Brandon Day

Brandon Day

St Louis, Missouri, United States
3K followers 500+ connections

About

Entrepreneurial, relationship, and customer and value creation-oriented executive with 15…

Articles by Brandon

  • Why I Chose Agtech and Why You Should Too

    Why I Chose Agtech and Why You Should Too

    When I moved from California to St. Louis for business school, I was looking for a new career, a new industry, a new…

    12 Comments

Experience

  • The Yield Lab Institute Graphic

    The Yield Lab Institute

    Greater St. Louis

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    Greater St. Louis Area

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    Greater St. Louis Area

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    Greater St. Louis Area

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    Greater St. Louis Area

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    Greater St. Louis Area

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    Monterey, CA

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    Dallas/Fort Worth Area

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    Dallas/Fort Worth Area

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    United States

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    Greater Los Angeles Area

Education

Licenses & Certifications

  • Engineer-in-Training (EIT) Graphic

    Engineer-in-Training (EIT)

    NCEES

    Credential ID 46261

Volunteer Experience

  • Arch Grants Graphic

    Judge

    Arch Grants

    - Present 5 years 9 months

    Science and Technology

    Judge and review applicants for annual Arch Grants competition

  • Covenant House Missouri Graphic

    Community Leadership Council Member

    Covenant House Missouri

    - 3 years

    Economic Empowerment

    Volunteer and support various activities at Covenant House in St. Louis

  • Children's Medical Center Graphic

    Volunteer

    Children's Medical Center

    - 8 months

    Children

  • Team Leader

    Rite of Christian Initiation of Adults

    - 2 years 3 months

    I am team leader for a faith-based group and allows adults to become Catholic and/or finish their rites of initiation (communion, confirmation, baptism and the holy sacraments).

Publications

  • Hydrofluoric-Acid-Resistant and Hydrophobic Pure-Silica-Zeolite MEL Low-Dielectric-Constant Films

    Langmuir

    A new technique for the silylation of pure-silica-zeolite MEL low-k films has been developed in which the spin-on films are calcined directly in trimethylchlorosilane or 1,1,1,3,3,3-hexamethyldisilazane (HMDS) in order to protect the films against corrosive wet etch chemicals and ambient moisture adsorption. In an alternative procedure, HMDS is also added to the zeolite suspension before film preparation. Fourier transform infrared spectroscopy, X-ray photoelectron spectroscopy, water-soak…

    A new technique for the silylation of pure-silica-zeolite MEL low-k films has been developed in which the spin-on films are calcined directly in trimethylchlorosilane or 1,1,1,3,3,3-hexamethyldisilazane (HMDS) in order to protect the films against corrosive wet etch chemicals and ambient moisture adsorption. In an alternative procedure, HMDS is also added to the zeolite suspension before film preparation. Fourier transform infrared spectroscopy, X-ray photoelectron spectroscopy, water-soak tests, and HF etch tests are performed to characterize the films. The dielectric constant is as low as 1.51, and the films resist HF attack up to 5.5 min. These properties are highly desirable by the semiconductor industry for next-generation microprocessors.

    Other authors
    • Christopher M. Lew
    See publication

Languages

  • English

    Native or bilingual proficiency

  • Spanish

    Native or bilingual proficiency

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