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NANOSTRUCTURED
ENERGY DEVICES
Foundations of Carrier Transport
NANOSTRUCTURED
ENERGY DEVICES
Foundations of Carrier Transport
Juan Bisquert
Universitat Jaume I, Castelló, Spain
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v
vi Contents
vii
About the Author
Juan Bisquert (MSc in physics 1985, PhD
1992, Universitat de València) is a profes-
sor of applied physics at Universitat Jaume
I de Castelló and the funding director of the
Institute of Advanced Materials at UJI. His
research work is in perovskite solar cells, nano-
structured solar cells (including dye-sensitized
solar cells, organic solar cells, quantum-dot
sensitized solar cells), and water splitting with
visible light and semiconductors (solar fuel
converters). His most well-known work is
about the mechanisms governing the opera-
tion of nanostructured and solution-processed
thin film solar cells. He has developed insights
in the electronic processes in hybrid organic–
inorganic solar cells, combining novel theories of semiconductor nanostructures,
photoelectrochemistry, and systematic experimental demonstration. His contribu-
tions produced a broad range of concepts and characterization methods to analyze
the operation of photovoltaic and optoelectronic devices. He is a Senior Editor of the
Journal of Physical Chemistry Letters. He has been distinguished several times in
the list of ISI Highly Cited Researchers. Bisquert created the nanoGe conferences
and is the president of the Fundació Scito del País Valencià.
ix
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1 Carrier Injection
and Drift Transport
We begin the analysis of transport of carriers in a material layer, focusing on the
drift of carriers in a local electrical field. We start with the formulation of the main
relationships that provide the current density as a function of conductivity and elec-
trical field. Another significant factor that determines the total electrical current is
the injection of carriers at the contact, which leads us to discuss effects related to
injection in organic conductors. We then analyze in detail the metal-insulator-metal
model, in which the transport is driven by a constant field governed by the applied
voltage. It is a simple device model, but nonetheless illustrative of many device fea-
tures including contact formation properties.
∂E
jdisp = ε . (1.2)
∂t
Normally, the displacement current is a transient effect associated with the charg-
ing of dielectric capacitances in the system.
The conduction current density (hereafter denoted j) is related to the transport
of carriers by the application of some driving force. The current density at a cross
section of the layer is a combination of the current carried by the different charge
carriers in the system:
j= ∑j . i (1.3)
i
The electrical current is a continuous magnitude that has the same value at all points
of the x-axis. In the absence of recombination, the current is conserved:
∂j
=0. (1.4)
∂x
1
2 Nanostructured Energy Devices: Foundations of Carrier Transport
I = Aj = A ∑j , i (1.5)
i
vi = Bi Fi . (1.6)
For electronic carriers, the holes drift in the direction of the electrical field and the
electrons against the field. The direction of the flux of each electronic carrier is indi-
cated in Figure 1.1. Equation 1.6 leads to
vi = Bi qzi E . (1.8)
The carrier mobility ui (cm2 V−1 s−1) is defined as the velocity in a unit electrical field
zi
vi = ui E . (1.9)
zi
ui = zi qBi . (1.10)
zi d vi (E) . (1.11)
ui =
zi dE
E =0
In the case of hopping transport, mobility can be defined on the basis of the dif-
ference of effective charge carrier jump probability in the direction along and against
the electric field (Fishchuk et al., 2003).
Carrier Injection and Drift Transport 3
Electrical field E
Electron flux Jn
Electron current jn
Ec
ΦB,n
Ev
Hole flux Jp
Hole current jp
FIGURE 1.1 Energy diagram of an electron-conducting layer material with applied bias
potential. q is the elementary charge, V is the voltage applied at the left terminal, Ec is the
energy of the conduction band, Ev is the energy of the valence band, and EFn is the Fermi
level. All labeled quantities are represented with respect to the electron energy scale shown
on the left side. The arrows at the top and bottom show the vector direction of the indi-
cated magnitudes.
Here u 0 is a constant, the mobility of electrons or holes at zero field, and γ is the
parameter describing the field dependence (Pai, 1970; Davids et al., 1997).
The carrier flux density J is defined as the number of carriers crossing a unit area
per second
Ji = ci vi . (1.13)
4 Nanostructured Energy Devices: Foundations of Carrier Transport
The flux can originate from drift, diffusion, or other mechanisms such as convec-
tion. The motion of the carrier due to the direct action of the electrical field is normally
denoted as drift transport. The flux density associated with drift transport is given by
zi
Ji = ciui E . (1.14)
zi
ji = zi qJi = q zi ci ui E . (1.15)
ji = σ i E . (1.16)
From Equation 1.11, we find that the conductivity of carrier i has the expression
σ i = zi qci ui . (1.17)
σ= ∑σ = ∑ z i i qci ui . (1.18)
i i
1.2 INJECTION AT CONTACTS
We consider a simple device formed by a single material and two contacts as shown
in Figure 1.1. We examine the factors that determine whether there will be a substan-
tial current flow in such a device when a voltage is applied between the contacts and
the magnitude of such current. To obtain steady current flow, two effects must occur
efficiently: (1) carrier injection and extraction at the contacts and (2) conductivity
at all points of the internal material. In this section, we discuss the first of the two
aspects with a particular emphasis on the contact with organic materials.
Carrier injection, discussed in Chapters ECK.4 and ECK.6, concerns the inter-
faces of the device and particularly the contact between the metal and the active
material. Figure 1.2 shows the injection of either electrons or holes at electrochemical
contacts, previously described in Figure ECK.6.27. In general, the current flow may
be due to carriers that flow across the device, are injected at one contact and extracted
at the opposite one, or the current may be established by injection of electrons and
holes at opposite contacts that recombine inside the active layer. This last case forms
the basis of the recombination diode that will be discussed in Chapter PSC.4. In this
Carrier Injection and Drift Transport 5
E E
e– d
+ >> 105 Vcm–1
dx
EA
Red Valence
Conduction band
Gap band
Ox+
EA d
h+ – >> 105 Vcm–1
dx
W(E) x W(E) x
electrolyte Insulator electrolyte Insulator
electron injection hole injection
FIGURE 1.2 Energy scheme for electron or hole injection into insulators from redox spe-
cies and for the transport of the injected charge carriers through the insulator by strong elec-
tric fields. Reproduced with permission from (Gerischer, 1990).
V0
jOHM
jINJ
Log V
FIGURE 1.3 Bulk-limited (solid line) and injection-limited (dashed line) current density
versus voltage characteristics for a trap-free semiconductor. The threshold voltage V0 when
the bulk-limited current turns from ohmic to space-charge-limited current is indicated.
Reproduced with permission from (Shen et al., 2004).
6 Nanostructured Energy Devices: Foundations of Carrier Transport
100 Carbon
Au (111)/mica
filled
Au/Ti (fillers vary)
Pt/glass
Au (111)
Al2O3 polish Pt(111)
(105 Vcm–1)
10–1 Au/Cr
-
Glassy Evaporated Au (poly)
η carbon overcoat
Cr
Aged in ambient
10–3
1 0.8 0.6 0.4 0.2 0
Energy Step/eV
FIGURE 1.4 Hole injection efficiency versus energy barrier at the contact for substrate
contacts of varying work function. Reproduced with permission from (Abkowitz et al., 1998).
The main rule for a facile injection of carriers is to have a small injection barrier
at the contact, as already mentioned in Section ECK.4.6. A contact is ohmic if the
resistance across the interface is independent of the voltage. However, the low resis-
tance value is to be taken relative to the impediments to current flow in other parts
of the device, i.e., the impedances due to bulk-limited current. Normally, the actual
current-potential characteristics of the ohmic contact are not measured or analyzed.
If the resistance is negligible, it is generally referred to as ohmic. An ohmic contact
also has the property that it discharges to the metal, the current of the specific carrier
that it receives from the semiconductor side, i.e., it transmits the current from the
internal surface of the device to the metal contact, without impediment. The degree
of ohmicity of a hole-injection contact is often well correlated with the injection bar-
rier as shown in Figure 1.4. One useful definition of the ohmic contact is with respect
to the exchange current density, j0, which is the current flowing in equilibrium in
both senses, across the interface; see Section ECK.6.6. If the demand of current is
of the order ≈ j0, then little voltage is required to drive the current and the contact
is ohmic. It is usually suggested that if the barrier at a metal–organic interface is
greater than 0.3 eV at zero electric field, then the current is limited by injection. If
the barrier is less than 0.3 eV, then charges can be injected efficiently into the device
and the current will be controlled by transport (Lopez Varo et al., 2012).
In devices using organic semiconductors, such as organic light-emitting diodes
(OLEDs) and solar cells, a low barrier for electron injection/extraction should result
whenever the Fermi energy of the cathode closely matches the lowest unoccupied
Carrier Injection and Drift Transport 7
molecular orbital (LUMO) energy of the organic electron conductor. Metals with a
low work function also have a small electron affinity and will tend to release elec-
trons to the contacting material. These materials form low injection barriers to the
conduction band of a semiconductor and are therefore appropriate for injecting or
extracting electrons, especially in the case of organic semiconductors, which usually
show low electron affinities as well. In OLEDs, low work function metals such as
magnesium and calcium or their alloys with silver are the most commonly used cath-
ode materials. However, due to the strong tendency of Ba, Ca, and low work function
metals in general to release electrons, they are strongly reactive and prone to oxida-
tion. The devices require robust encapsulation to avoid contact with air, moisture, or
oxygen (Jørgensen et al., 2008), which cause oxidation and consequent degradation of
the metal contact by modification of both its energy levels and conductivity (Bröms
et al., 1997). Wide bandgap metal oxides, such as TiO2 and ZnO, serve as excellent
electron acceptors with good electron-conducting and hole-blocking properties.
Contact engineering allows one to tune the device for hole or electron trans-
port, as shown for quantum dot (QD) films in the scheme of Figure 1.5 (Oh et al.,
2014). Furthermore, the rate of bulk transport can be tuned, and hence switch the
device between bulk- or injection-limited conduction, by modifying the length of
CB
h+
Electron
transpo e–
+ VB rt
h e– limit
Au Hole tra Al
nsport
limit
Au Al
(a) (b)
Electron
injection
limit e–
h+
h+ e– Hole
injection
limit
Au Al
Au Al
(c) (d)
FIGURE 1.5 Band diagram depicting charge injection and transport in PbSe nanocrystal
thin films with long organic ligands for field-effect transistors (FETs) fabricated with (a) high
work function Au contacts and (b) low work function Al contacts and with short inorganic
ligands for FETs fabricated with (c) Au and (d) Al contacts. Reproduced with permission from
(Oh et al., 2014).
8 Nanostructured Energy Devices: Foundations of Carrier Transport
FIGURE 1.6 Metal work functions and electron energy diagram for metal contacts with Alq3
derived from the internal photoemission and built-in potential measurements. Reproduced
with permission from (Campbell and Smith, 1999).
the ligands between QDs, which determine the tunneling distance as explained in
Section PSC.3.4.
It is also frequently observed that the injection barrier does not correlate with the
metal work function. This situation was discussed in Chapters ECK.2 and ECK.4; an
interfacial dipole is formed by the deposition of a very thin organic layer on a metal
and changes the vacuum level (VL) at the interface. The insensitivity of the bar-
rier to the metal work function is called the pinning of the Fermi level; see Section
ECK.4.6. For example, for the Alq3 barrier, a widely investigated small molecule for
OLED applications, the Fermi level is pinned at about 3.6 eV for low work function
materials, whereas a normal Schottky barrier is formed for higher work function
metals as shown in Figure 1.6. Tuning the energy level of the cathode to the organic
material can be achieved by interfacial dipole layers that reduce the effective work
function of a metal such as Al (Hung et al., 1997; Ding and Gao, 2007). Inserting
a very thin layer of a wide bandgap material between the conducting cathode and
the active organic material is often an effective approach. Specifically, inorganic
insulators such as LiF, Li2O, MgF2, and MgO under aluminum metal have been
widely used to reduce the effective work function. As an example, Figure 1.7 shows
the effect of a LiF layer at the Alq3–Al interface. The ultraviolet photoelectron spec-
troscopy (UPS) measurement shows that the LiF interlayer produces a large (0.6-eV)
interfacial dipole that considerably reduces the barrier to electron injection from Al
to Alq3.
On the other hand, contact materials with a large work function provide an effi-
cient contact to holes. PEDOT:PSS, a conjugated polymer formed by a mixture of
two ionomers, poly(3,4-ethylenedioxythiophene) and poly(styrenesulfonate), is a
good hole conductor that is often deposited on a transparent conducting oxide (TCO)
such as indium-doped tin oxide (ITO) to form a hole injection contact. PEDOT and
similar materials also serve to control the wettability and compatibility of the organic
active layer with the contact layer. The work function of ITO is 4.8 eV, whereas that
of PEDOT:PSS is 5.1 eV. These two materials readily form an ohmic contact, and
PEDOT matches well with the ordinary values of the Fermi level of holes in organic
devices. It was found that the higher work function of PEDOT:PSS compared to ITO
facilitates hole injection into poly(2-methoxy-5-(2′-ethylhexyloxy)-1,4-phenylene
vinylene (MEH-PPV; with ionization energy at 5.1 eV) (Cao et al., 1997; Brown
et al., 1999). Transition metal oxides, such as molybdenum oxide (MoO3), tungsten
Carrier Injection and Drift Transport 9
Cutoff
Sample Bias = –10 V
Alq3/Al
1.0 eV
Intensity (arb. units)
Alq3/LiF/Al
1.6 eV
LiF/Al 1.6 eV
Al
1 2 3 4 5 6
Kinetic Energy (eV)
LUMO LUMO
0.5 eV 0.1 eV
EF EF
2.3 eV
2.7 eV
HOMO
HOMO
Al Alq3 Vacuum Al LiF Alq3 Vacuum
(a) (b)
FIGURE 1.7 Top: UPS spectra (low kinetic energy region) measured immediately after
each layer deposited in Alq3/LiF/Al and Alq3/Al multilayers. Bottom: Energy diagrams of the
Alq3–Al interface and the Alq3–LiF–Al interface. Reproduced with permission from (Mori
et al., 1998).
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10 Nanostructured Energy Devices: Foundations of Carrier Transport
LUMO or HOMO
E=0
Potential Energy
DOS
Tra E
Fermi nsp
ort
level ene
rgy
Metal
Organic Semiconductor
oxide (WO3), and vanadium oxide (V2O5), easily exchange charges with several
organic semiconductors and produce efficient hole injection layers in OLEDs and
organic solar cells as discussed further in Section PSC.4.5.
Injection models have been developed to consider the essential physical mecha-
nisms that take part in the charge injection from a metal into a disordered organic
semiconductor viewed as a random hopping system. One detailed model was pro-
posed by Arkhipov and collaborators that describes the injection as follows; see
Figure 1.8 (Arkhipov et al., 1998; Arkhipov et al., 1999; Arkhipov et al., 2003).
First, carriers jump from the Fermi level of the metal contact into localized states
of a Gaussian density of states (DOS) that forms a distribution of hopping sites that
are sufficiently close to the metal–organic interface. Every injected carrier creates
an image charge of the opposite sign at the contact. The superposition of the external
electric field at the contact and the Coulomb field of the image charge form the poten-
tial barrier at the metal–organic interface, which will restrict the charge injection.
In this way, the injection is described in terms of thermally and field-assisted charge
transfer from the metal to the organic semiconductor. Part of this injected charge is
followed by a return to the metallic contact. At this point, the model evaluates the
probability of crossing the potential barrier for a carrier that has made an initial jump
at a distance x close to the metal–organic interface. This probability is formulated
by the one-dimensional Onsager theory to avoid geminate recombination for a pair
of a carrier in the organic and its image twin at the metal. Further discussion of this
approach is given in Figure ECK.6.22 and Figure ECK.6.23.
E dr = −∆ϕ dr /d , (1.19)
It is important to remark that even in the presence of an electric field, the carriers
are in equilibrium and no conduction takes place. The built-in potential between the
metals Vbia,c coincides with the contact potential difference of the metals
Φ a − Φc
Vbia ,c = ∆ dr ϕ eq = ϕ eq (d ) − ϕ eq (0) = . (1.21)
q
The application of the VLA rule in Figure 1.9b has the consequence that the injec-
tion barrier for electrons is fixed at the value given by Equation ECK.4.18, ΦB,n =
Φc – χn, and the value for holes by Equation ECK.4.19, ΦB,p = χp – Φa. Thus, the
12 Nanostructured Energy Devices: Foundations of Carrier Transport
Reference Eo
level
Evac –q (x)
Evac
Ec Φc –q∆dr
Ec
Electron energy
Φa Φa
Φc
EF0 ΦB,n
Ev
Ev
x=0
(a) (c)
Reference Eo
level x=d
–q
Evac
–q∆dr
Ec
∆d
Φa
Φc
EF0 ΦB,n
Ev
x=0
(b) x=d
FIGURE 1.9 Energy diagram of an insulator layer that is contacted by two metals of dis-
similar work function. (a) The energies of the separate materials. (b) The equilibrium condi-
tion with equilibrium Fermi level EF0 under vacuum level alignment. (c) The equilibrium
condition with formation of the dipole layer at the cathode, which reduces the drift field Δdrφ.
density of the respective carrier is fixed at the boundary at the equilibrium value as
follows (Haney, 2011):
p(0) = p0 (1.22)
n( L ) = n0 . (1.23)
This type of model contact has been used in the past in the discussion of photocon-
ductivity in insulators (Goodman and Rose, 1971). The model of Sokel and Hughes
(1982) sets all carrier densities to zero at the boundary.
The VLA property need not be generally satisfied. When the contact forms a
dipole, as mentioned in the previous section, the built-in voltage is not invested fully
Carrier Injection and Drift Transport 13
in the drift field. As a result, the barrier for electron injection increases and the drift
field decreases as shown in Figure 1.9c.
In Figure 1.10, we observe different situations caused by an applied voltage Vapp
in the MIM model with straight bands. The drift field changes according to the fol-
lowing expression
The drift field vanishes when the applied voltage equals the built-in potential, i.e.,
at Vapp = –Vbia,c, the flat-band condition. Under forward bias, injected carriers drift
in the electrical field and current increases with the voltage. Under reverse bias, the
field also increases but the large injection barrier prevents current flow. Thus, the
model shows diode characteristics. The diagrams of Figure 1.10 constitute only a
first approximation, since they neglect Schottky barriers and band bending produced
by space charge.
EF0 –qVapp
Ev
Ev
(a) (c)
Reverse voltage
Flatband voltage Evac
Evac Ec
Ec
–qVapp
–qVapp
Ev
Ev
(b) (d)
FIGURE 1.10 Energy diagram of an insulator layer that is contacted by two metals of dis-
similar work function, under different cases of applied voltage as indicated.
14 Nanostructured Energy Devices: Foundations of Carrier Transport
In practice, the built-in voltage Vbia,c can be estimated from the current-voltage
measurements or from the onset of photocurrent under illumination. The rationale
for this method is that the drift force on carriers is zero at the flat-band condition
and the drift current starts only when the voltage causes the bands to be sloped.
Therefore, it is common in the literature to represent the voltage scale as (V – V0),
where V0 is the compensation voltage at the point where the current changes sign
in the current-voltage curve, identified as the built-in voltage Vbia,c. Another method
to determine the built-in voltage is the electro-absorption measurement (Campbell
et al., 1996). This technique involves the measurement of the modulation of the
reflection coefficient for monochromatic light, resulting from the modulated ac
voltage imposed over the steady-state voltage. The detection of the field is possible
because the optical absorption coefficient α changes with the square of the electric
field due to a Stark shift in the allowed optical transition. The energy levels of PPV
and the built-in voltage obtained in devices with different metal contacts are shown
in Figure 1.11. The presence of some native carrier density explains the divergence
observed between the built-in voltage determined by electroabsorption and current-
voltage curves (de Vries et al., 2010).
Let us describe more realistically the distribution of carriers in the MIM model
including space-charge formation (Simmons, 1971). Figure 1.12 shows the forma-
tion of an ohmic contact with the insulator. The electron charge is injected into the
insulator to achieve equilibration of Fermi levels and produces a bending of the con-
duction band in the insulator by establishing an accumulation region. The amount
of space charge fixes the width of the accumulation region λ. The relationship of the
size of band bending to the size of the insulator layer gives rise to different situations.
In Figure 1.13b, the two contacts are separately equilibrated and a field-free region
of the flat conduction band is obtained in the central region. If the amount of space
charge decreases, the width λ increases until the accumulation regions overlap; see
Figure 1.13c. But if the amount of space charge is negligible, no significant band
bending occurs, and equilibration of the Fermi levels produces a tilted straight band,
corresponding to Figure 1.9b. Finally, we describe another situation, which is the
equilibration between a p-type semiconductor and two metal contacts. If the work
functions of the metals are lower than those of the semiconductor, the contacts form
depletion layers, consisting of Schottky barriers. It should therefore be noted that
the model of Figure 1.9b, in which the built-in potential translates into a constant
drift field, is restricted to situations in which the intrinsic density of carriers of the
semiconductor is very low.
[8] The Vagrancy and Mendicity Acts were called into aid.
Under these, “homeless beggars” were to be sent to their own
parish. It is probable that the numbers were too great to be dealt
with efficiently.
[9] James VI. of Scotland adopted Troy-weight in 1618; but
curiously the Troy-weight (Scots) coincided more nearly with
Avoirdupois.
[10] The name signifies Lower New Town, to distinguish it from
Novgorod the Great on the Volkhof, North-Western Russia.
[11] This terrace is locally known as Mouravieff’s Folly, in
consequence of a tower built by him, upon which he designed to
place a facsimile of the famous Strasburg clock, but on so
gigantic a scale that the hours and minutes, the moon’s phases,
and planets, cycles, &c., should be distinctly visible from every
locality of the town and fair!
INDEX.
Accounts, settling of, at fairs, 9.
Actors at Sturbridge fair, 128, 144.
Aix-la-Chapelle, early fair of, 7.
Alarm bells at fairs, 6.
Ale at fairs, price fixed, 81, 82.
tested, 82.
Alfred the Great, did he introduce fairs? 19.
Amphyctionic fairs, 3.
Anglo-Saxon fairs, 13.
Antwerp, influence of fairs, 10.
“Ara,” the signal of the money-changers, 9.
Armour from Milan sold at Sturbridge fair, 163.
Asia, early fairs in, 19.
Assize of bread, wine, and beer, 63.