relations
that follow from these conditions and then discuss their meaning.
⎧ − γ5C exp[ −γ5(y − b /2)] , upper cladding,
∂Ex ⎪
= ⎨− kyA sin⎡⎣ky(y + η)⎤⎦ , core, (2.12)
∂y ⎪
⎩ γ4B exp[γ4(y + b /2)] , lower cladding.
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Silicon Photonics
In the description of the modal electric field, equation (2.9), B and C follow from
equations (2.13) and (2.15), respectively. The amplitude A is a normalization factor,
describing the amount of light in the mode, which does not follow from the interface
conditions. Note that the propagation constant β follows from ky via equation
(2.10). Equations (2.14) and (2.16) are two coupled equations for ky and η. By
eliminating η1, we find the following equation for ky
ky(γ4 + γ5)
F (ky, k , n1, n 4, n5, b) ≡ tan⎡⎣kyb⎤⎦ − = 0. (2.17)
k y2 − γ4γ5
For a given slab waveguide (n1, n4, n5, b) and angular frequency (k = ω /c ), Maxwell’s
equations thus demand ky to obey equation (2.17). Every solution ky of equation
(2.17) with 0 < ky < k · min⎡⎣ n12 − n 42 , n12 − n52 ⎤⎦ corresponds to a guided TE
mode. Depending on the slab waveguide, equation (2.17) has zero or more solutions
for guided waves with β between n1k and the higher value of n 4k and n5k . The tangent
is periodic and therefore multiple solutions may exist (see figure 2.2(c)). We hereby
demonstrated that a waveguide has a finite number of modes for a given frequency ω.
Each mode has its own distinct propagation constant β and modal field E (y ).
2.2.2 TM modes
Transverse magnetic modes have the magnetic field transverse to the propagation
direction. Although annoying now, we switch to a different coordinate frame in
which the x-direction is normal to the slab (see figure 2.2(b)), because this will be
convenient when treating the rectangular waveguide. In the considered frame, the
non-zero electromagnetic field components are Hy , Ex , and Ez . The waveguide is
infinitely wide in the y-direction and ∂/∂y = 0. Analogue to the derivation of TE
modes, we look for propagating wave solutions
H = Hy(x )e ı(ωt−βz )yˆ , (2.18)
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with
k x2 = k 2n12 − β 2 , (2.21)
n12 γ2
tan[kx(ξ − d /2)] = − , (2.26)
n 22 kx
n12 γ3
tan[kx(ξ + d /2)] = − . (2.28)
n 32 kx
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Combining2 equations (2.26) and (2.28) gives the following equation for kx, or
equivalently for propagation constant β:
n12kx(n 22γ3 + n 32γ2 )
G (kx, k , n1, n2 , n3, d ) ≡ tan[kxd ] − = 0. (2.29)
k x2n 22n 32 − n14γ2γ3
2 tan[kx(d / 2 + ξ )] + tan[kx(d / 2 − ξ )]
tan[kxd ] = tan[kx(d /2 + ξ ) + kx(d /2 − ξ )] = 1 − tan[kx(d / 2 + ξ )] tan[kx(d / 2 − ξ )]
, using [6, equation (2.174)] for the
second equality sign.
⎛ ∂Ez + ıβE ⎞ ⎛ ∂Hz + ıβH ⎞
⎜ ∂y y ⎟ ⎛− ıωμ0 Hx ⎞ ⎜ ∂y y ⎟
⎛ ıωϵEx ⎞
3 ⎜ ∂Ez ⎟ ⎜ ⎟ ⎜ ∂Hz ⎟ ⎜ ⎟
Written in Cartesian components: ⎜− ıβEx − ∂x ⎟ = ⎜− ıωμ0 Hy ⎟, and ⎜− ıβHx − ∂x ⎟ = ⎜ ıωϵEy ⎟.
⎜ ∂Ey ⎜ ⎟ ⎜ ⎟
⎜ ∂Ex ⎟ ⎟ ⎝− ıωμ0 Hz ⎠
⎜ ∂Hy
⎜ ∂Hx ⎟ ⎟ ⎝ ıωϵEz ⎠
⎝ ∂x − ∂y ⎠ ⎝ ∂x − ∂y ⎠
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∇β × E = −ıωμ0H, (2.34)
∇β × H = ıωϵE, (2.35)
with
∂ ∂
∇β = xˆ + yˆ − ıβzˆ. (2.36)
∂x ∂y
We may describe the propagation of light through waveguides as an eigenvalue
problem with the propagation constant β as eigenvalue. By eliminating the
longitudinal components Ez and Hz from Maxwell’s equations, one obtains the
following eigenvalue problem for the transverse components only
⎛ Ex(x , y ) ⎞ ⎛0⎞
⎜ ⎟
E y (x , y ) ⎟ ⎜0⎟
(Oˆ − β )⎜ = ⎜ ⎟, (2.37)
⎜ Hx(x , y )⎟ ⎜ 0 ⎟
⎜ ⎟
⎝ Hy(x , y )⎠ ⎝ 0 ⎠
ı ⎛ ∂Hx ∂Hy ⎞
Ez = ⎜ − ⎟. (2.39)
ωϵ ⎝ ∂y ∂x ⎠
Substituting equation (2.39) in the x- and y-components of Faraday’s law (2.34) and
substituting equation (2.38) in the x- and y-components of Ampères law (2.35) gives
a set of four equations which are linear in Ex, Ey, Hx and Hy. Rearranging these
equations to the form of equation (2.37) gives
⎛ ∂ 1 ∂ ∂ 1 ∂ ⎞
⎜ 0 0 − ⎟
⎜ ∂x ωϵ ∂y ∂x ωϵ ∂x ⎟
⎛0 0 0 ωμ 0 ⎞ ⎜ 0 0 −
∂ 1 ∂ ∂ 1 ∂ ⎟
⎜ ⎟ ⎜ ∂y ωϵ ∂y ∂y ωϵ ∂x ⎟
0 0 − ωμ 0 0 ⎟ + ⎜ ⎟.
Oˆ = ⎜ (2.40)
0 ⎟⎟ ⎜ 1 ∂ ⎟
2 −1 ∂ 2
⎜⎜ 0 − ωϵ 0 0 0
⎝ ωϵ 0 ⎜ ⎟
0 0 ⎠ ⎜ ωμ 0 ∂x∂y ωμ 0 ∂x 2
⎟
⎜ 1 ∂2 −1 ∂ 2 ⎟
⎜ 0 0 ⎟
⎝ ωμ 0 ∂y 2 ωμ 0 ∂y∂x ⎠
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Figure 2.3. Sketch of eigenvalues β of the eigenvalue problem in equation (2.37) with (2.40) showing guided,
radiation and evanescent modes. The refractive index of the core and cladding of the guide are n1 and n2 ,
respectively and k is the wave number in free space. The discrete number of guided modes, marked by x, lie on
the real axis in the interval kn2 > ∣β∣ > kn1. The continuum of radiation modes are given by ∣β∣ ⩽ kn2 . The
continuum of evanescent modes lie on the imaginary axis. See [7–9].
The solutions of the eigenvalue problem equation (2.37 with 2.40) are called modes
and the eigenvalues β are called propagation constants. Different types of modes are
associated with different eigenvalues β (see figure 2.3). The operator Ô is not
symmetrical, let alone self-adjoint, with respect to the usual L2 scalar product. Note
that for every guided wave (Ex, Ey, Hx, Hy) with positive propagation constant β,
guided wave (Ex, Ey, −Hx, −Hx) corresponds to negative propagation constant −β.
Let n1 and n2 be the refractive index of, respectively, the core and the cladding of
the waveguide. Similar to the slab waveguide, guided modes propagate along the
guide in the z direction. The guided modes have real propagation constants β with
kn2 > ∣β∣ > kn1 and there are finitely many of them. There is a continuum of
radiation modes which have real propagation constants β with ∣β∣ ⩽ kn2 . There is
furthermore a continuum of evanescent modes with imaginary propagation con-
stants β. In section 2.3.6 we explain in more detail the generally used assumption
that an arbitrary field can, in every cross-sectional plane z = constant, be written as a
superposition of the electromagnetic fields of the guided, radiation and evanescent
modes.
It is relevant to note that the operator, Ô , and the eigenvalues, β, of guided modes
are real. Therefore, we may choose the eigenfunctions of guided modes
(Ex, Ey, Hx, Hy ) to be real4. Hence all transverse electromagnetic field components
of the guided modes are in phase.
4
Proof: Let a real number β be the eigenvalue of a real operator Ô with a corresponding complex eigenfunction
u = u′ + ıu″, with real u′ and u″. Then the eigenproblem (Oˆ − β )u = 0 separates into (Oˆ − β )u′ = 0 and
(Oˆ − β )u″ = 0 . As both equations are identical, they span the same eigenspace, and we may thus choose the
real eigenspace as basis.
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section 2.4. Solving equations (2.34) and (2.35) for the transverse field components
gives5
−ı ⎛ ∂Ez ∂H ⎞
Ex = ⎜β + ωμ0 z ⎟ , (2.41)
K ⎝ ∂x
2
∂y ⎠
−ı ⎛ ∂Ez ∂H ⎞
Ey = ⎜β − ωμ0 z ⎟ , (2.42)
K ⎝ ∂y
2
∂x ⎠
−ı ⎛ ∂Hz ∂E ⎞
Hx = ⎜β − ωϵ0n j2 z ⎟ , (2.43)
K ⎝ ∂x
2
∂y ⎠
−ı ⎛ ∂Hz ∂E ⎞
Hy = ⎜β + ωϵ0n j2 z ⎟ , (2.44)
K ⎝ ∂y
2
∂x ⎠
with
K (x , y ) = n( x , y ) 2 k 2 − β 2 . (2.45)
5
Equation (2.41) follows from solving the y-component of equation (2.34) for Hy, and substituting this in the
x-component of equation (2.35). Analogously, equation (2.42) follows from solving the x-component of
equation (2.34) for Hx, and substituting this in the y-component of equation (2.35). Equation (2.43) follows
from solving the y-component of equation (2.35) for Ey, and substituting this in the x-component of equation
(2.34). Equation (2.41) follows from solving the x-component of equation (2.35) for Ex, and substituting this in
the y-component of equation (2.34).
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2.3.3 Orthogonality
We will derive the orthogonality relation which modes in a waveguide obey.
Consider two modes in the form of equation (2.30), labelled 1 and 2. A vector
identity6 implies
∇ · (E1 × H*2) = H*2 · (∇ × E1) − E1 · (∇ × H*2), (2.47)
as before * denotes the complex conjugate. Then we use Faraday’s law (2.1) and
Ampère’s law (2.2) in the first and second terms on the right-hand-side of equation
(2.47), respectively, to obtain
∇ · (E1 × H*2) = ıω(ϵE1 · E *2 − μ0H1 · H*2). (2.48)
Now we exchange labels 1 and 2 in equation (2.48), take the complex conjugate, and
add the result to equation (2.48). This gives
∇ · (E1 × H*2 + E *2 × H1) = 0. (2.49)
Modes 1 and 2 are waveguide modes of the form of equation (2.30), and therefore
equation (2.49) can be written as
∇ · (E1 × H2* + E2* × H1)e ı(β2−β1)z = 0, (2.50)
where the equation has been divided by the factor e ı(β2−β1)z . We now use a two-
dimensional version of the divergence theorem8 where we integrate equation (2.51)
over a circular disc S in a cross-sectional plane z = constant of the waveguide:
with n̂ the unit vector in the (x , y) plane perpendicular to the circle ∂S and outward
pointing with respect to S. The field of guided modes decrease exponentially with
distance to the guide. Therefore the contour integral over the circle ∂S vanishes in
the limit of infinite radius R → ∞ and equation (2.52) becomes
+∞
1
4
∬−∞ (E1 × H2* + E2* × H1) · zˆ dxdy = 0 if β2 ≠ β1. (2.53)
6
∇ · (a × b) = b · (∇ × a) − a · (∇ × b) [6, equation 2.53]
7
∇ · (f a) = f (∇ · a) + a · (∇f ) [6, equation 2.50]
8
A special case of the divergence theorem follows by specializing it to the plane instead of a volume [2, 10].
Letting S be a region in the plane with boundary ∂S , the divergence theorem then simplifies to
∬S ( ∂∂x xˆ + ∂∂y yˆ ) · a dA = ∮∂S a · nˆ dS .
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Note that the orthogonality in equation (2.57) is not true for a forward propagating
mode and its backward propagating counterpart as their propagation constants β
have equal absolute value.
Similar to the derivation of equations (2.53) and (2.57) one can derive orthogon-
ality relations without complex conjugation. For the derivation we refer to [9, chapter
31]. For modes propagating in the same direction one finds the orthagonality:
1
2
∬ (E1 × H2) · zˆ dxdy = 0 if β2 ≠ β1 . (2.58)
It follows from equations (2.37) and (2.40) that the transverse electric and magnetic
fields of guided modes are in phase hence the integral at the right of equation (2.60)
is real for guided modes. This can be seen as follows: when the transverse field Et, Ht
is eigenfield of the operator Ô with real eigenvalue β, also Et*, Ht* is eigenfield with
eigenvalue β and hence so are Re{Et}, Re{Ht }. Since the propagation constants β of
the guided and radiation modes are real we conclude that the transverse field
components Et, Ht of the guided and the radiation modes may be asssumed to be
real. Hence for these modes the integral between the brackets in equation (2.60) is
real and taking the real part is superfluous. Furthermore, the expressions (2.57) and
(2.58) are identical when the fields of the modes are chosen real. Note that for
evanescent fields, the integral in equation (2.60) is purely imaginary because for
evanescent modes the power flow in the z-direction vanishes.
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⎜H ⎟ ∑ai (z ) ⎜ (i )⎟eı(ωt−βiz )
⎜ Hx ⎟
⎜ x⎟ i=1
⎜⎜ (i ) ⎟⎟
⎝ Hx ⎠
⎝ Hy ⎠
guided
⎛ Ex (β ; x , y ) ⎞
⎜ ⎟
+kn 2 ⎜ Ey (β ; x , y ) ⎟ ı(ωt − βz )
+ ∫ −kn 2
b (β ; z ) ⎜
Hx (β ; x , y )⎟
e dβ (2.63)
⎜⎜ ⎟⎟
⎝ Hy (β ; x , y )⎠
radiation
⎛ Ex (β ; x , y ) ⎞
⎜ ⎟
+ı ∞ ⎜ Ey (β ; x , y ) ⎟ ı(ωt − βz )
+ ∫−ı ∞
c (β ; z ) ⎜
Hx (β ; x , y )⎟
e dβ
⎜⎜ ⎟⎟
⎝ Hy (β ; x , y )⎠
evanescent
where Ex, Ey, Hx, and Hy are the transverse components of the modes, of frequency
ω, of the given waveguide with cladding refractive index n2. Here, ai (z ), b(β; z ) and
c(β; z ) are the complex coefficients of the guided, radiation and evanescent modes,
respectively, which are all functions of z. The number N is the number of forward
propagating guided modes. Figure 2.3 shows the complex propagation constants β
of the different types of modes. So far, the conjecture has been proven for two-
dimensional lossless optical components, including TE- and TM-modes in slab
waveguides [8, 13]. The conjecture is often assumed to hold also in general, and
although no counter-examples are known, it seems that a mathematical proof for the
general case has not been given (see [8, chapter 2] for details).
One might compare this expansion with spatial Fourier decomposition, in which
an arbitrary function f (x , y ) can be written as an infinite superposition of spatial
harmonic functions.
We introduce a short-hand notation of equation (2.63) by writing the second and
third terms as a summation. The modal amplitudes ai (z ), b(β; z ) and c(β; z ) are
lumped together in ai with infinite i. This gives
∞
Et(x , y , z , t ) = ∑ ai(z )Et(i )(x, y )e ıωt , (2.64)
i=0
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∞
Ht (x , y , z , t ) = ∑ ai(z )Ht(i )(x, y )e ıωt. (2.65)
i=0
with the summation running over all modes including discrete and continuum
modes, both in forward and backward direction, with Et , Ht a time harmonic
electromagnetic field that satisfies Maxwell’s equations for an arbitrary permittivity
profile, with Et(i )(x , y ), Ht(i )(x , y ) the transverse components of the modes of a given
waveguide and with ai (z ) are the modal coefficients which are functions of z.
Subscript t denotes the transverse field components x and y.
In a numerical implementation one would discretize the integrals over the
radiation and evanescent waves so that a summation would then anyway be
obtained. It is also possible to achieve a discrete set of modes using the approx-
imation that the waveguide is contained in a large cylinder with a perfectly
conducting metal wall. This cylinder enforces the tangential components of the
electric fields to vanish at the wall due to which the radiation and evanescent modes
form a discrete set.
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remain a good approximation when this amplitude varies slowly compared to the
other variations of the electromagnetic fields.
Waveguide bends
For waveguide bends with radii R much larger than the width of the waveguide, it is
reasonable to approximate the modes in the bend as the modes of the locally straight
waveguide. We will show that radiation loss in waveguide bends is lower when the
bending radius is larger and when the refractive index contrast is higher. We assume
that the phase front of a mode in a bent waveguide has an angular velocity Ω and
that the velocity vz of the light at a distance r′ from the center of the waveguide reads
vz = (R + r′)Ω , (2.67)
see figure 2.4. We approximate the phase velocity in the center of the waveguide by
the phase velocity of the mode in a straight waveguide, i.e., vz = ω /β for r′ = 0. The
phase front of a mode in a bent waveguide thus has angular velocity
ω
Ω= . (2.68)
βR
Around the waveguide, the velocity of the light, vz, is similar to the value ω /β at the
center, because the width of the waveguide is much smaller than the bending radius.
However, this velocity increases with increasing distance from the center of the
guide. In the cladding at a certain distance r from the center of the waveguide, the
required velocity exceeds the velocity of unguided light in the cladding (c /n2 ), leading
to radiation. We find this distance r by solving vz = c /n2 , equation (2.67) and
equation (2.68) for r [14],
⎛ β − n2k ⎞
r=R⎜ ⎟. (2.69)
⎝ n2k ⎠
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cannot travel fast enough to keep up with the mode. As a result, they split away and
radiate into the cladding.
The strength of the radiation scales with the amount of the modal electromagnetic
field that is located further than the distance r from the center of the waveguide. As
can be seen in equation (2.69), a large bending radius R implies a large r, thus lower
radiation loss. High index contrast waveguides have modes that are strongly
confined around the waveguide and smaller field values at distances larger than r.
Moreover, the difference between β and kn2 is generally large for lower order modes
in high-index-contrast waveguides. Therefore sharp bends in silicon waveguide have
in general lower radiation loss than waveguides of the same geometry with lower
index contrast.
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Figure 2.5. Cross-section of a SOI waveguide. (a) Waveguide definition. Sketch of the Ex component of the
fundamental mode in colour. (Dark blue represents large Ex , white represents Ex = 0 .) (b) Outline of the
approximate analytical method.
β= n12k 2 − k x2 − k y2 , (2.70)
γ2 = (n 1
2
)
− n 22 k 2 − k x2 , γ3 = (n 1
2
)
− n 32 k 2 − k x2 , (2.71)
γ4 = (n 1
2
)
− n 42 k 2 − k y2 , γ5 = (n 1
2
)
− n 52 k 2 − k y2 . (2.72)
Equations (2.71) and (2.72) are identical to equations (2.22) and (2.11). The errors of
the approximation manifest themselves at the interfaces between the core and the
cladding of the waveguide. Field amplitude A1 is employed to normalize the mode to
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Figure 2.6. (a) Shape of the dominant electric field component Ex . The dominant magnetic field component Hy
has the same shape. (b) Ansatz describing the modal electromagnetic field in terms of Ez and Hz . The gray
background colour sketches the waveguide such that the mode is a ‘TE-like’ mode.
a power flux of unity. The remaining free parameters that still have to be determined
are A2–A10, ξ, η, kx and ky (13 in total, also see figure 2.6(b)).
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βky
A2 = A1, (2.73)
ωμ0kx
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together with
n12 γ2
tan[kx(ξ − d /2)] = − , (2.85)
n 22 kx
n12 γ3
tan[kx(ξ + d /2)] = . (2.86)
n 32 kx
Equations (2.81)–(2.84) follow directly from the continuity of Ez and Hz. The
continuity of Ey and Hy is most easily verified by substituting equations (2.80)–(2.86)
into the remaining electromagnetic boundary conditions. With these field ampli-
tudes A2–A6, the magnetic field component Hx is zero in regions 1, 2 and 3, as
follows from equation (2.43). The last two equations, (2.85) and (2.86), may be
recognized as the eigenvalue equations of a TM mode in a slab waveguide, (2.26)
and (2.28), despite the fact that our ansatz does have variation in the y-direction.
These two equations determine kx, using equation (2.29), and ξ. With kx and ky, β
follows from equation (2.70).
It can be seen that the horizontal and the vertical interfaces require a different
ratio A2 /A1, i.e., a different Hz /Ez in the core. Thus the ansatz has no solutions that
exactly obey the boundary conditions at all interfaces simultaneously. In what
follows, the 13 free parameters are chosen such that the error in the 16 boundary
conditions is minimal.
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Figure 2.7. Approximate analytical model compared with rigorous mode solver (FMM method). Typical
rectangular silicon-on-insulator waveguides with air cladding. (a, b) 220 nm high, fundamental mode. (c–f) 300
nm high, first 3 modes: TE0, TM0, TE1. We omitted one zero from conventional notation (e.g. TE 00 ), because
our waveguides have higher-order standing waves only in the direction of the width of the waveguide. (a–c)
Effective index. (b, d, e, f) Energy in the difference field between the two approximate methods and the
rigorously computed field, normalized to the energy in the rigorously computed field, i.e., equation (2.92).
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propagating modes in these guides, knj ≈ β because modes are not guided otherwise,
so kx, ky < <knj . Choosing Ey = 0 gives a modal field profile that is continuous on
the horizontal interfaces, while it approximately satisfies the conditions on the
vertical interfaces when neglecting terms of the order of (kx /knj )2 . However, for
high-index-contrast guides, these terms can be even larger than one.
⎛ k 2(n12 − n 22 ) ⎞
A4 = A2 ⎜1 + ⎟ cos[kx(ξ − d /2)], (2.88)
⎝ β2 ⎠
⎛ k 2(n12 − n 32 ) ⎞
A6 = A2 ⎜1 + ⎟ cos[kx(ξ + d /2)]. (2.90)
⎝ β2 ⎠
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this error is the average energy density that is associated with these discontinuities,
defined by:
ϵ μ
Umm = 0 (n++n−)2 · νˆ × (E + − E −) 2 dl + 0
∮ ∮νˆ × (H + − H −) 2 dl . (2.91)
4l l
The four interfaces of the waveguide are all included in the integral. The line integral
runs along the entire circumference of the waveguide in the (x , y )-plane, and
l = 2(b + d ) is the length of this circumference. E + and E − are the electric fields
just outside and inside the waveguide core region 1, so that (E + − E −) represents the
discontinuity of this field, and ν̂ is a unit vector orthogonal to the waveguide surface.
The cross product of ν̂ with the discontinuity in the field selects the tangential
components. n+ and n− are the refractive indices just outside and inside the
waveguide. At the interface, an average refractive index (n+ + n−)/2 is assumed to
calculate the energy density of the electric field components. The error Umm can be
intuitively interpreted as an energy density and with this definition of the error we
guarantee that the electric and magnetic components get appropriate similar
weightings. However, we cannot attach a rigorous physical meaning to this error
Umm . The discontinuity of the fields only occurs at interfaces, which have no physical
volume. Therefore the energy density cannot be integrated over volume in order to
obtain a total energy.
The value of Umm is minimized as a function of the amplitudes A2–A10, while ky and
η are determined from equations (2.78) and (2.79) and kx and ξ are determined from
equations (2.85) and (2.86). We determined the minimum of Umm numerically using an
unconstrained non-linear optimization as implemented in Matlab [19]. As an initial
estimate we use the modal amplitudes as computed using the previously described
improved Ey ≈ 0 method. However, equation (2.91) is quadratic in the amplitudes
A2–A10 and the minimum can thus be found analytically. Method 3 is also referred to
as amplitude optimization method, because the amplitudes A2, . . . , A10 are optimized.
Comparison
We have presented one approximate method to compute the propagation constant,
or effective index, of the modes in rectangular waveguides. Given this propagation
constant, we presented three different methods that approximate the field of these
modes: (1) Marcatili’s original approach, (2) a method based on continuity of the
dominant electromagnetic field components, and (3) a method based on minimiza-
tion of the discontinuities of the electromagnetic fields.
In figure 2.7(b) and figure 2.7(d–f), we compare modal fields computed with the
approximate methods with the fields computed with a rigorous numerical mode solver.
The measure that is used to compare two electromagnetic fields is the relative energy of
the difference of the fields per unit of length in the propagation direction, i.e.,
ΔU = (2.92)
∬regions 1−5 (n2ϵ0 EN + μ0 HN )dxdy
2 2
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where EA and EN are the analytically and rigorous numerically calculated fields,
respectively. This integral runs over all regions that are described by the analytical
solution.
It is clear that something interesting happens for waveguides with dimensions
around 833 nm width by 300 nm height. This is at the point of the apparent crossing
of the propagation constants of the TM0 and TE1 modes (see figure 2.7(c)), and this
case is addressed in the next section. Apart from this special case, the relative errors
of the method with continuity of the dominant field components is below 3%, and
the relative error of the method in which the energy associated with the discontinues
is minimized is even lower. Both methods outperform Marcatili’s original approach
for these typical SOI waveguides with high index contrast. The amplitude optimi-
zation method, which minimizes the energy associated with the discontinuities, has
the advantage that it is works for both ‘TE-like’ and ‘TM-like’ modes.
Figure 2.8. Investigation of the avoided crossing of effective indices of two modes. (a) Numerically calculated
effective indices of the 2nd and 3rd mode, zoom-in of figure 2.7(c). (b) Power in the TM0-like mode when the
fields of the modes in plot (a) are written as a superposition of a TM0-like and a TM1-like mode. The curves in
plot (a) are colour-coded accordingly. (c) Relative energy in the electromagnetic difference field between the
superposition and the rigorous numerically calculated fields, to be compared with figure 2.7 (e) and (f).
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and TE1-like, ETE1 modes. The TM0-like and TE1-like modes were calculated using
the approximate amplitude optimization method. Thus
EiN ≈ aETM0 + bETE1, (2.93)
for some real a and b, and i = 2 or 3. The phase of mode Ei is chosen such that
coefficient b is positive. The coefficient a of the TM0-like mode can be either positive
or negative. The approximate calculated modes E TM0 and E TE1, are in good
approximation orthonormal such that normalization of the guided modes Ei in
the norm of equation (2.96) implies b = 1 − a 2 .
The coefficient a of the TM0-like mode is optimized such that the difference
measured using equation (2.92) between the left- and right-hand sides of equation
(2.93) is minimum. The result is plotted in figure 2.8(b), where it can be seen that
mode 2 looks like a TM0-mode at the left of the crossing, while it looks like a TE1-
like mode on the right-hand-side of the crossing, whereas close to the crossing the
modes are an equal mixture of ETM0 and ETE1. In figure 2.8(c), it can be seen that the
error between the superposition Ei and the rigorous numerically calculated field EiN
close to the apparent crossing is small and similar to the error that was found away
from the crossing (see figure 2.7(e), (f)). Therefore we may indeed conclude that the
field around the crossing can be written as a superposition of modes of the types that
are present away from the crossing. Figure 2.9 presents the electric fields ETM0, ETE1,
E2N and E3N for a 833 nm wide by 300 nm high waveguide, where a 2 ≈ b2 ≈ 0.5. At
avoided crossing, Marcatili’s method completely breaks down.
Using the previous observations, we will derive a qualitative description of this
avoided crossing. We consider forward propagating guided modes with positive βi .
The guided modes are normalized such that they carry unit power. In section 2.3, we
formulated Maxwell’s equations as an eigenvalue problem of operator Ô , with the
propagation constant βi as eigenvalue. The operator Ô is not symmetric. However,
forward-propagating guided modes are orthonormal with respect to the relation
given by equation (2.57). We adopt bra-ket notation where a mode with label i is
described by ∣i 〉, equation (2.37) is written as:
Oˆ ∣i〉 = βi ∣i〉, (2.94)
the scalar product 〈i∣ j〉 is defined by:
1
i j ≡
2
∬ (E1 × H2*) · zˆ dxdy, (2.95)
In this book, we informally call equation (2.95) a scalar product but in fact it does
not meet all the requirements to be a scalar product and the correct mathematical
description is a sesquilinear form.
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Figure 2.9. Amplitudes of the electric field components of different modes in a 833 nm wide by 300 nm high
waveguide. The dashed lines separate the different regions (see figure 2.5). Modes E TM0 , E TE1, E2N and E3N are
plotted from top to bottom. Colour indicates the field strength, white regions have a low field strength. Regions
with positive field strength are indicated with a plus (+) sign and red. Regions with a negative field strength are
indicated with a minus sign ( ) and blue.
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If we also take the scalar product of equation (2.94) with 〈b∣ we arrive at the
(2x2)-system:
⎛ a Oa
ˆ ˆ ⎞ a
a Ob ⎛ aa ab ⎞ a
⎜⎜
ˆ
⎝ b Oa
⎟⎟
ˆ ⎠ b
b Ob
()
≈ βi ⎜ ⎟
⎝ ba bb ⎠ b
, () (2.99)
or,
1 ⎛ b b a Oaˆ − a b b Oa
ˆ ˆ ⎞ a
ˆ − a b b Ob
b b a Ob a
D
⎜⎜
ˆ + a a b Oa
⎝− b a a Oa ˆ ˆ + a a b Ob
− b a a Ob
⎟
ˆ ⎟⎠ b
≈ βi
b () ()
, (2.100)
with
D= aa bb − ab ba .
The modes that we found in our approximate analysis are almost orthonormal, so
〈a∣a〉 and 〈b∣b〉 are approximately unity and 〈a∣b〉 and 〈b∣a〉 are approximately zero.
Away from the crossing, we found that the approximate solutions ∣a〉 and ∣b〉 obey
ˆ 〉 ≈ β , 〈b∣Ob
relation (2.94) so that 〈a∣Oa ˆ 〉 ≈ β , while 〈a∣Ob
ˆ 〉 and 〈b∣Oa
ˆ 〉 are small.
a b
This allows us to write equation (2.100) as
⎛ βa + δa δab ⎞ a a
⎜ ⎟
⎝ δba βb + δb ⎠ b
≈ βi
b ()
, () (2.101)
where δa , δb , δab, and δba are quantities that are much smaller than the β’s. This
system has the eigenvalues (labelled 2 and 3 because they correspond to the 2nd and
3rd modes of the waveguide) [21]
The two propagation constants are closest when βa′ = βb′ but are always separated
by a minimum distance 4 δabδba , so that they never intersect. For small
δa, δb, δab, δba ≪ ∣βa − βb∣, we find the eigenvector for βa > βb to be v2 ≈ (1, 0) and
v3 ≈ (0, 1). The upper propagation constant, β2 , has a TM0-like mode in this limit,
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while the lower propagation constant, β3, has a TE1-like mode. For βb > βa we
find v2 ≈ (0, 1) and v3 ≈ (1, 0), so that the upper propagation constant now has a
TE1-like mode while the lower propagation constant has a TM0-like mode. An
interesting case occurs when βa′ = βb′ and δab = δba . Then the normalized eigenvec-
tors of this system are v2 = 1 · (1, 1) and v3 = 1 · (1, −1), i.e., they are an equal
2 2
superposition of the eigenvectors far from the crossing.
This simple description of the avoided crossing agrees with the observations of the
numerically computed modal profiles as presented in figure 2.8 and 2.9.
∂β 1⎛ ∂n ∂k ∂ky ⎞
= ⎜kn12 + k 2n1 1 − kx x − ky ⎟. (2.104)
∂k β⎝ ∂k ∂k ∂k ⎠
The 1st and 2nd term between the brackets on the right-hand-side of this equation
are determined by the refractive index of the guiding material. The 3rd term is
calculated from equation (2.29). Although kx is only given implicitly, ∂kx /∂k can be
calculated explicitly. The total derivative of the left-hand-side of equation (2.29)
with respect to k, dG/dk, equals zero for solutions of G = 0. The height d does not
depend on frequency. The refractive indices nj (k ) may depend on frequency and thus
on k = ω /c . So we get
or,
∂G ∂G ∂n1 ∂G ∂n2 ∂G ∂n3
+ + +
∂kx ∂k ∂n1 ∂k ∂n2 ∂k ∂n3 ∂k
=− . (2.106)
∂k ∂G
∂kx
Similarly, the 4th term of the right-hand-side of equation (2.104) is calculated from
equation (2.17) as
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∂F ∂F ∂n1 ∂F ∂n 4 ∂F ∂n5
+ + +
∂ky ∂k ∂n1 ∂k ∂n 4 ∂k ∂n5 ∂k
=− . (2.107)
∂k ∂F
∂ky
⎛k 2 γ2 ⎞ 1
α3 ≡ ⎜⎜ x4 + 24 ⎟⎟ 2 , (2.109)
⎝ n1 n 2 ⎠ n 3 γ3
k y2 + γ52
α4 ≡ , (2.110)
γ4
k y2 + γ42
α5 ≡ , (2.111)
γ5
to arrive at
∂kx ⎧ ⎛ ∂n ⎞
= ⎨kxk ⎜α2(n12 − n 22 ) + α3(n12 − n32 ) + (α2 + α3)n1k 1 ⎟
∂k ⎩ ⎝ ∂k ⎠
⎛γ γ ⎞⎡ 4 k 3 2k ⎛ k 2 γ γ ⎞ ⎤ ∂n ⎫ ⎪
+ ⎜ 22 + 32 ⎟⎢ 5x − x ⎜ x4 − 22 32 ⎟⎥ 1 ⎬ (2.112)
⎝ n2 n3 ⎠⎢⎣ n1 n1 ⎝ n1 n 2 n3 ⎠⎥⎦ ∂k ⎭
⎪
⎧
⎪⎛ γ γ3 ⎞⎛ k x2 γ2γ3 ⎞ ⎛ k x2 γ2γ3 ⎞
2 ⎫
⎪
−1
and
∂ky
=
( ∂n
kyk α 4(n12 − n 42 ) + α5(n12 − n 52 ) + (α 4 + α5)n1k ∂k1 ) . (2.113)
∂k (γ4 + γ5)(ky2 + γ4γ5) + ky2(α 4 + α5) + b(ky2 − γ4γ5)2 sec 2⎡⎣kyb⎤⎦
Figure 2.10 depicts the effective group index of typical SOI waveguides with heights
of 220 nm and 300 nm. The approximate analytical curve is computed using the
equations above where the dispersion of silicon is taken into account using
∂n1/∂k = 3.147 · 108 m−1 with k = 2π /λ for λ = 1550 nm [22]. These curves are
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Figure 2.10. Effective group indices. Approximate analytical model compared with rigorous mode solver.
Typical rectangular silicon-on-insulator waveguides with air cladding. (a) 220 nm high, fundamental mode.
(b–d) 300 nm high, first 3 modes.
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maximize the overlap of the modal field with the material that is to be sensed.
Rigorous numerical mode solvers can handle arbitrary shaped waveguides including
losses and bends, and are therefore often used in the design of photonic waveguides.
We have used two different numerical mode solvers: the film mode-matching
(FMM) method and the finite element method (FEM), both implemented in the
FimmWave software package by Photon Design (Oxford, UK) [24, 25].
The FMM method is very suitable to solve waveguide geometries in which the
waveguide is built up from a number of vertical slices (such as rectangular
waveguides or directional couplers). In this method, the cross-section of the ridge
waveguide is divided in vertical slices, and 1-D modes are computed analytically for
each slice. The 2-D modes are found by finding a set of coefficients of the 1-D modes
that will give a field profile obeying Maxell’s equations everywhere. For the
simulations in this book, the area of the numerical simulation extends 2 μm from
the waveguide, and 200 1-D modes are used per slice.
In the finite element method (FEM), Maxwell’s equations for the modes of a
waveguide are discretized and the modes are solved on a grid. The FEM
implementation in FimmWave uses first- and second-order finite elements. The
triangular grid is automatically chosen such that it aligns with the waveguide
structure. For the simulations in this book, ∼210 grid points are used in both the
x- and y-direction.
The FMM method and the finite element method (FEM) agree very well for the
typical SOI waveguides considered in figure 2.7. The difference (between FMM and
FEM) in effective index is below 10−3 and the relative energy in the difference field is
below 10−4 .
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Figure 2.11. Trapezoidal waveguides with 10 ◦ sidewall angle compared with rectangular waveguides.
Silicon-in-SiO 2 waveguides with a height h of 220 nm. Silicon-dioxide cladding. Film mode matching
(FMM) method is used as mode-solver for the rectangular waveguides. Finite element method (FEM) is used
as mode-solver for the trapezoidal waveguides because this method handles the trapezoidal structures more
accurately (see section 2.5). (a) Sketch of the cross-section of a trapezoidal waveguide. (b) Sketch of the
cross-section of a rectangular waveguide, width w is equal to the average width of the trapezoidal waveguide
so that the areas of the two waveguide cross-sections are identical. (c) Effective index. (d) Effective group
index.
to show that the effective index and the effective group index of trapezoidal
waveguides are very well approximated by rectangular waveguides that have a
width equal to the average width of the trapezoidal guide. In figure 2.11 trapezoidal
waveguides are compared with rectangular waveguides. For silicon waveguides
embedded in silicon-dioxide with height 220 nm and widths varying from 400 nm to
1000 nm, the effective index and effective group index agree within 0.1%. Hence the
effective index and the effective group index of typical trapezoidal SOI waveguides
can be very well approximated by those of rectangular waveguides.
The propagation losses αp of SOI waveguides have many causes: linear and non-
linear absorption9 in the material (both in the bulk as well as at the interfaces
between materials), leakage into the silicon substrate, scattering from small defects
in the material, and scattering from roughness of the silicon–silica interfaces of the
waveguide. Dry etching, which is used to fabricate these guides, creates sub-
wavelength roughness at the sidewalls of the waveguides. This is the dominant
loss mechanism in sub-wavelength silicon waveguides [26]. The high index contrast
of waveguides in SOI technology allows small bending radii (3 μm) with reasonably
small propagation losses. These losses originate not only from radiation loss due to
the curvature in the waveguide. The field of the mode of a bend waveguide is pushed
outwards towards the outer side of the waveguide. This increases losses due to
sidewall roughness because the field intensity at the sidewalls is higher compared to a
straight waveguide. This also increases substrate leakage because the mode is less
9
Linear and non-linear material absorption correspond to the imaginary parts of the linear and non-linear
terms of the susceptibility χ (i ) . See, e.g. [1]. For linear absorption, waveguide propagation loss may be
described by an attenuation coefficient αp as in equation (2.66), while this coefficient depends on the intensity of
the electromagnetic field for non-linear absorption.
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Silicon Photonics
confined. Moreover, sidewalls are typically not perfectly vertical, which introduces
TE/TM conversion in the bends; this conversion gives additional loss [28].
Moreover, there is a mismatch between the mode of the straight waveguide and
the mode of the bend waveguide, especially for smaller bending radii. This causes
losses at the interfaces between the straight and the curved waveguides. Therefore,
the loss of two 90◦ turns separated by a straight guide is not necessarily the same as
the loss of a single 180◦ turn. Finding the modes of an ideal waveguide without losses
can be done with high accuracy, but the calculation of loss mechanisms is relatively
difficult [26].
Light is often coupled from optical fibers or from a free-space beam to the silicon
photonic chip using out-of-plane grating couplers. Such couplers have a bandwidth
or wavelength span of approximately 30 nm around a center wavelength λc of 1550
nm [29]. In this regime, the wavelength-dependence of the effective index can be
approximated as linear, so that we may use equation (2.33).
References
[1] Leuthold J, Koos C and Freude W 2010 Nonlinear silicon photonics Nat. Photon. 4 535–44
[2] Griffiths D J 1999 Introduction to Electrodynamics 3rd edn (Upper Saddle River, NJ:
Prentice-Hall)
[3] Marcuse D 1991 Theory of dielectrical optical waveguides 2nd edn (San Diego, CA:
Academic)
[4] Kogelnik H 1975 Theory of dielectric waveguides Integrated Optics (Springer Series on
Topics in Applied Physics vol 7) ed T Tamir (Berlin: Springer) pp 13–81
[5] Reed G T and Knights A P 2004 Silicon Photonics: An Introduction (Chichester: Wiley)
[6] Woan G 2000 The Cambridge Handbook of Physics Formulas (Cambridge: Cambrige
University Press)
[7] Marcuse D 1982 Light Transmission Optics 2nd edn (New York: Van Nostrand Reinhold)
[8] Bienstman P 2001 Rigorous and efficient modelling of wavelength scale photonic compo-
nents PhD Dissertation, Universiteit Gent www.photonics.intec.ugent.be/publications/phd.
asp?ID=104
[9] Sneyder A W and Love J D 1983 Optical Waveguide Theory (London: Chapman and Hall)
[10] Weisstein E W 2013 Divergence theorem. MathWorld–A Wolfram Web Resource http://
mathworld.wolfram.com/DivergenceTheorem.html
[11] Hardy A and Streifer W 1985 Coupled mode theory of parallel waveguides J. Lightwave
Tech. 3 1135–46
[12] Hardy A 1998 A unified approach to coupled-mode phenomena IEEE J. Quantum Electron.
34 1109–16
[13] Hardy A and Ben-Artzi M 1994 Expansion of an arbitrary field in terms of waveguide modes
IEE Proc. – Optoelectron. 141 16–20
[14] Hunsperger R G 2002 Integrated Optics: Theory and Technology (Berlin: Springer)
[15] Marcatili E A J 1969 Dielectric rectangular waveguide and directional coupler for integrated
optics Bell Syst. Tech. J. 48 2071–121
[16] Westerveld W J, Leinders S M, van Dongen K W A, Urbach H P and Yousefi M 2012
Extension of marcatilias analytical approach for rectangular silicon optical waveguides J.
Lightwave Tech. 30 2388–401
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Silicon Photonics
Electromagnetic theory
Wouter J Westerveld and H Paul Urbach
Chapter 3
Components
Figure 3.1. Sketch of a directional coupler consisting of two parallel waveguides. We consider couplers with a
silicon-dioxide cladding. (a) Cross-section of the coupler. Two 440 nm × 220 nm rectangular silicon
waveguides are separated by 200 nm. Refractive index of the guides is n1 and the SiO2 cladding has index
n2. (b) Top-view including the bends. Upper waveguide a and lower waveguide b. (c) Optical microscope
photograph of a directional coupler in SOI. The very narrow pink lines are the waveguides.
⎛ ıδ ⎞
τ = ⎜cos sL˜ − sin sL˜ ⎟e−ı(βb +κbb−δ )L˜ , (3.2)
⎝ s ⎠
⎛ ıκ ⎞
κ = −⎜ ab sin sL˜ ⎟e−ı(βb +κbb−δ )L˜ , (3.3)
⎝ s ⎠
s= κbaκ ab + δ 2 . (3.5)
Coupling coefficient κab represents the coupling from the mode of waveguide b to the
mode of waveguide a and κba represents the coupling from the mode of waveguide a
to the mode of waveguide b. These coefficients dominate s and are defined in
equation (A.37). The guides in the coupler that we study are designed to be identical,
but we experimentally observed non-zero δ in our couplers. Equation (3.2) is valid
for two parallel waveguides, whereas the actual coupler also includes bends to
connect the parallel waveguides to the components in the circuit. We take the
coupling which happens in the bends into account by re-defining the length L̃ in
equation (3.2) as an effective coupling length L˜ = L + ΔL , with L the length of the
parallel part of the waveguides. Figure 3.2(a) illustrates the behaviour of a direc-
tional coupler in which light ‘leaks’ from waveguide b (power ∣ub∣2 ) to waveguide a.
For two different waveguides (non-zero δ), the power never fully transfers from one
waveguide to the other (figure 3.2(b)). In appendix A, we derive equation (3.2) by
following the approach of Hardy and Streifer [1, 2]. We also show in appendix A
that this method agrees well with rigorous FDTD simulations also for high-index-
contrast SOI waveguides.
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Silicon Photonics
Figure 3.2. (a) and (b) Behaviour of a directional coupler. Power in upper waveguide a and lower waveguide b.
At z = 0, all power is in the lower guide b. (a) Coupling coefficient s = 0.1, identical waveguides, δ = 0 . (b)
Coupling coefficient s = 0.1, different waveguides, δ = 0.02 . (c) Coupling coefficient calculated using three
different methods (see legend). The five groups of lines correspond to waveguide widths: 380 nm, 400 nm,
420 nm, 440 nm and 460 nm (top to bottom). The rectangular silicon waveguides are 220 nm high and have
silicon-dioxide cladding.
When using the couplers not for a single wavelength λc but for a range of
wavelengths, it is necessary to study how the behaviour of the coupler depends on
the wavelength. Dispersion is taken into account by assuming linear dispersion of
the effective index (hence the propagation constant βb(λ ) is given by equation (2.33))
and by assuming linear dispersion of the coupling s(λ ). With the definition of L̃ , it is
not necessary to include dispersion in ΔL . We found that dispersion in ΔL , and
higher order dispersion in s, are small and below our numerical and experimental
noise (see section 3.1.3). An experimental example of the behaviour of directional
couplers may be found in [3, section 3.6].
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Silicon Photonics
relative phase of the two modes is changed by π. In equation (3.6), the relation to
the individual waveguides a and b is not specified. However, we may approximate the
mode of isolated waveguide a by adding modes 0 and 1. We may approximate the
mode of isolated waveguide b by subtracting mode 1 from mode 0 (see figure 3.3).
Thus the excitation of the ‘mode’ of waveguide b at z = 0 can be approximated by
u 0 = 1/2 and u1 = − 1/2 . After propagating a distance Lπ, the sign of one mode 1
has changed, so that all light is now approximately in the ‘mode’ of waveguide a. The
smallest length over which all light transfers from waveguide b to waveguide a is hence
given by Lπ = π /(β0 − β1).
In the coupled mode theory, equations (3.1)–(3.3), it was found that all light
transfers from mode b to mode a when ∣ub(L˜ )∣ = cos(sL˜ ) = 0, thus when sL˜ = π /2.
This length L̃ is thus the same length as Lπ. This allows us to define a coupling
coefficient sEME as found with the eigenmode expansion (EME) method as
β0 − β1
s EME = . (3.7)
2
In the implemenation of the EME method, we calculated the coupling coefficients
sEME from the propagation constants ( β1 and β0 ) that were calculated with a rigorous
numerical mode-solver (FMM method). The calculated coupling coefficients sEME
agree well with coupled mode theory and with rigorous FDTD simulations
(see figure 3.2(c)).
As discussed in section 2.6, the side-walls of waveguides in SOI technology are not
perfectly vertical but have an angle of ∼10◦, hence the waveguides are trapezoidal.
Figure 3.3. Two descriptions of the modes in a directional coupler, modal electric field, Ex(x, y ) at y = 0. The
upper two curves show the modes of isolated waveguides a and b. The fields in the directional coupler can be
approximated as a superposition of those two modes with z-dependent amplitude coefficients ua(z) and ub(z)
(coupled mode theory). The lower two curves are exact solutions of the directional coupler ‘waveguide’
(eigenmode expansion method). Symmetric mode (0) and anti-symmetric mode (1). Modal profiles obtained
using rigorous mode-solver (FMM method in FimmWave).
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It was shown that the effective index index of typical trapezoidal SOI waveguides are
well approximated by a rectangular waveguide with a width equal to the average
width of the trapezoidal waveguide. We now study the influence of the side-wall
angle of the waveguides on directional couplers using the EME method. We
computed the coupling coefficients sEME of couplers with trapezoidal and rectan-
gular waveguides, to find that they agree within 1% (for waveguide widths varying
from 380 nm to 480 nm, gaps varying from 140 nm to 240 nm, and 10◦ side-wall
angle for the trapezoidal guides). Propagation constants β0 and β1 were, for both
cases, computed with the finite element method (FEM) mode-solver.
Figure 3.4. Set-up of the directional coupler FDTD simulation, based on screen-shots of CyrstalWave. (a)
Top-view with the exciter and the sensors in, cross, and through, indicated. (b) Cross-section at constant z
depicting the two waveguides.
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Silicon Photonics
volume was minimized using perfectly matched layers [6]. A TE-like mode is excited in
the lower waveguide (see figure 3.4) with a time-pulse that consists of a sinusoidal
signal (free-space wavelength 1550 nm) with an envelope that has a bandwidth of
200 nm (free-space wavelength). The electromagnetic energy flux through the rectan-
gular surfaces of the in-, through- and cross-sensors are recorded (see figure 3.4). The
sensors record the electromagnetic fields versus time and a Fourier transform is used to
find the energy flux as function of frequency or free-space wavelength. The power
inserted in waveguide b was normalized to one using the recordings of the in-sensor.
Equation (3.3) is used to study the behaviour of the couplers. With unit power in
waveguide b before the coupler, we write the power in the waveguide a after the
coupler, ∣ua(L˜ )∣2 , as
ua(L˜ ) 2 = A0 sin2[s(L + ΔL )]. (3.8)
For a lossless coupler as described by equation (3.3), A0 = ∣κab /s∣2 , but radiation loss
in fact also influences A0. We performed a series of FDTD simulations with length L
varying from 0 μm to 18 μm and recorded the power in waveguide a after the
coupler, ∣ua(L˜ )∣2 for each length L. Then unknowns in equation (3.8), s, ΔL and A0,
are found by fitting this equation to the ∣ua(L˜ )∣2 versus L curve. An example of the
results of such a FDTD simulation and fitting is shown in figure 3.5(a), where
Figure 3.5. Example of FDTD simulations of a directional coupler (waveguide width 440 nm, gap 200 nm).
Lengths L are: 0, 4, 8, 12, and 16 μm. (a) Power flow through the sensors, from FDTD (markers) and fitted
(curves). (b–c) Fitted values of coupling coefficient s, transmittance A0 and correction for coupling in the bends
ΔL . Plotted versus wavelength to investigate both dispersion and noise.
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markers show the FDTD results and the solid line is a result of the fitting. For all
simulations, A0 ≈ 1, and hence radiation loss and asymmetries between the wave-
guides quantified by δ can be neglected.
The numerical error in the FDTD computation is estimated by inspecting the
results at different frequencies or free-space wavelengths (figure 3.5(b–d)). The
curves in this figure are expected to be smooth because the wavelength variation is
small, there are no resonant interference effects in the directional coupler, and the
characteristics of the coupler are smooth with respect to length L and gap g.
Therefore the variation in figure 3.5(b–d) are interpreted as computational error. It
may be seen that the numerical error in A0, s, and ΔL are on the order of 1%, 4% and
5%, respectively.
The power going straight through waveguide b (the straight waveguide) as
computed with the FDTD method is shown by circles in figure 3.5(a). We compare
this recorded power with the parameters (s, ΔL and A0) that are obtained using the
recordings of the power coupled to waveguide a (the curved waveguide). For lossless
couplers, the straight-through power in waveguide b is: ∣ub(L˜ )∣2 = 1 − ∣ua(L˜ )∣2 ,
which is plotted as the dashed line in 3.5a. There is good agreement between the
dashed line and the circles.
In figure 3.5(b, d), it can be seen that the dispersion in s is linear while the
dispersion in ΔL is negligible. A linear fit is used to find linear dispersion ∂s/∂λ in the
regime from 1525 nm to 1575 nm free-space wavelength. Figure 3.6 presents the
Figure 3.6. Characteristics of directional couplers extracted from FDTD simulations. Labels of vertical axis
are above the plots. Characteristics as a function of gap g and for different waveguide widths, namely 380 nm
(red continuous), 400 nm (blue dashed), 420 nm (green dashed), 440 nm (magenta dash-dot), and 460 nm (cyan
continuous with dots). (a) coupling coefficient s. (b) Correction for coupling in the bends ΔL (c) Dispersion in
the coupling coefficient ∂s/∂λ .
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Silicon Photonics
Figure 3.7. Sketch of a multimode interference (MMI) coupler. (a) 3D-sketch. (b) Top-view showing wide
MMI waveguide (width w, length L), four access waveguids P1, P2, P3, and P4 each with width wA and
centered at x = ±xc . Input field Ψ0(x ) is sketched at the interface between access waveguide P1 and the wide
MMI waveguide. Modes ψν(x ) for ν = 0, 1, 2 and 3 are also sketched in the wide MMI waveguide, at arbitrary
z-positions.
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Silicon Photonics
H(ν )(x , y , z , t ) = H y(ν )(x , y )e ı(ωt −βν z )yˆ + Hz(ν )(x , y )e ı(ωt −βz )zˆ. (3.10)
The power P that is carried by the mode is computed by inserting equation (3.11) in
equation (2.60),
β
P=
2μ 0 ω
∬ Ex · Ex* dxdy. (3.12)
The orthogonality relation for forward propagating modes, equation (2.57), may
also be simplified for TE modes,
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exponential decay outside the core of the waveguide, known as the Goos–Hänchen
shift. However, then the same correction is applied to all modes and this is the cause
of why the computed propagation constants are still not sufficiently accurate.
At the horizontal interfaces of the waveguides, continuity is demanded of the
electromagnetic components that are tangential. This results in a modal electric field
that has the same profile in the y-direction as the TE mode of the corresponding slab
waveguide with the same height but with infinite width. Hence the modal electric field
Ex(ν )(x , y ) = ExSLAB( y )ψν(x ), (3.14)
where ExSLAB( y ) is the profile of the fundamental TE mode of the slab waveguide as
defined in equation (2.10) with equations (2.13), (2.15) and (2.17). As introduced
before, we now set Ex = 0 in the regions left (2) and right (3) of the waveguide. Then
ψν(x ) = 0 at the interfaces of the core of the waveguide, x = ±w/2. With the assumed
sinusoidal shape, this gives
⎧ ⎡ ⎛ ⎞⎤
⎪sin⎢kx,ν⎜x + w ⎟⎥ , − w < x < w
ψν(x ) = ⎨ ⎣ ⎝ 2 ⎠⎦ 2 2 (3.15)
⎪
⎩ 0, otherwise
with
π (ν + 1)
kx,ν = , ν = 0, 1, 2, ... m − 1, (3.16)
w
with ν the mode number and m the number of guided modes in the waveguide (also
see figure 3.7).
Upon substitution of equations (3.15), (3.14), (3.9) and (2.10) in the wave
equation (2.5) and considering the core of the waveguide, we arrive at the dispersion
relation
βν2 = n 2k 2 − k y2 − k x2,ν = n r2k 2 − k x2,ν, (3.17)
where
nr ≡ n 2 − k y2 / k 2 , (3.18)
with βν the modal propagation constant, n the refractive index of the silicon
waveguide core, nr the effective refractive index of the slab waveguide, and ky given
by equation (2.17). The derived method has some resemblance to the so-called
effective index method1 [8, section 2.8], because the 3D problem is reduced to a 2D
1
In the effective index method, the horizontal piecewise constant ( y, z ) areas with same vertical layer stack
n(x) are represented by the corresponding slab waveguide effective index nr. When applying this method to a
rectangular waveguide, it also has the shape of the ansatz in figure 2.6 but with parameters different from the
extended Marcatili method and with less accurate propagation constant β. For the SOI waveguide described
here, first the effective index nr of TE mode in the 220 nm high slab waveguide is computed. Then, the effective
index of the rectangular waveguide is approximated by the effective index of the TM mode of a slab waveguide
with left refractive index n2, guiding layer refractive index nr with thickness d, and right refractive index n3 (c.f.
figure 2.5).
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Mode normalization
For the approximate description of the guided TE modes, i.e., in the form of
equation (3.14), the power is computed as
β
P=
2μ 0 ω
∫ ExSLAB( y ) · ExSLAB (y)* dy · ∫ ψν(x) · ψν(x)* dx. (3.22)
In this section 3.2 it is more convenient to normalize the modes by taking equation
(3.13) with μ = ν equal to 1, instead of normalizing them to unit power flow. Based
on the orthogonality relation (3.13) and assuming that all modes are in the form of
equation (3.14), we normalize
where the two modes share the same slab waveguide profile ExSLAB( y ).
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The electric field in the MMI waveguide may be written as superposition of its
modes,
E( x , y , z , t ) = ∑cνEx(ν )(x, y )e ı(ωt−β z )xˆ ,
ν
(3.24)
ν
with
m−1
Ψ( x , z ) ≡ ∑ cνψν(x)e ı(β −β )z.
0 ν (3.27)
ν= 0
The modes of the MMI waveguide are excited at the interface between the input
waveguides and the MMI waveguide. The electric field at this interface, Ψ(x , 0) is
assumed equal to the incident wave in the input waveguide. The modal coefficients
cν are found using the orthogonality relation (3.23) to be
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Ψ(x , 0) − Ψ( −x , 0)
Ψ(x , 0)anti-symmetric =
2
= ∑ cνψν(x). (3.34)
odd ν
Mirrored image
First we consider the mirrored images in the MMI waveguide which occur at MMI
lengths of 3Lπ . In fact, they also occur at 3Lπ plus a multiple of 6Lπ . By substituting
z = 3Lπ in equation (3.29), it is seen that the phases that are accumulated by the
modes, ν(ν + 2)π , are an even multiple of π for even ν and an odd multiple of π for
odd ν . The even modes have the same phase as at the beginning of the MMI
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Figure 3.8. Simulation of the electromagnetic field intensity in the MMI coupler. Finite difference time domain
(FDTD) simulation using the CrystalWave simulation software (Photon Design, Oxford, UK).
waveguide and the odd modes have a phase of π , i.e, their sign is reversed. As the
odd modes are anti-symmetric in x, equation (3.31), it follows that the electric field
at the output interface is a mirrored image of the field at the input interface, i.e.,
Ψ(x , 3Lπ ) = Ψ( −x , 0). In the case of a 2 × 2 MMI coupler with access waveguides
symmetrically positioned at ±xc , all energy is coupled from the upper input
waveguide to the lower output waveguide (see figure 3.8). Such a device may be
used in an integrated circuit in the case that two waveguides need to cross each other,
although better methods exist to achieve this in practice [9].
Direct image
An MMI coupler with a waveguide length being a multiple of 6Lπ has the same
electric field at the waveguide output interface as at the input interface, e.g.
Ψ(x , 6Lπ ) = Ψ(x , 0). From the previous discussion of the field at z = 3Lπ we realise
that the electric field at z = 6Lπ is mirrored twice. When z = 6Lπ in equation (3.29),
the relative phases of all modes are an even multiple of π hence the field at the end of
the MMI waveguide is identical to the field at the beginning of the MMI waveguide.
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∞
Ψ̃(x ) ≡ ∑ Ψ(x + W /2 − 2vW , 0) − Ψ( −x − W /2 + 2vW , 0). (3.35)
v =−∞
For certain lengths L the field at the end of the MMI waveguide, Ψ(x , L ) is a
superposition of the field at the input of the MMI waveguide, Ψ(x , 0) and the same
field but mirrored in the x-direction, Ψ( −x , 0), i.e.,
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The even modes accumulate a phase that is a multiple of 2π . The odd modes
accumulate a phase of 3π /2 plus a multiple of 2π . Hence
Ψ(x , 3/2Lπ ) = ∑ cνψν(x) + ∑ ( −ı)cνψν(x) (3.43)
even ν odd ν
1−ı 1+ı
= Ψ(x , 0) + Ψ( −x , 0). (3.44)
2 2
The last step follows from equations (3.33) and (3.34). Thus at the output of the
MMI waveguide section, the field is a superposition of the input field and the
mirrored input field. When light is inserted in the upper input waveguide centred at
x = xc then this field is imaged at the two output waveguides which are centred at xc
and −xc . The fields have amplitude fractions of ∣a±∣ = 1/ 2 thus the power is split
50%/50% over the two output waveguides. This MMI coupler is also referred to as a
−3 dB splitter.
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m−1
Ψ(x , 3/4Lπ ) = ∑ cνψν(x)e iν(ν+2)π /4. (3.46)
ν= 0
Results
Figure 3.9 shows the behaviour of MMI couplers for different lengths. The effect of
the tapered access waveguides is neglected and only the fundamental modes of the
access waveguides are taken into account (access waveguide width wa in figure 3.7).
Effective refractive index nr = 2.83 from equation (2.17). Beat length Lπ = 42.96 μm
from equation (3.20). The fields of the waveguides are computed using equation
(3.15). The modal coefficients cν follow from equation (3.28), 40 modes are taken
into account. The field at the right interface of the MMI waveguide is given by
equation (3.29). The coupling to the output waveguides P3 (upper, +) and P4 (lower, −)
is obtained from equation (3.40).
The special MMI lengths discussed above can be recognised in figure 3.9(b). The
lengths 3Lπ /4 = 32 μm, 3Lπ /2 = 64 μm, 3Lπ = 129 μm, and 6Lπ = 258 μm result in
coupling of all energy to the output waveguides with the predicted power fractions.
In addition, it can be seen that there are more MMI lengths for which all power is
coupled to the output waveguides, e.g. the length of 97 μm results in a power
splitting of 85%/15%.
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Figure 3.9. Analytical analysis of the MMI coupler consisting of silicon-on-insulator with 220 nm thick silicon
light-guiding layer (see figure 3.7). Vacuum wavelength λ 0 = 1.55 μm. MMI waveguide width W = 4.2 μm,
access waveguide width wa = W /4 , access waveguide position xc = ±W /4 . (a) Field profile Ψ(x, 0). (b) Field
profiles ψ0(x ), ψ1(x ), and ψ2(x ) of the MMI waveguide. (c) modal amplitudes cν for ν = 0…12 . (d) Relative
propagation constants β0 − βν for ν = 0…12 . (e) Power in output waveguides P3 (upper) and P4 (lower).
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and modal propagation constants without assumptions. At the interfaces, all modes
are taken into account as well as the reflections that occur at those interfaces.
The approximate method is adjusted by introducing an effective waveguide
width Weff = 4.2764 μm which is used in the computation instead of the actual
waveguide width W = 4.2 μm. Weff is chosen such that the particular MMI lengths
corresponding to imaging align with the rigorous computation. The same effective
width is used for all modes, which is an approximation as this so-called Goos–
Hänchen shift depends on the mode number [7]. This shift per mode can be
computed using the extended Marcatili method (see section 2.4). Note that the
width wa and positions xc of the access waveguides are not altered. This leads to a
weak excitation of modes 3, 7, and 11 which are no longer perfectly symmetric
around xc (figure 3.11(a)).
In figures 3.10–3.12, the results of the approximate method and the rigorous
method are compared. It can be seen that the modal profiles (figure 3.10) and
relative propagation constants β0 − βv (figure 3.11(b)) are quite similar. However,
these slight differences cause a significant difference in the behaviour of the device.
In figure 3.12 nevertheless, the results agree qualitatively but there are significant
differences after longer propagation lengths. For example, at the length L = 267 μm
corresponding to the direct image, only 69% of the input power is coupled to the
output waveguide P3 instead of the predicted 100%.
The difference between the rigorous numerical result and the approximate
theory is mainly due to the approximation in the propagation constants. This is
followed by testing the approximate method with the propagation constants βν
computed using the numerical mode solver, instead of the approximate equation
(3.29). The results of this approach are in very good agreement with the fully
numerical results [11].
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Figure 3.10. Modes of the MMI waveguide. Numerically computed field profiles, Ex in the middle of the
waveguide (red, solid lines). Approximate sinusoidal field profiles ψv(x ) for effective width Weff = 4.2764 μm
(blue, dashed lines). Modes 0–12. The numerically computed effective indices are listed between brackets. The
FMM method as implemented in FimmWave is used as a numerical mode solver. Silicon-on-insulator
waveguide with 220 nm thick silicon light-guiding layer. For the vacuum wavelength λ 0 = 1.55 μm. MMI
waveguide width W = 4.2 μm, access waveguide width wa = W /4 , access waveguide position xc = ±W /4 .
diffracts light from the waveguide upwards. Radiation occurs from an area on the
top surface of the PIC, allowing for a coupler that has the same dimensions as the
fibre core (figure 3.14(a)). Dielectric grating couplers date from the 1970s, and
designs for SOI technology have been presented over the last decades by, among
others, Gent University [13–16]. Basic out-of-plane grating couplers have a coupling
efficiency of about −5 dB (30%, see section 3.3.2), although more advanced grating
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Figure 3.11. MMI coupler as in figure 3.10. (a) Modal amplitudes cv for modes 0 to 12, from the approximate
theory. (b) Relative propagation constants β0 − βν for modes 0 to 12, computed using approximate theory
(blue curve) and also computed using the numerical mode solver (FMM in FimmWave, red curve).
Figure 3.12. MMI coupler as in figure 3.10. Sum of the power in ports P3 and P4 (upper plot). Power in port
P3 (lower plot). Computed using approximate theory and also using the bi-directional eigenmode propagation
method as implemented in FimmWave. Normalized to input at port P1.
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Figure 3.13. Inverted taper in silicon-on-insulator technology with waveguide height 220 nm on a 2 μm thick
silicon-dioxide BOX on a silicon substrate. The silicon waveguide is tapered from a width of 450 nm down to a
width of 75 nm over a length of 150 μm. The inverted taper has an overlaying polymer with size 2 μm × 2 μm
and refractive index n ≈ 1.85. Design of IBM, S J McNab 2003, [12]. (a) Sketch of the inverted taper.
(b) Modal field at the side where the waveguide width is 450 nm. (c) Modal field at the side where the
waveguide width is 75 nm and the field is coupled to an optical fibre. Courtesy of Photon Design, reprinted
from FimmProp documentation [17].
Figure 3.14. Sketch of an out-of-plane grating coupler. The silicon layer height is 220 nm and grating etch
depth is 70 nm. The grating coupler width is 10 μm, and the grating length is ∼15 μm. (a) 3D-sketch. (b) Cross-
section of the grating coupler. An efficient simulation method (2D FDTD, effective index method and
diffraction integral) is outlined, © 2011 IEEE. Reprinted, with permission from [23].
coupler designs exist with efficiencies of ∼70% (−1.6 dB, see section 3.3.3). The
advantage of grating couplers over the inverted taper is that they can be positioned at
arbitrary locations on the chip, allowing more design flexibility and offer the possibility
to place other components, such as lasers or photo-detectors, on top of the chip.
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optical fibre with this silicon waveguide. However, direct coupling is inefficient due
to the large difference in effective refractive indices, geometric size, and limited mode
overlap. At least 30 dB coupling loss can be expected from the poor overlap (0.2%)
alone, because the cross-section of the optical mode in a single mode fibre is in the
order of 65 μm2 while this is 0.1 μm2 for the silicon waveguide [12].
An inverted taper may be used to efficiently couple light from the waveguide on the
silicon photonic chip to an optical fibre, or vice-versa [12, 18–20]. In [12] the coupling
form of a single mode optical fibre to a 220 nm high silicon waveguide is described
with a coupling efficiency of 90% (coupling loss below 0.5 dB). The coupler is shown
in figure 3.13 where a silicon waveguide of width of 450 nm in the middle of the chip is
tapered down over a distance of 150 μm to a width of 75 nm at the edge of the chip.
The inverted taper has a polymer overlay with a refractive index (n ≈ 1.85) higher
than the silicon-oxide BOX layer (n ≈ 1.44). At the edge of the chip, the mode is
pushed outside the silicon waveguide into the polymer which now functions as a
waveguide core (figure 3.13(c)). There is good overlap between this mode and the
mode of the single-mode optical fibre. Also, the difference in effective refractive
indices is moderate which strongly reduces the reflection at the end facets.
More recent inverted taper designs couple both TE as well as TM-polarized light
efficiently to silicon waveguides with shorter tapers [21, 22]. In those devices,
the silicon waveguides have a thickness above 300 nm to support both TE-like and
TM-like modes. In [22] several inverted taper designs are compared.
3.3.2 Basic out-of-plane grating couplers
A grating coupler consists of a very wide (e.g. 10 μm) waveguide with a grating
etched in its top surface. We call a grating coupler basic when it is one-dimensional
and all its grooves are rectangular, and identical. Advanced couplers have, for
example, concentric cylindrical gratings, different profiles of the grooves or teeth of
the grating, or an apodized grating period (see section 3.3.3). For a basic grating
coupler, the electromagnetic field varies relatively slowly with the coordinate that is
parallel to the grooves (the x-coordinate in figure 3.14(b)). In and near the coupler,
we may approximate the shape of the electromagnetic fields in that direction by the
shape of the fundamental mode of the waveguide [23].
The behaviour of the coupler can intuitively be understood by considering all the
tall-to-short interfaces on the edge of the grating grooves as ‘line-sources’ which
have a phase difference which follows from the propagation speed of the light
through the waveguide (a few such line-sources are indicated by the symbol P in
figure 3.14(b)). The effective refractive index of the grating can be estimated as the
spatially weighted average of the effective indices of the fundamental modes in the
tall and short parts of the waveguide. The fields emitted by these point-sources
constructively interfere to a far field that is a plane wave propagating under a certain
angle θq with respect to the y-axis as shown in figure 3.14(b). This angle is given by
λ
n3 sin(θq ) = ne − q , (3.49)
Λ
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where n3 is the refractive index of the upper medium (air in figure 3.14), ne is the
averaged effective index of the grating, q is the diffraction order and Λ is the grating
period. The average effective index ne is computed as the spatial average of the effective
indices corresponding to concatenated high and low waveguides that form the grating.
For perfect vertical coupling, θq = 0◦, equation (3.49) describes a second-order
distributed Bragg reflector (DBR), which very efficiently reflects the forward propagat-
ing light in the waveguide backwards, rather than radiating it upwards. For low index
contrast waveguides coupling coefficients between the waveguide mode and a prop-
agating plane wave with wave vector whose angle with the y-axis is θq can be derived
using coupled mode theory, with the grating as a perturbation of a waveguide [24, 25].
Among other relations, equation (3.49) also follows from that derivation. To our
knowledge, the validity of this perturbation approach has not been verified for high-
index-contrast guides, and it is therefore common to use numerical methods (e.g.
FDTD). We have compared equation (3.49) with the strongest far-field radiation angle,
and found good agreement for etch depths up to 110 nm for a free-space wavelength of
1550 nm. For efficient coupling to a fibre, the grating should be designed such that only
one coupling order (q = 1) exists. Moreover, the coupling strength is a compromise
between strong upwards coupling (large coupling strength) and low backwards
reflections (low coupling strength). The ratio between upwards and downwards
radiation is strongly influenced by the height of the buried oxide (BOX) layer because
the downward propagating waves reflect at the BOX layer and interfere.
Figure 3.15 shows a numerical analysis of an out-of-plane grating coupler. The
relevant effects such as the Bragg reflector are clearly visible in plots (a) and (c). The
angle under which the coupler radiates is in good agreement with equation (3.49)
(see plot (d)) but there is also radiation in angles close to this angle (see plot (b)).
In the remainder of this section, we describe an efficient scheme for numerical
simulation of such out-of-plane grating couplers. We exploit the fact that the width
of the waveguide, and thus the grating, is about 9 μm which is much larger than
the height of the waveguide of 220 nm. This justifies the use of a 2D simulation in the
(x , z )-plane in the vicinity of the waveguide which is later corrected with the
x-profile of the fundamental mode of the waveguide. The scheme consists of four
steps: a 2D FDTD simulation in the ( y, z )-plane which describes the propagation
from the waveguide to a plane just above the coupler and assumes no variation of
the electromagnetic fields in the x-direction. Then, the effective index method is
applied to calculate the profile of the field in the x-direction, based on the width of
the grating in this plane, resulting in the 3D field. Thereafter, Rayleigh–Sommerfeld
diffraction is used to propagate the field from this plane to the plane of the fibre facet
and finally an overlap integral is used to calculate the coupling into the fibre mode.
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Figure 3.15. Two-dimensional numerical simulations of an out-of-plane grating coupler as shown in figure
3.14(b). Finite difference time domain (FDTD) simulations in the ( y, z )-plane with the assumption that there is
no variation of the electromagnetic fields in the x-direction. Forwards-propagating light is excited in the
fundamental mode of the waveguide on its left-hand-side before the grating. It is recorded how this light
propagates through the device and is partially diffracted upwards and downwards by the grating. Grating
coupler with silicon layer height 220 nm, silicon-dioxide BOX layer height 1980 nm, etch depth 66 nm, duty
cycle of grating teeth is 50%, and with 20 grating periods. (a, b) Results of a coupler with grating period
Λ = 616 nm . (b–d) Vacuum wavelength λ = 1550 nm . (a) Power that is reflected back from the grating,
propagating in the waveguide in the negative z-direction (R), power that is transmitted through at the end of
the grating at the right-hand-side (T), power that is diffracted upwards, i.e., through the plane y = y0 in figure
3.14 (Up), power that is diffracted downwards (Down). (b) Far-field intensity as a function of angle.
(c) Relative power in different directions, see legend of (a), for different grating periods Λ. (d) Angle of
maximum far field intensity (as in plot (b)) as function of the grating period for wavelength of 1550nm. Also
includes the angle that is expected from equation (3.49). (red solid curve). For details, see [11, 23].
index profile and the electromagnetic fields do not vary in the x-direction. To obtain
the variation of the electromagnetic field in the x-direction in a plane just above the
coupler, we apply a method similar to the effective index method (EIM) by
approximating the field Ex by Ex(x , y, z ) = E 2xD( y, z ) · Exmode(x ), where E 2xD is the
electric field as calculated using 2D analysis (assuming invariance in the x-direction)
and lateral field profile Exmode(x ) is approximated from the lowest order mode in the
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waveguide. The results of this method are in good agreement with full 3D
simulations (see figure 3.16).
where
Figure 3.16. Three-dimensional numerical simulations of an out-of-plane grating coupler. Electric field
component Ex in the plane y0 = 1.84 μm (see figure 3.14). Silicon layer height 220 nm, silicon-dioxide BOX
layer height 1980 nm, grating period 616 nm, etch depth 88 nm, duty cycle of grating teeth is 50%, 20 grating
periods, waveguide width 9.9 μm. (a) Computed using 2D FDTD simulations with the effective index method
applied thereafter, as discussed in section 3.3.2. (b) Computed using 3D FDTD simulations (for details, see
[23]). © 2011 IEEE. Reprinted, with permission from [23].
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2
r= (x − x′)2 + ( y − y0′) + (z − z′)2 , (3.52)
and U is any electric or magnetic field component in phasor notation with time
dependence given by e iωt . The Greens’ function G is the sum of the fields of two
in-phase point sources that are images of each other with the plane y = y0′ as
mirror. This choice of Greens’ function allows the field in the air to be described
as an integral of the field in the aperture, without requiring knowledge of the
normal derivative of the field [26]. When the field is calculated for a horizontal
plane (y constant), G depends on x − x′ and z − z′, so equation (3.50) is a 2D
convolution, which can be very efficiently calculated using fast-Fourier-transforms
(FFTs) [27]. When the plane is rotated around the x-axis as shown in figure
3.14(b), the integral with respect to x′ is still a convolution but the integral with
respect to z′ is not. The 2D equivalent of equation (3.50), where U = U ( y, z ), is
obtained by integrating equation (3.50) along x′, giving [28]:
where
with H1(2)(kr ) the first Hankel function of the second kind, i.e., H1(2)(kr )=
J1(kr ) − ıY1(kr ) where J1 and Y1 are the first order Bessel functions of the first
and second kind, respectively.
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wave. When the field E ix can be separated in x and ρ dependence, i.e., E ix(x , ρ )=
E ix,x(x ) · E ix,ρ(ρ ), then the overlap ηoverlap can also be separated, i.e., ηoverlap=
ηoverlap,x · ηoverlap,ρ .
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Figure 3.17. (a) Scanning electron microscope (SEM) image of the focused grating coupler presented in [31,
© 2013 IEEE, reprinted with permission]. Light propagates from the waveguide in the bottom-left corner of
the image through the taper and the free divergence region to the focused grating. (b) Sketch of grating coupler
presented in [32], reprinted with permission. Light propagates from the waveguide at the right-hand-side of the
sketch through the taper, through the index matching region with sub-wavelength structures, to the grating
where it is diffracted upwards.
refractive index of the 220 nm high waveguide and the average refractive index of the
grating causes this reflection. This reflection may be mediated by matching the
refractive index of the 220 nm high waveguide to the refractive index of the grating
coupler by means of sub-wavelength patterning of the waveguide before the coupler
[32, 34]. Alternatively, the focussing grating coupler can be designed such that the
light reflecting back from the cylindrical grating does not focus on the waveguide,
but next to it. The reflections hereby reduced while the efficiency remains of the
order −5 dB, similar to the efficiency of the basic grating couplers [37, 38].
In our opinion, two grating coupler designs stand out. The coupler in [31] is
wafer-scale CMOS compatible and combines the small reflectionless focused grating
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couplers with increased upwards directivity using a grating that has a higher
waveguide, thereby providing 2.2 dB (60%) coupling efficiency with −40 dB
(0.01%) back-reflections (see figure 3.17(a)). The coupler in [32] is CMOS compat-
ible2 and achieves upwards radiation with shallow and deep etched trenches, which
are more common in CMOS technology, while minimizing reflections using sub-
wavelength index-matching structures. The reported efficiency is −1.6 dB (69%) but
the reduced back-reflection is still 4% (see figure 3.17(b)).
with ∣τ∣2 + ∣κ∣2 = 1, see equation (B.1) in appendix B. This matrix does not depend
on the specific type of coupler. After one round-trip through the racetrack, the wave
has experienced a phase delay ϕr and a loss:
a2 = αe ıϕrb2 , (3.58)
where α 2 that is the power after one one roundtrip relative to the power just before
the roundtrip (i.e., α = 1 means no loss). The power in the output waveguide, ∣b1∣2 , is
obtained by first solving equations (3.57) and (3.58) for b1. First we substitute
equation (3.58) in the second row of equation (3.57) to get
−κ *
b2 = a1. (3.59)
1 − ταe ıϕr
Substituting this in equation (3.58) to express a2 in a1 and then substitute the result in
the first row of equation (3.57), we finally get
⎛ κκ *αe ıϕr ⎞
b1 = ⎜τ * − ⎟a1. (3.60)
⎝ 1 − ταe ıϕr ⎠
We define τ = ∣τ∣e ıϕτ and use ττ * + κκ * = 1 to rewrite equation (3.60) as
2
Although the design of the coupler in [32] is compatible with CMOS deep-UV lithography, the measured
device was fabricated using electron beam (e-beam) lithography.
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Figure 3.18. Racetrack-shaped ring resonator with one and two coupler(s). (a) Sketch with the coupling
described by indicated coefficients of the transmission matrix. (b) Layout of a racetrack resonator with 450 nm
wide waveguides, a straight track of 40 μm, a bend radius of 5 μm, and a coupler as in figure 3.1(a). (c) Sketch
of a racetrack with two couplers (add-drop configuration), © 2014 IEEE, reprinted with permission from [40].
−α + τ e−ı(ϕr+ϕτ )
b1 = a1. (3.61)
e−ıϕr − α τ e ıϕτ
Finally we compute b1b1* and use 2cosθ = (e ıθ + e−ıθ ) to arrive at [39]
α 2 + τ 2 − 2α τ cosθ
b1 2 = a1 2 , (3.62)
1 + α 2 τ 2 − 2α τ cosθ
where θ is the net phase delay of traveling through the ring and coupler
θ = ϕr + ϕτ . (3.63)
In the case of two bus waveguides with identical couplers (figure 3.18c), equations
(3.58) and (3.62) still apply, provided we include the transmission through the
second coupler in the track round-trip by replacing α by α∣τ∣, giving
(α 2 + 1 − 2α cosθ ) τ 2
b1 2 = a1 2 , (3.64)
1 + α 2 τ 4 − 2α τ 2 cosθ
in which the drop bus waveguide is exactly located symmetric to the input bus
waveguide, so that the wave travels half a round-trip from b2 to the second coupler.
Using equation (3.58) we can express the power in the drop waveguide ∣ad ∣2 in terms
of the incident power ∣a1∣2
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Silicon Photonics
2
(1 − τ 2 ) α
ad 2 = a1 2 . (3.67)
1 + α 2 τ 4 − 2α τ 2 cosθ
For typical silicon-on-insulator racetrack resonators, the second and third term at
the right-hand-side of this equation are small (δ, κbb ≪ β ). The uncertainty in the
propagation constant β due to imperfect fabrication is larger than δ and κbb. The last
term of equation (3.68) is usually small as the real part of the complex number of
which the argument is taken is much larger than the imaginary part that is
proportional to δ /s . This term can also be close to π when the real part is negative.
However, in the particular case that nearly all light is coupled from/to the resonator,
cos sL˜ ≈ 0 and the argument is then close to π /2 rad . This was also experimentally
observed in [40] (or [3, section 3.7]). We recall that the dispersion in the effective
index ne and in the directional coupler coefficient s can considered to be linear, while
the dispersion in L̃ is negligible (see sections 2.3 and 3.1, respectively). For a coupler
with two identical waveguides (δ = 0), neglecting the κbb, and with linear dispersion
of the effective index, equation (3.68) reduces to
⎡ ne − ng ng ⎤
θ = −βl = −2π ⎢ + ⎥l , (3.69)
⎣ λc λ⎦
with ne and ng evaluated at the center wavelength λc (for an example, see figure 3.19(a)).
The loss in the coupler can be approximated by the loss in the isolated waveguide,
thus the round-trip transmittance is given by α = e−αpl where αp is the propagation
loss of the waveguide.
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Silicon Photonics
integer number. For the case of two identical waveguides in the coupler (i.e., δ = 0)
and neglecting κbb , the resonance wavelengths λ m are
m · λm = n e(λm ) · l . (3.70)
The free spectral range (FSR) is the difference between the resonance wavelengths of
two adjacent resonances m and m + 1 (see figure 3.19(e)). The FSR may be
approximated by linearizing the relation between λ m and m, then differentiate λ m
with respect to m and compute ΔλFSR = ∣∂λ m /∂m∣ · Δm for Δm = 1. This gives
Figure 3.19. Behaviour of racetrack-shaped ring resonators. (a–e) One coupler, device of figure 3.18(a). (a)
Phase delay θ, equation (3.69). (b) Power in output waveguide ∣b1∣2 , equation (3.62). Resonance extinction ratio
r and full-width at half-max ΔλFWHM . (c) Phase in output waveguide arg{b1}, equation (3.60). (d) Circulating
power ∣b2∣2 , equation (3.59). (e) Same as plot (b) but for larger wavelength interval. (f) Two couplers in add-
drop configuration, device of figure 3.18(c). Power in output waveguide ∣b1∣2 , equation (3.64). Power in drop
waveguide ∣ad ∣2 , equation (3.67). (All) input amplitude a1 = 1 (input power ∣a1∣2 = 1). Track length l = 111 μm,
effective index n e = 2.29 (at λc = 1.55 μm), group index ng = 4.40, round-trip power transmittance α 2 = 0.98
(round-trip loss 0.088 dB), power coupling κ 2 = 0.05, power transmittance τ 2 = 0.95.
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Silicon Photonics
∂λm λ m2 λ m2
ΔλFSR = ·1= = , (3.71)
∂m (n e
∂n
− λm ∂λe l ) ng l
where we use m = (ne(λ m ) · l )/λ m and we compute ∂λ m /∂m by (∂m /∂λ m )−1. The last
equality sign in equation (3.71) follows from equation (2.32).
At resonance, cosθ = 0 and equation (3.62) becomes
(α − τ )2
b1 2 = a1 2 . (3.72)
(1 − α τ )2
From equation (3.72) it is observed that there is no transmission at the wavelengths
of the dips when ∣τ∣ = α , hence when the round-trip loss of the racetrack is equal to
the power coupled to the racetrack. This condition is called critical coupling. The
minimum, ∣b1∣2min , and maximum, ∣b1∣2max , transmitted power occur at resonance and
in between the resonances, respectively. The extinction ratio r ≡ ∣b1∣2min /∣b1∣2max and
the full-width at half-maximum (FWHM) of the dips in equation (3.62) are (figure
3.19(b))
(α − τ )2 (1 + α τ )2
r= , (3.73)
(α + τ )2 (1 − α τ )2
and
λ m2 ⎡ 2α τ ⎤
ΔλFWHM = cos−1 ⎢ ⎥. (3.74)
πlng ⎣ 1 + α2 τ 2 ⎦
The relation for ΔλFWHM is found by solving3 equation (3.62) for cosθ at half-
maximum, i.e., with ∣b1∣2 = (∣b1∣2max + ∣b1∣2min )/2, and then employing the linearized
relation between the phase delay and vacuum wavelength. The equations in this
section, equations (3.70)–(3.74), are also valid for the case of two couplers when α is
replaced by ατ , i.e., the second coupler acts as an additional source of loss.
The relations in equations (3.73) and (3.74) explicitly show the shape of the
resonances as a function of the waveguide and coupler properties, and are very
useful in the design of resonators. The FWHM depends on the losses in the
resonator (transmittance α∣τ∣), and it scales with the free spectral range (FSR),
while the extinction ratio r scales with (α − ∣τ∣)2 so that critical coupling is most
important. Figure 3.20 shows an experimental example of critical coupling. A set of
small racetrack resonators were fabricated with the length of the straight section in
the directional coupler varying from 0.5 μm to 3.5 μm. The corresponding coupler
straight-through transmission power varies from τ 2 = 0.96 to τ 2 = 0.83 and is closest
to the ring loss α 2 = 0.9 for a coupler length of 2 μm where the low transmission at
resonance is seen.
In figure 3.19, we plotted the behaviour of the resonators shown in figure 3.18
(with the assumptions mentioned at the beginning of this section). Plots (b) and
⎡ ⎤
3
The FWHM in terms of phase θ is Δθ FWHM = 2cos−1⎢ 2α2∣ τ ∣ 2 ⎥.
⎣1 + α ∣ τ ∣ ⎦
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Silicon Photonics
Figure 3.20. Experimental example of critical coupling. Small racetrack-shaped ring resonators with straight
section of 10 μm, very small bend radius of 1.5 μm and circumference l = 30 μm. One coupled waveguide.
(a) Optical microscope photograph. (b) Transmission spectra of the racetrack resonators with different coupler
lengths L are plotted as a function of wavelength λ with respect to the wavelength of the resonance λm in nm.
Measurements (solid, blue) and fits (dashed, red). The resonance dip closest to 1550 nm is plotted. Vertical axis
is in dB, i.e., the power is logarithmic. More details may be found in [3, section 3.9].
(e) show the FWHM, extinction ratio, and FSR of these racetrack resonators. The
transmittance at resonance is not zero because the coupling constant τ = 0.95
differs from the round-trip transmission α = 0.98 . Plot (f) shows the same
racetrack as in (b) but with two identical couplers. The transmission at resonance
is lower because the effective loss ατ = 0.931 differs less from the coupling
constant. The FWHM is wider because of this higher effective loss. The peak that
appears in the ‘drop’ waveguide is also plotted. Figure 3.19(c) shows that there is a
rapid change in the phase of the light close to the resonance. This plot is in the
frequency-domain (wavelength-domain), but actually this feature is more interesting
to consider in the time-domain where the phase-delay may be used as a time-delay
[41]. Figure 3.19(d) shows that at resonance, the power circulating in the ring
exceeds the input power by a factor 40. This enhancement of the electromagnetic
field in the ring resonator is especially interesting when non-linear effects are
exploited. Photon pair sources based on photon-pair generation via spontaneous
four-wave mixing (SFWM), such as reported in [42], benefit from the large χ (3) non-
linearity of silicon, the high confinement of light in sub-wavelength SOI waveguides,
and the field enhancement in the ring resonators.
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Silicon Photonics
in which the integral runs over the circumference of the track and κbb is neglected.
Comparing equation (3.75) with equation (3.69) shows that the theory for uniform
guides remains applicable provided that the track-averaged effective indices are used
1
〈ne〉 =
l
∮ ne(ρ)dρ, (3.76)
1
〈ng〉 =
l
∮ ng(ρ)dρ. (3.77)
with
2(arg{τ} − arg{κ}) = π , (3.79)
as derived in appendix B.
We consider an incident wave in waveguide a1 with complex amplitude a1 while
waveguide a2 is dark, i.e., a2 = 0. Then (see figure 3.21(a))
4
Adiabatically tapering means tapering so slowly that hardly any higher modes are excited.
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Silicon Photonics
Figure 3.21. Sketch of Mach–Zehnder interferometer. (a) Sketch with description of couplers and modal field
amplitudes. (b) Sketch of impementation with two directional couplers.
b1 = τa1, (3.80)
b2 = κa1. (3.81)
After propagating through the two waveguides arms with lengths l1 and l2, the waves
in the arms one and two experience a phase delay of ϕ1 = β1l1 with transmittance
α1 and a phase delay of ϕ2 = β2l2 with transmittance α2 , respectively. Thus the
complex amplitudes at the interfaces between the arms and the second 2 × 2 coupler
are given by
c1 = α1e ıϕ1b1, (3.82)
where in the second line τ 2κ 2*=κ 2τ 2*=−∣τ∣2 ∣κ∣2 is used, which follows5 from equation
(3.79). The transmitted power in waveguide d2 is
For couplers with equal power splitting, ∣τ∣2 = ∣κ∣2 = 12 and lossless MZI arm
waveguides α1 = α2 = 0, equations (3.86) and (3.87) reduce to
5
Using Euler’s formula 2cos(ϕ ) = exp(ıϕ ) + exp(−ıϕ ).
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Silicon Photonics
⎛1 1 ⎞
d1 2 = ⎜ − cos[ϕ1 − ϕ2 ]⎟ ∣a1∣2 , (3.88)
⎝2 2 ⎠
⎛1 1 ⎞
∣d2∣2 = ⎜ + cos[ϕ1 − ϕ2 ]⎟ a1 2 . (3.89)
⎝2 2 ⎠
Figure 3.22 shows the result of equation (3.86) for three examples including the case
of equation (3.88).
It follows from the equations above that the Mach–Zehnder interferometer is
periodic in the phase difference Δϕ = ϕ1 − ϕ2 with a period of 2π . When the
transmittance spectrum of a Mach–Zehnder interferometer is measured over a
limited wavelength range, then Δϕ is in good approximation linear in wavelength λ
and this periodicity in wavelength is referred to as the free-spectral-range (FSR). For
a MZI with two waveguides that have identical propagation constant β, the phase
difference Δϕ is given by
Δϕ = β(l2 − l1), (3.90)
with l1 and l2 the lengths of the waveguides of the upper and lower arms,
respectively. The free-spectral-range ΔλFSR is then
∂λ λ2
ΔλFSR = 2π = , (3.91)
∂Δϕ ng l2 − l1
where we used ∂(Δϕ )/∂λ = ∂β /∂λ(l2 − l1) from equation (3.90) and also ∂β /∂λ =
∂β /∂k · ∂k /∂λ with k = 2π /λ and ∂β /∂k = ng from equation (2.32).
Figure 3.22. Example of the behaviour of a Mach–Zehnder interferometer with relative power in one output
port plotted as function of path length difference. Equation (3.86), ∣d1∣2 /∣a1∣2 , for three cases: (1) 50/50 coupler
(∣τ∣2 = ∣κ∣2 = 0.5) with no transmission loss (α1 = α2 = 1), (2) 70/30 coupler (∣τ∣2 = 0.7 , ∣κ∣2 = 0.3) with no
transmission loss, and (3) 50/50 coupler with 2 dB loss in arm 2 (α1 = 1, α2 = 0.79 ). Typical SOI waveguide
(450 nm × 220 nm) with effective refractive index ne = 2.54 at vacuum wavelength λ = 1.55 μm. Path difference
ϕ1 − ϕ2 = β dl with dl plotted from 0 nm to 1500 nm.
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Silicon Photonics
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Silicon Photonics
Electromagnetic theory
Wouter J Westerveld and H Paul Urbach
Chapter 4
Computational methods
In this chapter, we describe two numerical methods that are frequently used for the
modelling of silicon photonic components. As most often in this book, we assume
passive lossless linear materials thereby excluding non-linear effects, sources, and
detectors. The finite difference time domain (FDTD) and eigenmode expansion
(EME) methods are both rigorous in the sense that there are no physical
approximations and by refining the mesh the numerical solutions converge to the
exact solution of Maxwell’s equations. The FDTD method is quite general but also
computationally demanding, thereby it is less suitable for larger devices and
generally slower than other methods described in this paragraph (section 4.1). The
eigenmode expansion method is most suited for a stack of concatenated sections that
are translational invariant over the propagation-direction. For example, the MMI
coupler, the directional coupler, or the out-of-plane grating coupler (section 4.2).
Another popular method is the beam propagation method, however, this method is
less accurate for the high refractive index contrast of silicon-in-insulator waveguides.
Rigorous numerical mode solvers have been discussed in section 2.5.
inhomogeneous. Lossy materials and metals, with the dispersion for example
incorporated using Drude’s model, can also be modelled with the FDTD method.
For simplicitly, we consider here only isotropic and non-dispersive materials.
Maxwell’s equations in an isotropic medium are
∂B
= −∇ × E , (4.1)
∂t
∂D
= ∇ × H + J, (4.2)
∂t
B = μH , (4.3)
D = ϵE (4.4)
where J , is assumed to be a given function of space and time while μ(x , y, z ) and
ϵ(x , y, z ) are given functions of space. For passive silicon photonic components, at
the wavelengths of interest, the magnetic permeability μ = μ0 is equal to that of
vacuum and losses and dispersion can be neglected. In a rectangular coordinate
system, equations (4.1) and (4.2) are equivalent to the following system of equations
∂Bx ∂Ey ∂E
= − z, (4.5)
∂t ∂z ∂y
∂By ∂E ∂E
= z − x, (4.6)
∂t ∂x ∂z
∂Bz ∂E ∂Ey
= x − , (4.7)
∂t ∂y ∂x
4-2
Silicon Photonics
The finite difference equations corresponding to equation (4.6) and equation (4.6)
can be similarly constructed. For equation (4.8) we find
⎛ 1 ⎞ ⎛ 1 ⎞
D nx ⎜i + , j , k ⎟ − D nx−1⎜i + , j , k ⎟
⎝ 2 ⎠ ⎝ 2 ⎠
Δt
⎛ 1 1 ⎞ ⎛ 1 1 ⎞
H nz −1/2⎜i + , j + , k ⎟ − H nz −1/2⎜i + , j − , k ⎟
⎝ 2 2 ⎠ ⎝ 2 2 ⎠
=
Δy (4.16)
⎛ 1 1⎞ ⎛ 1 1⎞
H ny−1/2⎜i + , j , k + ⎟ − H ny−1/2⎜i + , j , k − ⎟
⎝ 2 2 ⎠ ⎝ 2 2⎠
−
Δz
⎛ 1 ⎞
− J nx−1/2⎜i + , j , k ⎟.
⎝ 2 ⎠
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Silicon Photonics
The equations corresponding to equation (4.9) and equation (4.10) can be con-
structed in a similar way.
Figure 4.1 depicts the grid positions where the electromagnetic field components
are stored. As discussed before, the grid points of the E and H fields are chosen such
that the finite difference equations approximate the differential equations (4.5)–(4.8)
such that for given problem the error in the computed field decreases quadratically
with grid spacing Δx , Δy and Δz . For an acceptable error the size of the spatial grid
should be a tenth of a wavelength measure in the material, or less. For stability it is
essential that the time step is chosen to be small so that errors cannot propagate over
more than a grid space. This means that Δt < cmax Δx 2 + Δy 2 + Δz 2 , where cmax
is the maximum speed of light inside the materials of the problem, i.e., cmax is the
maximum of the real part of 1/ ϵμ , taken over all materials in the configuration
In the FDTD method the discrete equations for B and D are solved consec-
1
utively. Starting from known fields B at time index n − 2 and E at time n. The B
Figure 4.1. Grid positions of the electric and magnetic field components. The E-components are in the middle
of the edges and the H-components are in the center of the faces. This grid staggered grid is known as the Yee
cell after its inventor [1]. This image has been obtained by the author(s) from the Wikispaces website (https://
fdtd.wikispaces.com/The+Yee+Cell) where it was made available by guest (117.195.247.135) under a CC BY
3.0 licence. It is included on that basis. It is attributed to guest (117.195.247.135).
4-4
Silicon Photonics
1 1
field at time n + 2
is computed from the B field at time n − 2
and the E field at time
1
n with equation (4.15). Then the H field at time n + is computed using equation
2
(4.3). Then the D field at time n + 1 is computed from the D field at time n, the H
field at time n + 12 and the known current J at time n. Thereafter, E at time index
n + 1 is computed using equation (4.4). This procedure is repeated if the fields are
known at all desired times. When there is no dispersion, the electromagnetic fields
are only stored at one time index and therefore the FDTD method requires only
little computer memory compared to other numerical solvers such as the finite
element method. In the case of dispersive media, more memory is required because
the fields have to be stored at more times to compute the field at the next time index.
Physical quantities of interest such as the power flow or the absorbed electric energy
are computed from the fields.
The current J(x , y , z, t ) can be used to excite an electromagnetic field. The
system can be excited with a time-pulse of given bandwidth and the propagation of
this pulse is followed through the device as a function of time. Typically the fields at
specific locations, e.g. the input and output waveguides of a device, are stored as a
function of time. By Fourier tranforming the computed electromagnetic field as
a function of time, information about a whole set of frequencies can be obtained at
once. If one is only interested in time harmonic fields of a certain frequency, the
system may be exited using a continuous-wave (single-frequency) excitation starting
at some time, say at t = 0. Then the time iteration to solve the discretized Maxwell’s
equations is repeated until field values separated in time by a period are almost
identical.
As is the case for every numerical method based on discretizing Maxwell’s
differential equations, the radiation boundary conditions state that the field
scattered by the objects and radiated by the current sources (if present) propagates
outwards. In particular, these fields vanish at large distances. But they vanish rather
slowly in proportion to the reciprocal distance. Using a computational domain that
is so large that the outwards propagating fields can be set equal to zero on the
boundary is not feasible because it would require a far too large domain and hence
require too much memory and computational power. However, a very elegant
solution to this problem exists, namely the perfectly matched layer (PML), which
was first introduced by Berenger [5]. A cube is chosen as computational domain that
is as small as possible while containing all non-trivial scatterers in its interior. For
silicon photonic integrated circuits, the computational domain is typically chosen
such that the distance from the device to the edge of the cube is of the order of one
free-space wavelength, except for the input and output waveguides. This cube is
placed inside a somewhat larger cube. The volume between the larger cube and the
computational domain is called the PML. The permittivity and permeability of this
layer are chosen such that they vary smoothly as functions of the coordinate in the
PML that is locally perpendicular to the boundary of the cube. Futhermore, the
material properties are chosen equal to those of the materials in the computational
domain and adjacent to the interface between the computational domain and the
PML. This ensures that the scattered and radiated fields are not reflected by this
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Figure 4.2. Example of 2D modelling of an out-of-plane grating coupler that is designed for perfectly vertical
coupling [2] with the finite difference time domain (FDTD) method. (Left) sketch of the coupler and simulation
layout. Electromagnetic fields are excited at the position of the yellow line, with a Gaussian spatial profile.
Electromagnetic fields are recorded at the positions of sensors indicated with the red vertical lines. (Right)
snapshot of the electromagnetic field during the simulation. Red represents positive amplitude and blue
represents negative amplitude. The figure was computed using OmniSim, omni-directional photonic simu-
lations with an FDTD engine. Courtesy of Photon Design, reprinted from OmniSim documentation [3].
interface. Furthermore, the permittivity and permeability in the PML are chosen
such that the field is absorbed. By choosing an appropriate thickness for the PML,
the field that has penetrated the PML can be made to almost vanish on the outer
boundary of the PML. This is then adopted as a new simple boundary condition on
the enlarged domain. Hence the PML means that the boundary conditions become
very simple at the cost of a somewhat enlarged computational domain, which,
however, is much smaller than the domain would have to be were PML not be used.
Figure 4.2 depicts an example of a 2D FDTD simulation of an out-of-plane
grating coupler. In this case, the electromagnetic field is excited at the position where
the optical fibre is placed. The excitation has the same field profile as the mode of an
optical fibre.
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Figure 4.3. Eigenmode expansion method. (a) Scattering at an interface: incident field, reflected field, and
transmitted field. (b) Stack of sections with interface 1 ↔ 2, z-invariant propagation section 2 ↔ 3 of length l23,
and interface 3 ↔ 4. (c) Example of how such a stack describes an 1 × 2 MMI coupler. Adapted from [6]
courtesy of Peter Bienstman.
where Ei and Hj are the electric and magnetic fields of modes i and j, respectively.
Compared to equation (2.57) there is no complex conjugate involved. In this
chapter, we adopt the following definition of the bra-ket notation:
∞
1
〈Ei∣Hj〉 =
2
∬−∞ (Ei × Hj ) · zˆ dxdy, (4.18)
and the modes are normalized using equations (2.61) and (2.62):
〈Ei∣Hj〉 = δij. (4.19)
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where {EI , H I } and {EII , H II } are the modes of media I and II, respectively.
Subscript t denotes either of the tangential components x and y. The minus sign
for the reflected H field is due to the symmetries between forward and backward
propagating modes discussed in equations (2.54–2.55). In the eigenmode expansion
method, we sum over a finite number of relevant modes. To calculate the unknown
reflection and transmission coefficients, Rk,p and Tj,p, we take the cross product of
equation (4.20) with HiI,t from the right and the cross product of equation (4.21) with
EiI,t from the left. Here, i is an arbitrary mode index. After integrating over the
interface, we get
E pI HiI + ∑Rk,p E kI HiI = ∑Tj,p E jII HiI , (4.22)
k j
with the inner product defined in equation (4.18). The orthogonality relation (4.19)
implies
δip + Ri ,p = ∑Tj,p E jII HiI , (4.24)
j
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1
Ri ,p =
2
∑( E jII HiI − EiI H jII Tj ,p. ) (4.27)
j
The summation is truncated after N relevant modes. This shows that the transmission
coefficients Tj,p for each j and incident mode p can be found by solving the linear system
(4.26). Thereafter, the reflection coefficients Ri,p for arbitrary i follow using (4.27).
We proceed by writing equations (4.26) and (4.27) as matrix equations, thereby
introducing the so-called transmission matrix T and reflection matrix R which are
the transmission coefficients Ti,j and reflection coefficients Tk,l in matrix notation. We
define the overlap matrices O and O′ by
Oij ≡ EiI H jII , (4.28)
1 ′
R= (O − O )T , (4.32)
2
where ()−1 indicates matrix inversion.
As Maxwell’s equations are linear, scattering of an arbitrary incident wavefield
from medium I can be found by expanding the incident field in modes. Let
fI = (fI ,1 , fI ,2 , fI ,3 , …)T be the modal amplitudes of the forward incident waves,
which cause backwards traveling reflected waves with amplitudes bI and forward
traveling transmitted waves in medium II with amplitudes fII . These modal
amplitudes are related via
bI = R(I →II ) fI , (4.33)
1
Let us rewrite equation (4.31) to equation (4.26). Left multiplication of equation (4.31) by A ≡ (O + O′)
gives AT = 2I , with I the identity matrix. We consider element i , p of this equation and use
( )
(AT )i,p = ∑j Ai,j Tj ,p and Ai,j = 〈EiI ∣H jII 〉 + 〈E jII ∣HiI 〉 to arrive at equation (4.26) Let us also rewrite
equation (4.32) to equation (4.27). We define B = (O ′ − O ) and consider element i , p. Using
( )
(BT )i,p = ∑j Bi,jTj ,p and Bi,j = 〈E jII ∣HiI 〉 − 〈EiI ∣H jII 〉 , we arrive at equation (4.27).
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where fi and bi are column vectors containing the modal amplitudes of the forwards
and backwards traveling modes at z-position i. The transfer matrix T˜(i→j ) character-
izes the scattering from position i to position j, and may describe interfaces, e.g.
T˜(1→2), propagation, e.g. T˜(2→3), or both, e.g. T˜(1→4). The T-matrix T̃ is different from
the transmission matrix T as it describes both forwards and backwards traveling
waves simultaneously and may also include propagation.
To determine the transfer matrix T˜(1→2) at the interface we start from the
transmission and reflection matrices as used in equations (4.33) and (4.33) but
with incidence from both sides simultaneously,
f2 = T(1→2) f1 + R(2→1)b 2 , (4.36)
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⎡ f ⎤ ⎡T(1→2) − R(2→1)T(2−→1
1)R(1→2)
1 ⎤
R(2→1)T(2−→1) ⎡ f1 ⎤
⎢ ⎥=
2 ⎢ ⎥ ⎢ ⎥. (4.39)
⎣ b 2 ⎦ ⎢⎣ 1
− T(2−→ 1)R(1→2)
1
T(2−→ 1)
⎥⎦ ⎣ b1⎦
The transfer matrix for propagation through a z-invariant section is easy to write
down using equation (2.30). For section 2 → 3,
⎡ f ⎤ ⎡ diag(e−ıβν l23) 0 ⎤⎡ f ⎤
⎢ 3⎥ = ⎢ ⎥ ⎢ 2 ⎥, (4.40)
⎣b 3⎦ ⎣ 0 diag(e ν 23)⎦ ⎣ b 2 ⎦
ıβ l
where the submatrices diag are diagonal matrices containing the propagation
constants βν of each eigenmode ν of section 2 ↔ 3, with l23 the length of this section.
After calculating the transfer matrixes for the interfaces and propagation sections,
the transfer matrix for the whole stack in figure 4.3(b) is
T˜(1→4) = T˜(3→4) T˜(2→3) T˜(1→2), (4.41)
with fi , bi , f j and bj the modal amplitudes of the forward and backward traveling
waves at z-positions i and j and with S̃ the scattering matrix. The S-matrix directly
follows from the reflection and transmission matrices, c.f. equations (4.33) and
(4.34), but with the incident waves from both sides superimposed as in equations
(4.36) and (4.37), e.g.
⎡ f ⎤ ⎡ T(i→j ) R(j→i )⎤ ⎡ f ⎤
⎢ j⎥ = ⎢ ⎥ ⎢ i ⎥, (4.43)
⎣ bi ⎦ ⎣ (i→j ) (j→i ) ⎦ ⎣ bj ⎦
R T
for interface i ↔ j .
In the S-matrix scheme, we directly write down the S-matrix for an interface with
the adjacent propagation section, thus directly from z-position i to z-position i + 2.
We consider the interface with section 1 → 3. The interface is described by equation
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f4 = T(3→4)[I − R(3→1)R(3→4)]−1T(1→3)f1
(4.53)
+ T(3→4)[I − R(3→1)R(3→4)]−1R(3→1)T(4→3)b4 + R(4→3)b4.
Now we solve equation (4.50) for R(3→4)f3, then multiply equation (4.47) with R(3→4),
and thereafter equate these two equations to find
b 3 − T(4→3)b4 = R(3→4)T(1→3)f1 + R(3→4)R(3→1)b 3, (4.54)
or
From equations (4.56) and (4.53) we deduce the scattering matrix S˜(1→4) in the form
of equation (4.43) with
T(1 → 4) = T(3 → 4)[I − R(3 → 1)R(3 → 4) ]−1T(1 → 3), (4.57)
R(4 → 1) = T(3 → 4)[I − R(3 → 1)R(3 → 4) ]−1R(3 → 1)T(4 → 3) + R(4 → 3), (4.58)
R(1 → 4) = T(3 → 1)[I − R(3 → 4)R(3 → 1) ]−1R(3 → 4)T(1 → 3) + R(1 → 3), (4.59)
We know how to compute scattering matrices for interfaces, equations (4.31) and
(4.32), how to compute propagation in z-invariant sections, equation (4.46) and how
to compute the overall scattering matrix of two adjacent sections, equations (4.57–
4.60). Hence the overall scattering matrix of the device can be computed by starting
at the first interface and working our way through the rest of the device.
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Figure 4.4. Example of the modeling of a 1 × 4 multimode interference (MMI) coupler using eigenmode
expansion. This device has a 220 nm thick silicion light-guided layer (n = 3.5) embedded in a silicon-dioxide
cladding (n = 1.44) and the wavelength is λ = 1.55 μm. (Left) sketch. (Right) intensity profile computed with
the FimmProp eigenmode expansion software. Courtesy of Photon Design, reprinted from FimmProp
documentation [8].
Figure 4.5. Example of the modeling of an out-of-plane grating coupler that is designed for perfectly vertical
coupling [2]. (Left) sketch. (Right) snapshot of one component of the electric field as computed with eigenmode
expansion software. Courtesy of Photon Design, reprinted from FimmProp documentation [8].
output waveguides, and the widths of the input and output waveguides. It is
generally necessary to perform many simulations with different parameters to arrive
at the optimal design. Therefore, the higher speed of the eigenmode expansion
method, compared to, e.g. the FDTD method, is important. The design shown in
figure 4.4 has MMI waveguide length of 30.1 μm, width of 8.2 μm, and input/output
waveguides widths of 1.5 μm. The total power transmitted from the input waveguide
to the output waveguides is 99% and the imbalance (relative difference in power)
between the output waveguides is 3 · 10−7.
In figure 4.5 the out-of-plane grating coupler proposed in [2] is shown. This
coupler was optimized for vertical coupling in the y-direction which is, for example,
desired when a downwards-emitting VCSEL laser is positioned on the planar circuit.
In this design special grating teeth are used to improve the upwards coupling. Also, a
slit is applied in front of the grating to reduce reflections. The design is in silicon-on-
insulator and has a computed coupling efficiency of 50%. To arrive at this design,
many simulations were required.
Tapers, which gradually vary with z, may be simulated using eigenmode expansion
by slicing the taper into many small sections of constant cross-section—a staircase
approximation. This z-discretisation is inefficient because the regular steps create a
non-physical grating, which can cause spurious coupling between pairs of modes.
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Advanced methods get away from the staircase approximation by assuming the
cross-section or some other intermediate quantity varies linearly (or to some higher
power) along the small section and then computing the resulting cross-coupling
between the modes. This method is developed by Photon Design (Oxford, UK) and
implemented in their commercial FimmProp software [7, 8]. Additionally, this can
be combined with an efficient and adaptive choice of the discretisation of the taper in
the z-direction [7, 8, 10].
References
[1] Yee K S 1966 Numerical solution of initial boundary value problems involving Maxwell’s
equations in isotropic media IEEE Trans. Antennas Propag. 14 302–7
[2] Roelkens G, Thourhout D V and Baets R 2007 SOI grating structure for perfectly vertical
fiber coupling European Conf. on Integrated Optics (ECIO) (Denmark) FC4
[3] Photon Design 2016 Omnisim, omni-directional photonic simulations (Oxford: Photon
Design) www.photond.com/products/omnisim.htm
[4] Griffiths D J 1999 Introduction to Electrodynamics 3rd edn (Upper Saddle River, NJ:
Prentice-Hall)
[5] Berenger J-P 1994 A perfectly matched layer for the absorption of electromagnetic waves
J. Comput. Phys. 114 185–200
[6] Bienstman P 2001 Rigorous and efficient modelling of wavelength scale photonic compo-
nents” PhD Dissertation Universiteit Gent www.photonics.intec.ugent.be/publications/phd.
asp?ID=104
[7] Gallagher D F G and Felici R P 2003 Eigenmode expansion methods for simulation of
optical propagation in photonics: pros and cons Integrated Optics: Devices, Materials, and
Technologies VII, 69 (San Jose, CA, June 2003) Proc. SPIE 4987 290–94
[8] Photon Design 2016 Fimmprop, a bi-directional optical propagation tool (Oxford: Photon
Design) www.photond.com/products/fimmprop.htm
[9] Zaki K A, Seng-Woon C and Chunming C 1988 Modeling discontinuities in dielectric-
loaded waveguides IEEE Trans. Microw. Theory Tech. 36 1804–10
[10] Lumerical 2017 Lumerical’s eigenmode expansion (EME) solver (Vancouver: Lumerical)
www.lumerical.com/tcad-products/mode/EME
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Electromagnetic theory
Wouter J Westerveld and H Paul Urbach
Chapter 5
Devices
real part of the effective index, which amounts to detecting a phase shift. For this a
component is needed which changes the phase shift into a change of amplitude.
Sensors are most often based on ring resonators whose resonance frequencies are
very sensitive to the effective index of the ring waveguide. However, the refractive
index of silicon is very dependent on temperature hence the temperature of the ring
resonator has to be controlled or the temperature is measured by another ring
resonator. The induced shift in the resonance wavelengths can be measured by
recording the transmission spectrum. Alternatively, narrow-bandwith laser light can
be tuned to a wavelength at the flank of the resonance dip so that a shift of the
resonance causes an amplitude change of the transmitted light. Modulators have
different requirements than sensors. International standards on optical fibre com-
muncation impose stringent rules on the wavelengths that are to be used [20].
Temperature control consumes more power than is affordable in telecommunication
applications. Therefore modulators often use a Mach–Zehnder inteferometer to
translate an induced effective index change in one of its arms to an amplitude change
[21]. Interferometers are only sensitive to the difference between its arms and
temperature equally affects both arms.
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∂λm ⎛ n ⎞ ⎛ λ ∂n λ ∂l ⎞
= ⎜ e ⎟ ⎜ c e + c ⎟, (5.3)
∂χ ⎝ ng ⎠ ⎝ n e ∂χ l ∂χ ⎠
where ng = n e − λc ∂n e /∂λ as derived in equation (2.32). The first term at the right of
equation (5.3), n e /ng , originates from the fact that the waveguide is dispersive
(the effective index n e is wavelength dependent), the second term is the change of the
effective index due to a change of the physical parameter χ, and the third term is the
change in track length due to a change of χ. The term originating from the dispersion
n e /ng is smaller than unity and therefore reduces the sensitivity of the sensor. This
effect is stronger for smaller waveguides as seen in figure 2.7(a) and figure 2.10(a).
The third term is zero when external physical effect χ only affects the effective index
of the waveguide but not the length of the resonator. This is the case for refractive
index sensors. This is also a good approximation for the influence of temperature on
ring resonators because the influence of the thermo-optic effect is much larger than
the influence of the thermal expansion of the ring resonator. When the length is not
influenced by the external physical effect χ, it can be seen in equation (5.3) that
the shift of the resonance wavelength does not depend on the circumference of the
racetrack. In the case of mechanical deformation, both the effective index and the
track length change.
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We define
γ2 γ
αa ≡ 2
+ 32 , (5.7)
n2 n3
k x2 γγ
αb2 ≡ 4
− 22 3 2 , (5.8)
n1 n 2 n3
and α2 -α5 as in equations (2.108)–(2.111), to arrive at
⎧ ⎛
∂kx ⎪ ⎛ 4k 2 2αb2 ⎞⎞ ∂n1
= kx⎨ ⎜⎜(α2 + α3)k 02n1 + αa⎜ 5x − ⎟⎟⎟
∂χ ⎪
⎩⎝ ⎝ n1 n1 ⎠⎠ ∂χ
⎛ γ ⎛ γ ⎞⎞ ∂n
− ⎜⎜α2k 02n2 + 2 23 ⎜αb2 + αa 32 ⎟⎟⎟ 2
⎝ n2 ⎝ n 3 ⎠⎠ ∂χ
(5.9)
⎛ γ ⎛ γ ⎞⎞ ∂n ∂d ⎫
⎪
− ⎜⎜α3k 02n3 + 2 33 ⎜αb2 + αa 22 ⎟⎟⎟ 3 − αb4n12kxsec 2[kxd ] ⎬
⎝ n3 ⎝ n 2 ⎠⎠ ∂χ ⎪
∂χ ⎭
⎧ ⎛k 2
⎪ γ2γ3 ⎞ ⎫−1 ⎪
and
⎛ ∂n ∂n ∂n ⎞ ∂b
kyk02⎜(α 4 + α5)n1 1 − α 4n 4 4 − α5n5 5 ⎟ − ky(ky2 − γ4γ5) 2sec 2[kyb]
∂ky ⎝ ∂χ ∂χ ∂χ ⎠ ∂χ (5.10)
= .
∂χ (γ4 + γ5)(ky2 + γ4γ5) + ky2(α 4 + α5 ) + b(ky2 − γ4γ5) 2sec 2[kyb]
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Silicon Photonics
dioxide, as well as the linear thermal expansion coefficients, are given, e.g. in [22]
and [26], respectively.
5.1.5 Biosensors
Biosensors are refractive index sensors that measure specific molecules in blood or
other liquids. A high concentration of a certain molecule can indicate a certain
disease. Very accurate measurements of the molecular concentration are required to
enable reliable medical diagnosis. Apart from realising biosensors that are highly
accurate, there is also interest in making cheap hand-held devices to replace
expensive laboratory equipment. Affordable hand-held devices are especially
interesting for point-of-care diagnosis where a medical practitioner is directly able
to perform a diagnosis rather than waiting for laboratory results.
Refractive index sensors, also known as evanescent field sensors, probe the refractive
index in the vicinity of a waveguide through the evanescent part of the waveguide mode
(i.e, the part outside the core of the waveguide). The evanescent field typically extends
tenths of nanometers outside the core of the waveguide. A microfluidic channel is
fabricated on top of the SOI chip in order to let liquid (e.g. blood) flow over the ring
resonator surface but not over the other part of the photonic circuitry.
In bulk refractive index sensors, the refractive index of the liquid surrounding the
waveguide is measured (n2 , n3, n5 in figure 2.5). This type of sensor is not sensitive to
specific molecules and is more useful for micro-chemical applications where the
composition of the liquid is known. A change of the effective refractive index of this
type of sensors can be computed with the approximate theory for rectangular
waveguides (described in section 5.1.4).
For biomedical sensors the surface of the waveguide is functionalized with
receptors that selectively bind to specific molecules. These receptors trap the
molecules in a thin layer around the waveguide, exactly the region where the
evanescent field is largest and most sensitive.
We describe the waveguide geometry by its refractive index profile n(x , y ) or
permittivity profile ε(x , y ) = ε0n 2(x , y ). The change in the waveguide effective index
Δn e caused by a change in the permittivity profile Δε(x , y ) can be computed using
the variational theorem of waveguides [29, 30]. For TE-like modes, this change Δn e
may be approximated by
+∞
Δn e = c ∬−∞ Δε(x , y )Ex(x , y ) · Ex(x , y )*dxdy , (5.11)
with Ex(x , y ) the dominant electric field component of the TE-like mode and c the
propagation speed of light. It is seen that the sensitivity is high when the change of
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permittivity Δε(x , y ) is large in regions where the electric field Ex is large. The
sensitivity of the sensor depends on the exact design, for example a thin waveguide
results in a larger electric field at its interfaces which gives a higher sensitivity than a
thicker waveguide where the light is more strongly confined in and near the core.
In figure 5.1 an evanescent wave sensor is shown that is used to sense the protein
avidin. The waveguide is covered with a layer of biotin which acts as a receptor for
the avidin. The working principle of the device is sketched in plots (a–d). The
binding of the advin molecules to the receptors on the waveguide induces a change in
the modal effective refractive index of the waveguide. This causes a shift in the
resonance frequency of the ring which is measured. In figure 5.1(f) measured
wavelength shifts as function of concentration are shown.
For a well-written introduction to silicon photonic biosensors including the
surface chemistry and biochemistry, we refer to the thesis of De Vos [15]. The
review of Kindt and Bailey [14] highlights some exciting biomedical applications. A
recent development in biosensors is enhanced Raman specroscopy using silicon-
nitride waveguides, see e.g. [31] for an introduction and [32] for a state-of-the-art
result.
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Figure 5.1. Example of a biosensor for detecting avidin protein concentrations (reproduced from [15, 27, 28]).
The surface of the ring resonator is functionalized by linking biotin receptor molecules to the waveguide
surface. Different concentrations of avidin in phosphate buffer solution (PBS) were flowed across the sensor
surface. (a) Sketch of the ring resonator sensor with functionalized surface, before sensing. (b) After sensing,
the avidin proteins are bonded to the biotin receptor molecules. (c, d) Sketch the resonance wavelength shift
due to the binding of the avidin which causes a change of the local refractive index. (e) Scanning-electron-
microscope (SEM) picture of the ring resonator. (f) Measured wavelength shifts for different concentrations of
avidin. Each data point shows the difference in resonance wavelength of the ring resonator immersed in PBS,
before and after being in contact with the avidin solution. Redundant avidin molecules are rinsed thoroughly
with PBS, so no bulk refractive index changes are involved. In addition, the response of the sensor to another
protein, bovine serum albumin (BSA), is measured to determine the selective response to avidin. The response
to BSA concentrations is clearly lower, but this particular type of receptor molecule layer is not selective
enough for practical applications. Improved surface functionalization has been developed [14, 15, 17]. (a)–(c)
from [27], copyright 2012 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim. (d, e) Courtesy of Katrien de
Vos. (f) Reprinted with permission from [28].
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Figure 5.2. Optical micromachined ultrasound sensor (OMUS) based on a silicon photonic micro-ring
resonator integrated in an acoustic resonant membrane. The acoustical resonance frequency of the membrane
is 0.76 MHz with a bandwidth of 19%. (a) Sketch of the sensor. (b) Microscope photograph of the sensor. The
sensor is illuminated from above and also from below such that the thin silicon-dioxide membrane is visible.
Tiny dark wires are the waveguides. (c) Operation principle of the interrogation. The deformation-induced
wavelength shift is recorded as intensity modulation of a single-wavelength laser source at the flank of the
optical resonance. (d) Measured transmission spectrum of the ring resonator. (e) Analysis of the sensor for
different laser wavelengths. Measured signal voltage swing of the OMUS with acoustic excitation (blue line),
the RMS value of the noise in the output intensity (red line), and the transmittance (dashed black line;
normalized for visibility). (f) Time responses of the OMUS (red line, time >160 μs) for transmitted acoustical
pulses with two acoustical centre frequencies (black line, time <40 μs). Figure reproduced from [19]. Reprinted
by permission from Macmillan Publishers Ltd, copyright 2015. Additional details may be found in [18, 19].
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technology and then using micro-machining technology to etch the membrane from
the backside of the chip (figure 5.2(b) shows a microscope photograph). Incident
ultrasound waves deform the membrane and thus the resonator, thereby shifting the
optical resonance wavelengths. This shift is interrogated by inserting laser light with
a wavelength exactly at the flank of the resonance of the unperturbed ring. The shift
of the resonance wavelength due to the deformation of the membrane and ring is
detected by a modulation of the amplitude of the transmitted light (figure 5.2(c)).
An acoustical pressure P results in a non-uniform deformation of the racetrack
resonator. Four physical effects play a role in the resulting wavelength shift [33, 34].
First, the circumference of the track l increases. Second, the cross-section of the
waveguide shrinks due to the Poisson effect. Third, the refractive indices of the silicon
and SiO2 change due to the photo-elastic effect. The latter two effects together
influence the effective index n e of the waveguide. Fourth, the shift in resonance is
affected by the dispersion in the waveguide, as shown in equation (5.3). For a non-
uniform deformation of the ring resonator we write the resonance condition as
where the coordinate ρ runs along the track (see section 3.4.3) and Sρ is the local
strain in the direction of the track due to which an element of length dρ at given ρ
stretches to (1 + Sρ )dρ. Analogous to the derivation in section 5.1.1 we differentiate
equation (5.12) with respect to the pressure P. Assuming a uniform waveguide prior
to deformation with effective index n e and group index ng, we obtain [34]
⎛ ⎞
⎜ ⎟
∂dλm ne ⎜ λc ∂ne ∂Sρ ⎟
= · + λc , (5.13)
∂P ng ⎜ ne ∂P ∂P ⎟
⎜ ⎟
⏟
dispersion ⎝ eff.index track-length ⎠
where 〈·〉 denotes averaging over the track length and where λc is the resonance
wavelength without deformation. We denote the length of the track prior to
deformation by l and the length of the deformed track by l + Δl (P ). Considering
the last term of equation (5.12) we note that 〈Sρ(P )〉 = ∮ Sρ(P )dρ /l = Δl (P )/l , which
is the relative elongation of the track. Hence the influence of the track-length change
can be written as
∂Sρ λc ∂(Δl )
λc = . (5.14)
∂P l ∂P
For typical single-mode silicon-on-insulator waveguides, ne /ng ≈ 1/2. The influence
of the strain-induced change in the effective index turns out to be about a third of the
effect due to elongation and the two effects oppose each other. This factor was
measured for waveguides that were stretched in the long direction of the guide [34].
This results in a sensitivity of the ultrasound sensor that is about one third of the
right-hand-side of equation (5.14).
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have high technological and commercial demands. These include a low price of
fabrication, small device footprint, low power consumption per bit, high bandwidth
and large modulation depth. Moreover, these devices need to work at specific
telecommuncation wavelengths and their performance should not be affected by
temperature fluctuations. The interconnects for long-haul fibre communication, such
as intercity or even across the Atlantic, use the full capacity of their fibres and
require very high modulation bandwidths [10]. This is often achieved with lithium
niobate modulators [35] and complex modulation formats by which bits are encoded
in both phase and amplitude of the light. Fibre to the home (FTTH) interconnects
require cheap transducers and often use direct modulation of the current supplied to
the laser, thereby modulating the light amplitude albeit with much lower bandwidth.
Silicon photonic modulators offer a unique combination of low fabrication costs and
performance enhancements resulting from electronic–photonic integration which
are both provided by the CMOS fabrication technology. Silicon modulators are now
attractive for intermediate and short distances for which integration and large
bandwidth are important [10].
Within silicon technology, modulators can use different modulation formats, use
different physical effects to convert the electrical to an optical signal, and use
different integrated optical components to enhance this conversion. In this section,
we describe a popular implementation of silicon photonic modulators that achieves
so-called on-off keying using carrier depletion in a Mach–Zehnder interferometer.
This section is inspired by the review of Reed et al [21] which is an excellent
introduction to silicon photonic modulators and includes more details on historical
developments, junction types, and a detailed evaluation of the performance metrics.
Details and advances of the field may furthermore be found in the handbook edited
by Vivien and Pavesi [6, chapter 9] or [36]. Section 5.2.4 describes the modulator
reported by Thomson [37]. Winzer and Essiambre review [38] advanced optical
modulation formats in the broader context of optically routed wavelength-division-
multiplexed networks. Sotiropoulos [39] explains some formats in detail and
discusses the relevant example of an advanced demodulator/receiver in silicon
photonic technology.
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which are low compared to the frequency of the light (∼193 THz). The electro-optic
effect can be used to alter the real part of the refractive index Δn , referred to as
electro-refractive. The electro-optic affect can also alter the imaginary part of the
refractive index, referred to as electro-absorption and described by the intensity
absorption coefficient1 Δα . Physical effects that are traditionally used in semi-
conductor materials are the Pockels effect, the Kerr effect and the Franz–Keldysh
effect [21]. However, these effects are weak in pure silicon at the telecommunication
wavelength of 1.55 μm [1, 40] and therefore alternative methods are used. The
thermo-optic coefficient of silicon is large [41] but this effect is too slow for modern
telecom applications. Recent research efforts also explore mechanisms using other
materials that are compatible with silicon technology, such as germanium, to form
quantum wells for higher modulation efficiencies [6, 21]. Today’s most common
method of silicon optical modulators is based on the plasma dispersion effect, in
which the concentration of free charges in silicon changes the real and imaginary
parts of the refractive index.
The semiconductor physics of so-called pn-junctions that is necessary to under-
stand how free charges (electrons and holes) behave in this junction is explained in
appendix C.
Soref and Bennet [42] evaluate the changes in refractive index Δn from
experimentally observed absorption curves. They quantify the change in the real
refractive index Δn as well as the change in the absorption Δα resulting from a
change of the concentration of free charges. Let ΔNe be the change in the
concentration of free electrons and ΔNh the change in the concentration of free
holes. Then the following relations hold for silicon at a free-space wavelength of
1.55 μm [42]:
Δn = −8.8 · 10−22ΔNe − 8.5 · 10−18(ΔNh )0.8 (5.15)
1
The complex refractive index n̂ describes real effective index n and the intensity absorption coefficient α via
nˆ = n + α /(2k ). Considering a plane wave, the transversal component of the electric field
E = E0 exp(ıωt − ınkz
ˆ ) = E0 exp(ıωt − ıknz )exp(−αz /2). The intensity I scales with the square of the electric
field such that I = I0 exp(−αz ).
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Figure 5.3. Sketch of an implementation of a silicon photonic modulator based on carrier depletion in the
waveguide. (a) pn-junction waveguide modulator. Reprinted from [21] by permission from Macmillan
Publishers Ltd Copyright 2010. (b and c) Specific design of Thomson et al [37]. (b) Sketch of rib waveguide
with profile of the fundamental mode with an effective index of 2.495. Plot of Ex where dark blue indicates a
large amplitude and white indicates zero amplitude. (c) Cross-section of the pn-junction/waveguide. At the
position where the optical mode is, the p-type (indicated purple) and n-type (indicated brown) materials have a
low doping concentration to avoid strong absorption (NA ∼ 3 · 1017 cm3 and ND ∼ 1.5 · 1018 cm3, respec-
tively). Further away from the optical waveguide, the p-type and n-type materials have a high doping
concentration to provide good conductivity (ND ∼ NA ∼ 1020 cm3).
Vd (see appendix C). The carrier depletion based optical modulator works as
follows. The electronic signal containing the desired modulation is connected to the
metal connections alongside the waveguide such that the voltage Vd (t ) across the pn-
junction represents this signal. The width of the carrier depletion area follows the
applied signal. In the area between the maximal and minimal width of this region,
the carrier density varies strongly from the bulk p- or n-type carrier densities to the
low carrier density of the depletion area. This dynamic change in free-hole density
ΔNh and free-electron density ΔNe causes a dynamic change in the silicon refractive
index Δn and absorption Δα via the plasma dispersion effect, equation (5.15).
Meanwhile a lightwave travels through the waveguide with the modal field strongest
in the centre of the waveguide. The phase that is accumulated by the light is strongly
dependent on the effective index Δn e of the waveguide thus on the silicon refractive
index which is being modulated. Additionally, the amplitude of the light is being
modulated due to the absorption. Although this absorption modulation could
directly be used as the modulation mechanism, it is more efficient to use the phase
modulation as the prime modulation mechanism by embedding the waveguide in a
structure such as a Mach–Zehnder interferometer.
The modulation speed or bandwidth is the key figure of merit for optical
modulators. Modulation bandwidth is usually defined by the frequency at which
the modulation is reduced to 50% of its maximal value. The speed of a modulator is
commonly characterized by its ability to carry data at a certain rate. The electronic
behaviour of the pn-junction and driving electronics is the limiting factor for the
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with Iin the inserted optical power, α1 the amplitude transmission loss in the MZI
arms, and ϕ1 − ϕ2 the difference between accumulated phases in the upper and lower
arms. We consider the case that the effective index of the waveguide in the upper of
the arm MZI is modulated while the lower arm is constant. Without modulation
both waveguides have effective index ñ e . With modulation, the upper MZI arm has
effective index n e = n˜ e + Δn e(t ), with Δn e(t ) the time-dependent modulation. Then
ϕ1 − ϕ2 = k Δn e(t ) l , (5.18)
α1 = e−αpl , (5.19)
with l the MZI arm length, k = 2π /λ the free-space wavenumber, and αp the
amplitude propagation loss per unit length. This waveguide propagation loss
includes scattering due to waveguide surface roughness and material absorption,
but also the additional loss caused by the pn-junction. Some care has to be taken
regarding the different definitions of loss or transmittance. We have total amplitude
loss over a waveguide segment α1 and amplitude propagation loss per unit length αp
as used in equation (5.19). In equation (5.16) the material loss is expressed as
intensity propagation loss per unit length α.
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The modulation depth, also known as the extinction ratio, is defined as the ratio
of Imax , the intensity transmitted when the modulator is adjusted to maximum
transmission, to Imin , the intensity transmitted when the modulator is adjusted for
minimum transmission. It is quoted in decibels and expressed as 10 log(Imax /Imin ).
The modulation depth increases with longer MZI arm lengths l at the cost of
increasing device loss and higher power consumption to apply the driving signal Vd.
2
A recommended textbook is Microwave Engineering by Pozar [43] and details of coplanar waveguide design
can be found in the book by Garg, Bahl and Bozzi et al [44], chapter 7.
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fab. The fab starts with a clean silicon-on-insulator wafer. A photo-sensitive layer is
spincoated on the wafer. This layer is illuminated with the pattern that has to be
written in this layer. (One may compare this with traditional photography, where an
image is created by light that is incident on a photographic film.) Then the
photosensitive layer is developed, transforming this layer into a mask which protects
only the illuminated patterns. The actual fabrication is done using etching, a
chemical process in which a plasma ‘eats’ the unprotected silicon. Then the residue
of the mask is removed and the wafer is cleaned. Most chips require more than one
of these fabrication sequences, for example for the fabrication of out-of-plane
grating couplers, which basically is a grating etched in the top surface of a wide
waveguide [45].
In reality, micro-fabrication when considered on the nano-scale is a rather rough
process. Note that the width of a waveguide (500 nm) is about one hundredth of the
diameter of a human hair. We will illustrate the difficulties in the processing with
some examples. In the photolithography, the imaging has to be accurate within a few
nanometers over a surface of about 1 cm2 (the footprint of chip). Multiple layers
have to be aligned to each other. This means that after fabrication of the first layer,
the wafer has to go back into the lithography machine where the image of the second
layer has to be aligned to the pattern on the wafer with an accuracy of a few tens of
nanometers. Furthermore, etching causes rough surfaces and possible non-uniform-
ity over the wafer. The top of the patterns is protected by the mask, but the
formation of the sides is determined by the etch process. The unprotected areas of
the chip consume the etchant at a higher rate than the protected patterns, giving a
variation in the concentration of the etchant over the wafer. Etching small deep
features is especially difficult as ‘fresh’ etchant hardly reaches the bottom of the
feature.
The previously mentioned challenges cause the fabricated devices to differ from
the designs. We mention a number of notable differences. (1) The world-leading
manufacturer of SOI-wafers, Soitec (Bernin, France), specifies the variation of the
height of the silicon light-guiding layer as 20 nm, which amounts to 10% of the
typical height of 220 nm [46]. (2) Deviation of the actual light dose from the ideal
one in the photolithographic process as well as uncertainties in the etching process
may cause the size of the manufactured devises to differ from the designs. (3) The
lithographic process can be optimized for only one feature size [47]. For example,
when the process is optimized such that 450 nm wide waveguides are fabricated
according to design then waveguides with other widths are generally fabricated
smaller or larger than designed. (4) The sides of the pattern (waveguide) that ideally
would be perpendicular, can in practice have an inclination angle of about 10 degrees
[48]. (5) Furthemore, the side walls are often not smooth but have have nanometer-
scale roughness [49].
For an optical designer, it is necessary to design the devices such that they remain
functional regardless of the inaccuracies caused by the fabrication. There are two
approaches to take account of these fabrication-variations. For known fabrication-
induced deviations, it is often possible to design the pattern such that is it not
identical to the desired pattern, but after fabrication it becomes equal to the desired
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Figure 5.4. Silicon photonic modulator presented by Thomson et al [37]. (a) Microscope image of a
fabricated MZI modulator with 250 μm long phase modulators. Only one phase modulator is used in the
measurements. The diagram is annotated to show the position of the waveguides. Positions to electrically
connect the signal (S) and two grounds (G) of each of the two coplanar microwave waveguides are shown.
(b) Spectral response of the MZI with different reverse bias voltages. (c) Phase shift achieved for different
reverse bias voltages. (d) Eye diagram derived from optical pseudorandom binary sequence (PRBS) data
output at 40 Gbit/s. MZI with 6.5V RF reverse bias signal operated at quadrature. Measured extinction ratio
is 3.5 dB. Reprinted with permission from [37].
pattern. For example, when one knows the relation between the designed and
fabricated width of a waveguide, it is easy to design the width such that after
fabrication the desired width is obtained. When the deviations due to the fabrication
are unpredictable, the design should be such that it is tolerant against the deviations,
i.e., that the device performance remains acceptable in spite of the deviations.
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Figure 5.5. Design of the directional couplers for racetrack resonators for ultrasound sensing. (a, d) Extinction
ratio r using equation (3.73), (b, e) full-width at half-maximum ΔλFWHM using equation (3.74), and (c, f)
sensitivity approximated by (1 − r )/ΔλFWHM in relative power per picometer, all plotted as a function of
coupler straight-through power ∣τ∣2 , with coupled power ∣κ∣2 = 1 − ∣τ∣2 . (a–c) Typical round-trip transmittance
α 2 = 0.98, power loss (1 − α 2 ) = 0.02 . (d–f) Low-loss round-trip transmittance α 2 = 0.999, power loss
(1 − α 2 ) = 0.001. Track length l = 111 μm, effective group index ng = 4.28, and free-space wavelength
λc = 1550 nm .
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Electromagnetic theory
Wouter J Westerveld and H Paul Urbach
Appendix A
Coupled mode theory of parallel waveguides
In this appendix the coupled mode theory as derived by Hardy and Streifer [1, 2] is
summarized with some small changes. Their formalism requires fewer approxima-
tions than for example the formalism derived by Yariv [3, 4]. Most importantly, in
Yariv’s approximation the modes as pure transverse electric (TE) or transverse
magnetic (TM) which is not accurate for single-mode waveguides with a high index
contrast. A more detailed comparison between the formalisms can be found at the
end of this appendix A. Although the coupled mode formalism is generally
applicable, we apply it only to the directional couplers.
We consider a directional coupler consisting of two parallel rectangular wave-
guides with refractive index n1, embedded in a homogeneous cladding with index n2
and separated by a gap g (see figure 3.1(a). For typical SOI waveguides, this gap
is about 200 nm. The coupler is described by the permittivity profile
ϵc(x , y ) = ϵ0nc2(x , y ). We describe the electromagnetic fields in the coupler in terms
of the modes of the two waveguides, labelled a and b. Isolated waveguide a has
permittivity profile ϵa(x , y ), and waveguide b is described by permittivity profile
ϵb(x , y ). We define Δϵa(x , y ) and Δϵb(x , y ) as the difference between the permittivity
profile of the coupler and permittivity profile of the isolated waveguide, i.e.,
ϵc(x , y ) = ϵa(x , y ) + Δϵa(x , y ) = ϵb(x , y ) + Δϵb(x , y ), (A.1)
see figure A.1. In the analysis, we assume that the mode expansion conjecture as
explained in section 2.3.6 is valid. After explaining this conjecture, we rewrite
Maxwell’s equations in a form that is very useful for the description of the
directional coupler. We then expand the field in terms of modes of the single
waveguides a and b and considering only those that are important in the directional
coupler, neglecting radiation and backwards-traveling modes. This results in
intuitive equations for the directional coupler.
Figure A.1. Permittivity profiles, cross-section at y = 0, plotted as a function of x. Permittivity profiles of the
directional coupler ϵc(x, y ), single waveguide a ϵa(x, y ), single waveguide b ϵb(x, y ) and difference profiles
Δϵa(x, y ) and Δϵb(x, y ). In typical SOI waveguides, ϵ1 and ϵ2 are the permittivities of silicon and silicon-
dioxide, respectively.
∞
Htc (x , y , z , t ) = ∑aν(z )Hta,ν(x, y )e ıωt. (A.3)
ν= 1
where E tc and Htc are the transverse components in the coupler and with the
summation over an infinite set of waveguide modal profiles Eta,ν(x , y ) and
Hta,ν(x , y ). Subscript t denotes the transverse field components x and y. Actually,
this superposition consists of a finite sum of the guided modes and an integral over
the radiation and evanescent modes, but for simplicity we will keep writing the single
infinite sum (see section 2.3.6). The modes of waveguide a are solutions of Maxwell’s
A-2
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equations for permittivity ϵa(x , y ), but they are not a solution of Maxwell’s
equations for the directional coupler which has permittivity ϵc(x , y ). For example,
the individual modes of waveguide a are smooth outside the core of waveguide a,
whereas certain transverse components of the electromagnetic fields in the coupler
are discontinuous at the interfaces of waveguide b.
The modes of waveguide a are orthogornal in the sense of equation (2.53):
+∞
∬−∞ ( Eta,μ × Hta,ν* + Eta,ν* × Hta,μ) · zˆ dxdy = 0 if μ ≠ ν. (A.4)
The modes of waveguide b are orthogornal in the same sense. We will assume
henceforth that the guided modes of waveguides a and b are normalized as follows
+∞
∬−∞ ( Eta,ν × Hta,ν* + Eta,ν* × Hta,ν) · zˆ dxdy = 1, (A.5)
and a similar relation for the modes of waveguide b. This normalization is consistant
with [1, 2], but differs by a factor of four from normalization to unit power flow.
The mode expansion, equations (A.2) and (A.3), concerns only the transverse field
components (x , y). The z-components are not governed by these equations and
follow from Maxwell’s equations for the appropriate permittivity profile. The modal
fields E a,ν(x , y ) and H a,ν(x , y ) are solutions of Maxwell’s equations for waveguide a
with permittivity profile ϵa(x , y ). The corresponding z-component of the electric field
follows from the transverse components of the magnetic field. Using Ampère’s law
(2.2) with permittivity profile ϵa(x , y ), we find
1 ⎛ ∂Hxa,ν ∂H ya,ν ⎞
E za,ν(x , y ) = ⎜ − ⎟. (A.6)
ıωϵa(x , y ) ⎝ ∂y ∂x ⎠
Similarly the z-component of the electric field in the coupler for given transverse
magnetic field Htc follows from Ampère’s law (2.2) with permittivity ϵc(x , y ),
1 ⎛ ∂Hcx ∂Hcy ⎞
E cz(x , y , z , t ) = ⎜ − ⎟. (A.7)
ıωϵc(x , y ) ⎝ ∂y ∂x ⎠
or, using the z-component of the electric field of the modes of waveguide a as
expressed by equation (A.6),
∞
ϵ (x , y )
E cz(x , y , z , t ) = ∑aν(z ) ϵa(x, y ) E za,ν(x, y )e ıωt. (A.9)
ν= 1 c
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Silicon Photonics
Combining equation (A.2) and (A.9) gives a description of the electric field in the
coupler, E c , in terms of the modes of waveguide a,
∞ ⎛ ϵ (x , y ) ⎞
E c(x , y , z , t ) = ∑aν(z )⎜Eta,ν(x, y ) + zˆ ϵa(x, y ) E za,ν(x, y )⎟e ıωt. (A.10)
ν= 1
⎝ c ⎠
As preparation for the derivation in the sections hereafter we also express the
transverse field components of the fundamental mode of waveguide b, {Etb,1, Htb,1},
as a superposition of the transverse fields components of the modes of waveguide a,
{Eta,ν, Hta,ν}:
∞
Etb,1 = ∑pν1 Eta,ν, (A.11)
ν= 1
∞
Htb,1 = ∑pν1 Hta,ν. (A.12)
ν= 1
The values of pνμ are computed based on the orthogonality relation (A.4) for two
modes of the same waveguide. Two modes corresponding to different waveguides
are generally not orthogonal in this sense. Now pνμ is the projection of mode μ of
waveguide b onto mode ν of waveguide a based on the orthogonality relation
(A.4), i.e.,
+∞
pμν = ∬−∞ ( Eta,μ × Htb,ν* + Etb,ν* × Hta,μ) · zˆ dxdy. (A.13)
In this Appendix one of the two modes μ or ν will always be the fundamental guided
mode of waveguide a or b, i.e., we will in fact only use p1ν and pμ1.
The last step of this section is to express the z-component of the fundamental
mode of waveguide b in terms of the modes of waveguide a. The z-component of the
electric field of the modes of waveguide b are found using an expression similar to
equation (A.6) but with a replaced by b. Analogous to the derivation of equation
(A.9), we substitute equation (A.12) in equation (A.6) but for waveguide b, move the
right-hand-side under a single summation, and then insert equation (A.6) for
waveguide a to arrive at
∞
ϵ (x , y )
E zb,1 = ∑pν1 ϵa(x, y ) E za,ν. (A.14)
ν= 1 b
Combining equation (A.11) and equation (A.14) while dividing the z-component by
ϵc(x , y ) gives
ϵb(x , y ) b,1
∞ ⎛ ϵ (x , y ) ⎞
Etb,1 + zˆ Ez = ∑pν1 ⎜Eta,ν + zˆ ϵa(x, y ) E za,ν⎟. (A.15)
ϵc(x , y ) ν= 1
⎝ c ⎠
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Silicon Photonics
Adding gives:
⎛∂ ∂ ∂ ⎞
⎜ xˆ + yˆ + zˆ⎟ · (E c × Ha,μ*+E a,μ*× Hc ) = −ıωΔϵa(x , y )E c · E a,μ*.
⎝ ∂x ∂y ∂z ⎠
Following the derivation of section 2.3.3, we integrate this equation over an
(x , y)-plane, and apply the two-dimensional divergence theorem to obtain
∂
∂z
zˆ · ∬ (E tc × Hta,μ* + E ta,μ* × Htc) dxdy = −ıω ∬ Δϵa(x, y)E c · E a,μ* dxdy, (A.19)
where we used that the integral along a closed contour vanishes for increasing
distance to the origin x = y = 0. The mode expansion conjecture states that the
transverse electromagnetic fields E tc and Htc may be written as a superposition of the
fields of the modes of waveguide a. With this expansion equation (A.19) can be
expressed in the modes of waveguide a. By substituting equations (A.10) and (A.3),
together with equation (A.16) and the corresponding equation for H a,μ in equation
(A.19), one finds that time dependent terms cancel. The summation over ν and z-
dependent factors can be brought outside of the integrals:
∞ ⎛ ∂a ν (z ) ⎞
∑ν=1 ∬ zˆ · ( Eta ,ν × Hta ,μ* + Eta ,μ* × Hta ,ν ) dx dy · ⎜ + ıβa ,μa ν (z )⎟ e ıβa,μz
⎝ ∂z ⎠
(A.20)
∞ ⎛ a ,ν ϵa (x, y ) a ,ν ⎞
= − ıω ∑ a ν (z )e ıβa,μz
ν=1 ∬ Δϵa (x, y ) ⎜Et + zˆ
⎝ ϵc (x, y )
E z ⎟ · E a ,μ* dx dy.
⎠
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Silicon Photonics
The integral in the left-hand-side of this equation is the orthorormality relation (A.4)
between modes ν and μ of waveguide a, with result δμν since the guided modes are
assumed normalized by equation (A.5). Thus the summation on the left-hand-side of
this equation reduces to only one term with ν = μ. After cancelling the factor
exp[ıβa,μ ] and solving for ∂aμ /∂z we obtain for guided mode μ
∞
∂aμ a
= −ıβa,μaμ − ı∑aνκ˜ νμ , (A.21)
∂z ν= 1
where
⎛ ⎞
a
κ˜ νμ ≡ω ∬ Δϵa(x, y )⎜⎝Eta,ν + zˆ ϵϵac((xx,, yy)) Eza,ν⎟⎠ · E a,μ* dxdy. (A.22)
The expressions above describe the electromagnetic field in the coupler in terms of
the modal fields of waveguide a, with z-dependent modal amplitudes. Equation
(A.21) describes how the amplitudes of guided modes change with z. At this point,
this may seem a complicated way to write Maxwell’s equations, but it will turn out
to be very useful when only a limited number of modes are taken into account, such
as in the case of the directional coupler.
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Silicon Photonics
where κ̃ νa1 are given by equation (A.22). The first term of the summation in equation
(A.26), i.e., p11 κ̃11a , is also present in the second term of the right of equation (A.25).
By adding and subtracting the other terms (ν = 2,...,∞) of this summation to the
second and third term of the right of equation (A.25), respectively, one finds the
important differential equation:
∞
∂ua ∂u
+ p11 b = −ı(βa1 + κ˜11a )ua − ı(p11 βa1 + κˆ ab)ub − ı ∑ κ˜ νa1(aν − pν1 ub). (A.27)
∂z ∂z ν= 2
or, using equation (A.15), we obtain the expression of κ̃ab aimed for
⎛ ⎞
κˆ ab = ω ∬ Δϵa(x, y )⎜⎝Exb,1Exa,1* + E yb,1E ya,1* + ϵϵcb((xx,, yy)) Ezb,1Eza,1*⎟⎠dxdy. (A.29)
We thus have derived the differential equation (A.27) for the z-dependence of the
amplitudes ua and ub of the modal fields of the fundamental modes of waveguides a
and b. We started by expressing equation (A.23) in terms of the modes of waveguide
a and then only considered the fundamental mode to arrive at equation (A.24).
Instead one can also express equation (A.23) in terms of the modes of waveguide b
and then consider the fundamental mode of that waveguide. This gives equation
(A.27) with equation (A.29) but with labels a and b interchanged and with and pμν
replaced by pμν
* . We write the thus obtained system of differential equations as
∂u
C = −ı(BC + Kˆ )u(z ) − ıW (z ), (A.30)
∂z
with
u
u = ua ,
b ( ) (A.31)
⎛ 1 p11⎞
C = ⎜⎜ ⎟,
⎟ (A.32)
⎝ p11* 1 ⎠
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Silicon Photonics
⎛ βa,1 0 ⎞
B = ⎜⎜ ⎟⎟ , (A.33)
⎝ 0 βb,1⎠
⎛ κˆ κˆ ⎞
Kˆ = ⎜ aa ab ⎟ , (A.34)
⎝ κˆba κˆbb ⎠
⎛ ∞ κ a (a − p u ) ⎞
⎜ ∑ν=2 ˜ ν1 ν ν1 b ⎟
W (z ) = ⎜ ∞ , (A.35)
⎜∑ κ˜ ν1(bν − p * ua )⎟⎟
b
⎝ ν=2 ν1 ⎠
with κˆaa ≡ κ˜11a , κˆbb ≡ κ˜11b , κ̂ab given by equation (A.29), and κ̃ νa1 given by equation
(A.22). Equation (A.30) can be rewritten as
∂u
= −ı(B + K )u(z ) − ıC −1W (z ), (A.36)
∂z
with
κ κ
(
K = κ aa κ ab ,
ba bb )
1
κ aa =
1 − p11 p11*
(
κˆ aa − p11 κˆba + p11 p11* (βa,1 − βb,1) , )
1
κbb =
1 − p11 p11*
( )
κˆbb − p11* κˆ ab + p11 p11* (βb,1 − βa,1) , (A.37)
1
κ ab = (κˆ ab + p11 (βa,1 − βb,1 − κˆbb)),
1 − p11 p11*
1
κba =
1 − p11 p11*
( )
κˆba + p11* (βb,1 − βa,1 − κˆ aa ) .
Note that these equations are exact (provided the mode expansion conjecture is
correct).
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Silicon Photonics
reduces to the identity matrix and Kˆ = K . The results obtained with this additional
approximation did not differ appreciably from keeping these terms in the model. We
nevertheless kept the terms with p11 or p11* in the equations.
By neglecting W , i.e., neglecting the coupling to higher-order modes (radiation,
evanescent and backwards-traveling modes), equation (A.36) becomes
∂u
= −ı(B + K )u(z ). (A.38)
∂z
We consider a coupler for which in z = 0 all energy is in waveguide b, i.e. u = (0, 1).
Solving equation (A.37) for this initial condition gives1
ıκ
ua(z ) = − ab sin(sz ) e−ı(βb,1+κbb−δ )z , (A.39)
s
⎛ ıδ ⎞
ub(z ) = ⎜cos sz − sin sz⎟ e−ı(βb,1+κbb−δ )z , (A.40)
⎝ s ⎠
1
δ= (β + κbb − βa,1 − κ aa ), (A.41)
2 b,1
s= κ abκba + δ 2 , (A.42)
⎛m κ ⎞
1
We write equation (A.38) as ∂u /∂z = −ıMu(z ), with M = ⎜ κ a mab ⎟, ma = βa,1 + κaa , and mb = βb,1 + κbb . We
⎝ ba b ⎠
look for solutions in the form u(z ) = a ±exp[−ıλ±z ]. Substituting this in the differential equation gives
λ±a ± = Ma ± , which we recognize as the eigenvalue equation for M with eigenvalues λ± . This equation has
solutions when det∣M − Iλ±∣ = 0 , from which we find the eigenvalues λ± = 12 (ma + mb ) ±
1 1 1
2
(ma + mb )2 − 4(mamb − κabκba ) = 2 (ma + mb ) ± 14 (mb − ma )2 + κabκba = 2 (ma + mb ) ± s , with s and δ
defined in equations (A.42) and (A.41). From the eigenvalue equation of M , we find eigenvectors
a + = (κab, δ + s ) and a− = (κab, δ − s ). If we solve the general solution of the differential equation,
u(z ) = c +a +exp[−ıλ+z ] + c−a−exp[−ıλ−z ], for initial condition u(0) = (0, 1), we find c− = −c + and
c + = 1/2s , giving equations (A.39) and (A.40).
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Silicon Photonics
with the radiative and evanescent modes in the residual field E r(x , y, z ). As in [1], we
have assumed a lossless material with real permittivity ϵc(x , y ). In the description of
the fields in terms of the modes of waveguide a, we followed Kogelnik [5] and started
our derivation with the orthogonality relation (2.53) including the complex
a
conjugates, which led to a slightly different notation for κ̃ νμ , equation (A.22), and
κ̂ab , equation (A.29), as compared to [1, 2]. In this appendix it was not nessecary to
explicitly normalize evanescent modes, for which it would be necessary to use the
unconjugated orthogonality relation. With real transversal fields, the longitudinal (z)
component of the field is imaginary, which causes a minus sign in the definition of κ̂ab
in [1,2]. The derivation given in this appendix applies to two parallel waveguides.
However, the derivation can be generalized to the more general case by changing
a,ν b,ν
ϵc(x , y ) to ϵc(x , y, z ), leading to z-dependence of E˜z , E˜z , κ̃ νμ
a b
, κ̃ νμ , κ̂ab , κ̂ba , κ̂aa , κ̂bb ,
K̂ , and K . In [2] it is stated that neglecting the radiation and the backwards
propagating waves may not be justified in the case of waveguides with high
refractive index contrast. Our comparison with rigorous FDTD simulations shows
that by far most energy is carried by the fundamental modes of the waveguides, so
that the residual fields can indeed be neglected for parallel waveguides. In contrast,
gratings in silicon introduce strong scattering, which will not only couple the
fundamental mode to another mode, but couple to a spectrum of modes.
In comparison with the work of Yariv [3] and [4], the most important difference
with our approach is that Yariv approximates the modes as pure TE or pure TM.
Typical SOI-waveguides have relevant longitudinal components of the electro-
magnetic fields, and neglecting them underestimates the coupling between wave-
guides. Furthermore, in [4] the fundamental modes of isolated waveguides a and b
are assumed to be orthogonal, which is strictly speaking incorrect but which is a
good approximation for typical SOI waveguides.
References
[1] Hardy A and Streifer W 1985 Coupled mode theory of parallel waveguides J. Lightwave
Technol. 3 1135–46
[2] Hardy A 1998 A unified approach to coupled-mode phenomena IEEE J. Quantum Electron.
34 1109–16
[3] Yariv A 1973 Coupled-mode theory for guided-wave optics IEEE J. Quantum Electron. 9
919–33
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Silicon Photonics
[4] Yariv A and Yeh P 2007 Photonics: Optical Electronics in Modern Communications (Oxford
Series in Electrical and Computer Engineering) (Oxford: Oxford University Press)
[5] Kogelnik H 1975 Theory of dielectric waveguides Integrated Optics (Topics in Applied
Physics vol 7) (Berlin: Springer) pp 13–81 doi 10.1007/978-3-662-43208-2
[6] MathWorks Inc. 2017 Matlab—the language of technical computing (Natick, MA:
MathWorks Inc.) www.mathworks.com/matlab
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Silicon Photonics
Electromagnetic theory
Wouter J Westerveld and H Paul Urbach
Appendix B
Lossless transmission matrix
In this appendix we show that power conservation allows us to write the lossless
transmission matrix U in the form
⎛ b1 ⎞ ⎛ e ıϕD τ * κ ⎞ a1
⎜ ⎟ = ⎜ ıϕ ⎟
⎝ b2 ⎠ ⎝− e D κ * τ ⎠ a2 ( )
, (B.1)
with ∣τ∣2 + ∣κ∣2 = 1 and ϕD a phase which affects the wave in input a1. First it is
shown that the transmission matrix is unitary, i.e., that its inverse equals the
transpose of its complex conjugate, U−1 = U *T , so that U *T U = I (with I the
identity matrix). The general transmission matrix equation for a system without
reflections is
⎛ b1 ⎞ ⎛ A κ ⎞ a1
⎜ ⎟ = ⎜⎝
⎝ b2 ⎠
⎟
B τ ⎠ a2
. ( ) (B.2)
We express b1 and b2 in terms of a1 and a2, and compute the power flow out of the
coupler:
b1b1* + b2b 2* = (AA* +BB*)a1a1* + (κκ *+ττ *)a2a 2*
(B.3)
+ (Aκ *+Bτ *)a1a 2* + (A*κ + B*τ )a1*a2.
This power flow out of the coupler, ∣b1∣2 + ∣b2∣2 , is equal to the power flow into the
coupler, ∣a1∣2 + ∣a2∣2 , for arbitrary a1 and a2. Hence
(AA* +BB*) = 1, (κκ *+ττ *) = 1, (Aκ *+Bτ *) = 0, (A*κ + B*τ ) = 0.
These relations are used to compute U *T U and it is found that U *T U = I . The
lossless transmission matrix U is thus unitary. Now U−1 = U *T implies
1 τ −κ ⎛ * *⎞
D (
− B A )
= ⎜ A B ⎟,
⎝ κ* τ* ⎠
(B.4)
Comparing equation (B.5) with equation (B.1), we see that for the symmetric
couplers D = τ /τ *=−κ /κ *, from which follows that D = 2 arg{τ} = −2 arg{κ}.
Hence
2(arg{τ} − arg{κ}) = π , (B.6)
and the phase difference between τ and κ is thus π /2.
As an example we consider a directional coupler with two identical waveguides,
equations (3.2) and (3.3) with δ = 0. Coupling coefficients κab and s are real. It may
be seen that the phase difference between τ and κ is indeed π /2. For the 2 × 2 MMI
coupler with 50/50 splitting ratio, equation (3.44), τ = 1 −2 ı and κ = 1 +2 ı which indeed
also differ in phase by π /2.
B-2
IOP Publishing
Silicon Photonics
Electromagnetic theory
Wouter J Westerveld and H Paul Urbach
Appendix C
Semiconductor physics of pn-junctions
This section discusses the semiconductor physics that is necessary to understand the
pn-junction for the application in silicon photonic modulators employing the
plasma-dispersion effect with carrier depletion.
The electronic band structures of metals, semiconductors, and insulators are
discussed in figure C.1. After briefly describing the pn-junction and its relevant
properties, we follow Hook and Hall [1] to arrive at the relation between the size of
the carrier depletion area and the reverse bias voltage applied on the junction.
A p–n junction is a boundary or interface between two types of semiconductor
material, p-type and n-type, inside a single crystal of semiconductor. The ‘p’
(positive) side contains acceptor ions that cause an excess of free holes, while the
‘n’ (negative) side contains donor ions that cause an excess of free electrons (see
figure C.1). We consider the 1D pn-junction depicted in figure C.2. At the interface
between the p-type and n-type semiconductors, electrons from the n region near the
interface diffuse into the p region leaving behind positively charged ions in the n
region. The diffused electrons recombine with holes in the p region, forming
negatively charged ions in the p region. Likewise, holes from the p-type region
near the interface diffuse into the n-type region, leaving behind negatively charged
ions in the p region. These holes recombine with electrons in the n-region, creating
positive ions. The regions close to the p–n interface lose most of their free carriers
(electrons and holes) due to diffusion and recombination and are together called the
carrier depletion region. The remaining charged ions in this region (charge density
Q, negative on the p-side and positive on the n-side) cause an electric field E that
opposes the diffusion process for both electrons and holes. Without an external
applied voltage over the junction, an equilibrium condition is reached in with a built-
in potential difference ΔV = V0 that exists across the junction. The semiconductor
physics to calculate the band structure and the potential difference V0 is for the
example described in Hook and Hall [1]. We omit this and continue with the
electrostatic analysis of the pn-junction. The edges of the carrier depletion area are
Figure C.1. Filling of the electronic states in metals, semiconductors, and insulators. The vertical axis is energy
and the horizontal axis (width of the shown areas) is the density of available states for a certain energy. The
shading follows the Fermi–Dirac distribution (black = all states filled, white = no state filled). At finite
temperatures, the lower energy levels are occupied and the higher energy levels are empty, with a gradual
transition in the intermediate levels. These delocalized states (extending through the material) occur grouped
and form the electronic band structure of the material with band-gaps in between. As follows from the Pauli
exclusion principle, each state may contain maximally one electron. Electrical conductivity, movement of
electrons, only occurs in bands that are partially filled (sketched). The Fermi level, EF, is the hypothetical
energy level of an electron, such that at thermodynamic equilibrium this energy level has 50% probability of
being occupied. Metals have high conductivity as the Fermi level lies inside a band. Insulators have low
conductivity as the Fermi level lies inside a large bandgap and only the lower band is filled. Semiconductors
have intermediate conductivity as the Fermi level lies inside a finite bandgap such that some of the lower
(valence) band levels are empty and some of the higher (conduction) band levels are filled. Electrons that are
‘missing’ in the conduction band are called holes which behave (mathematically) very similarly to particles with
positive charge. Semiconductors may be doped with materials that donate an excess of free holes (p-type) to the
valence band or free electrons (n-type) to the conduction band. Reproduced from Nanite at Wikimedia
Commons under the Creative Commons CC0 1.0 universal Public Domain Dedication.
quite sharp and the charge density may be approximated by the step function (see
figure C.2)
⎧ − NAe −wp < x < 0
⎪
Q(x ) = ⎨+ NDe 0 < x < wn (C.1)
⎪
⎩ 0 elsewhere
with NA the concentration of acceptor ions (the concentration of free holes in the
p-type semiconductor), wp the width of the carrier depletion area in the p-type
material, ND the concentration of donor ions (the concentration of free electrons
in the p-type semiconductor), wn the width of the depletion area in the n-type
material, and e the charge of an electron. Overall charge neutrality requires
eNAwp = eNDwn. (C.2)
The electrostatic potential V is related to the charge density Q by Poisson’s equation
d2V Q (x )
=− (C.3)
dx 2 ϵ
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Silicon Photonics
Figure C.2. A 1D pn-junction in equilibrium. The upper plot is a sketch of the pn-junction with the carrier
depletion area and the carrier concentrations (on a logarithmic scale). Below are plots of the charge density
Q(x ), the electric field Ex(x ) and the potential V (x ). Adapted from Adundovi at Wikimedia Commons under
the Creative Commons Attribution 3.0 Unported license.
with ϵ the permittivity of the material. Integrating equation (C.3) for the charge density
in equation (C.1) gives the electric field (in the x-direction) E , also see figure C.2,
⎧ eNA
dV ⎪
⎪− (x + wp) −wp < x < 0
ϵ
E(x ) = − =⎨ (C.4)
dx ⎪+ eND
⎪
⎩
(x − wn) 0 < x < wn,
ϵ
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Silicon Photonics
where the integration constants were chosen such that the electric field vanishes in the
bulk semiconductor material outside the carrier depletion area. Integrating the electric
field E gives the electrostatic potential V (see figure C.2)
⎧ eNA
⎪
⎪ (wp + x )2 −wp < x < 0
2 ϵ
V (x ) = ⎨ (C.5)
⎪V − eND (w − x )2 0 < x < w ,
⎪
⎩ 0 2ϵ
n n
where integration constants have been chosen so that the potential of the p-region
outside the depletion layer is zero (this defines the zero potential). The built-in
potential difference across the junction is given by V0 which is dictated by the
thermodynamic equilibrium of the pn-junction. The potential V (x ) must be
continuous at the interface x = 0 demanding
e
V0 =
2ϵ
(NAwp2 + Ndwn2 ), (C.6)
which may be solved together with equation (C.2) for wp and wn providing the
widths of the depletion area on the two sides of the junction
⎛ 2ϵNDV0 ⎞1 2
wp = ⎜ ⎟ (C.7)
⎝ eNA(NA + ND) ⎠
⎛ 2ϵNAV0 ⎞1 2
wn = ⎜ ⎟ . (C.8)
⎝ eND(NA + ND) ⎠
Forward bias reduces the total potential difference whereas reverse bias increases it.
This junction acts as a diode. Forward bias reduces the potential barrier thereby
increasing the conductivity and the current flow across the junction. Reverse bias
increases the barrier so that the conductivity and the current flow remain low. A very
large reverse bias, however, causes Zehner breakdown after which the conductivity
is suddenly high and current may flow across the diode [1]. For our application to
the silicon photonic modulator the conclusion is important that the applied voltage
changes the electrostatic potential which affects the width of the depletion layer.
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Silicon Photonics
Following the analysis of equations (C.3)–(C.8), we obtain for the new potential
difference in equation (C.9):
⎛ 2ϵND(V0 − Vd ) ⎞1 2
wp = ⎜ ⎟ (C.10)
⎝ eNA(NA + ND) ⎠
⎛ 2ϵNA(V0 − Vd ) ⎞1 2
wn = ⎜ ⎟ . (C.11)
⎝ eND(NA + ND) ⎠
It follows that the width of the depletion layer is increased by reverse bias.
Reference
[1] Hook J R and Hall H E 1995 Solid State Physics (Chichester: Wiley)
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