Formation of Silicon Wafers
Formation of Silicon Wafers
Formation of Silicon Wafers
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3. 4.
Silicon Ingot growth Crystal Shaping process Wafer slicing Wafer inspection and Packing
A thin disk of pure silicon ( 99.99% purity) semiconductor used as a substrate material for Integrated Circuits ( ICs).
Silica SiO2
Reduction of silica with carbon and reacting the obtained MG-Si with gaseous HCL to get MGEG-Si the pure EG-Si.
Step 1
Silicon Crystal Growth
Step 2
Crystal Shaping Process
Step 3
Wafer Slicing
Step 4
Wafers preparatio n steps
Polysilicon 2500oC
Seed crystal
Czochralski Process
Cropping
Testing
Grinding
Flats grinding
Cropping
Tang
Testing
Grinding
Flats grinding
Crown
Cropping
Cropping
Testing
Grinding
Testing Slice
Flats grinding
Testing
Cropping
Testing
Grinding
Flats grinding
Centerless grinding
Center grinding
Grinding
This process aims to obtain the specified diameter of the wafer
Cropping
Testing
Grinding
Flats grinding
Flat
Flats grinding
Flats are a straightened parts of the wafers that have below 200mm diameters.
Edge Contouring
Wafer lapping
Wafer etching
Wafer polishing
Wafer cleaning
Edge Contouring
Wafer lapping
Wafer etching
Wafer polishing
Wafer cleaning
Edge Contouring
Wafer lapping
Wafer etching
Wafer polishing
Wafer cleaning
Edge Contouring
Wafer lapping
Wafer etching
Wafer polishing
Wafer cleaning
Slurry consists of SiO2 and NaOH The purpose of polishing is to produce a smooth, specular surface on which device features can be defined by photolithography.
Edge Contouring
Wafer lapping
Wafer etching
Wafer polishing
Wafer cleaning
Wafer cleaning is meant to clean wafers from any contamination source: 1. Airborne bacteria 2. Grease and wax from physical handling. 3. Metals and abrasive elements such as : silica , diamond dust and alumina from lapping ,sewing and polishing processes.
o Some wafers properties such as: flatness, thickness, resistivity and type are inspected to meet customers specifications. o Wafers are then packed in cassettes and shipped to the customer such as AMD or Intel
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