Tietoja
Making things happen
Show me the needs for a product and I’ll make it come true. I…
Kokemus
Koulutus
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The George Washington University, Washington DC, USA
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Management of technological and scientific organizations
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Ph.D. in Electrical Engineering (June 2002)
Major: Microelectronics and VLSI Systems, MEMS. Minor: Communications
The George Washington University, Washington, DC, USA. -
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Kunnianosoitukset ja palkinnot
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World Ag Expo 2023 - Top 10 New Product Winner
World Ag Expo
The HAYTECH system received the Top 10 New Product Award for its innovative approach in preventing hay fires and giving hay quality in real-time from field to feed.
The World Ag Expo is the largest annual agricultural show of its kind. Held in Tulare, California, World Ag Expo® provides a platform of networking, education, and business in one of the most productive ag counties in the United States. World Ag Expo® hosts over 1,200 exhibitors displaying cutting-edge technology and…The HAYTECH system received the Top 10 New Product Award for its innovative approach in preventing hay fires and giving hay quality in real-time from field to feed.
The World Ag Expo is the largest annual agricultural show of its kind. Held in Tulare, California, World Ag Expo® provides a platform of networking, education, and business in one of the most productive ag counties in the United States. World Ag Expo® hosts over 1,200 exhibitors displaying cutting-edge technology and equipment on 2.6 million square feet of exhibit space. An estimated average of 100,000 individuals from over 70 countries attend World Ag Expo® each year. -
Innov'Space 2016 ***
SPACE
The HAYTECH system from Quanturi received the Innov'Space *** from the International Agricultural Fair, France
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2013 FIMECC award
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Winner of the FIMECC prize (Finnish Metals and Engineering Competence Cluster, Finland) for significant energy and environmental impact of the Zero Power Wireless technology.
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Highlight in the NIST-wide magazine "Connections"
NIST
“Non-contact micro-capacitive technique for measuring the widths (or critical dimensions) of chromium-features patterned on the photomasks used in semiconductor manufacturing,” project chosen by NIST Public Affairs Department to be published as an highlight in the NIST-wide magazine “Connections”.
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Paper publication
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“Non-Contact Electrical Critical Dimensions Metrology Sensor for Chrome Photomasks,” Nadine Pesonen (Guillaume), Markku Lahti, Michael Cresswell, Richard Allen, Loren Linholm, and Mona Zaghloul, 21st Annual Symposium on Photomask Technology, Proceedings of SPIE Vol. 4562 (2002), pp. 822-829. The WERB reader recommended that this article be considered for an award, citing its technical content including an innovative approach and its quality of exposition including unusual logical continuity.